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公开(公告)号：US20200299545A1
公开(公告)日：2020-09-24
申请号：US16642120
申请日：2018-08-30
IPC分类号： C09G1/02 , C09K3/14 , H01L21/3105
摘要： A slurry containing abrasive grains, a liquid medium, and a salt of a compound represented by formula (1) below, in which the abrasive grains include first particles and second particles in contact with the first particles, the first particles contain cerium oxide, and the second particles contain a hydroxide of a tetravalent metal element. [In formula (1), R represents a hydroxyl group or a monovalent organic group.]
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公开(公告)号：US20200032106A1
公开(公告)日：2020-01-30
申请号：US16497558
申请日：2018-01-29
IPC分类号： C09G1/02 , C08K3/20 , C08K5/09 , C08K5/17 , C08L71/02 , H01L21/304 , H01L21/3105
摘要： A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.
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公开(公告)号：US20210054233A1
公开(公告)日：2021-02-25
申请号：US16981589
申请日：2019-03-20
IPC分类号： C09G1/02 , H01L21/304 , H01L21/3105
摘要： A polishing liquid containing: abrasive grains; a hydroxy acid; a polymer compound having at least one selected from the group consisting of a hydroxyl group and an amide group; and a liquid medium, in which a zeta potential of the abrasive grains is positive, and a weight average molecular weight of the polymer compound is 3000 or more.
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公开(公告)号：US20210071037A1
公开(公告)日：2021-03-11
申请号：US16981573
申请日：2019-03-20
IPC分类号： C09G1/02 , H01L21/3105
摘要： According to an aspect of the present invention, there is provided a polishing liquid containing abrasive grains, a hydroxy acid, a polyol, at least one zwitterionic compound selected from the group consisting of an aminocarboxylic acid and an aminosulfonic acid, and a liquid medium, in which a zeta potential of the abrasive grains is positive, an isoelectric point of the aminocarboxylic acid is smaller than 7.0, and pKa of the aminosulfonic acid is larger than 0.
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