公开(公告)号：US20180320024A1

公开(公告)日：2018-11-08

申请号：US16018279

申请日：2018-06-26

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Hisataka MINAMI ,  Tomohiro IWANO ,  Toshiaki AKUTSU

IPC分类号： C09G1/02 ,  H01L21/762 ,  H01L21/3105 ,  C09K3/14 ,  B24B37/04

CPC分类号： C09G1/02 ,  B24B37/044 ,  C09K3/1409 ,  C09K3/1472 ,  H01L21/31053 ,  H01L21/76224

摘要： A polishing agent comprises: a fluid medium; an abrasive grain containing a hydroxide of a tetravalent metal element; a first additive; a second additive; and a third additive, wherein: the first additive is at least one selected from the group consisting of a compound having a polyoxyalkylene chain and a vinyl alcohol polymer; the second additive is a cationic polymer; and the third additive is an amino group-containing sulfonic acid compound.

公开(公告)号：US20200325360A1

公开(公告)日：2020-10-15

申请号：US16908884

申请日：2020-06-23

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Hisataka MINAMI ,  Tomohiro IWANO ,  Keita ARAKAWA ,  Takahiro HIDAKA

IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/3105

摘要： A polishing liquid comprises: abrasive grains; a compound having an aromatic heterocycle; an additive (excluding the compound having an aromatic heterocycle); and water, wherein: the abrasive grains include a hydroxide of a tetravalent metal element; the aromatic heterocycle has an endocyclic nitrogen atom not bound to a hydrogen atom; and a charge of the endocyclic nitrogen atom obtained by using the Merz-Kollman method is −0.45 or less.

公开(公告)号：US20160280961A1

公开(公告)日：2016-09-29

申请号：US14914898

申请日：2014-08-26

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Tomohiro IWANO

IPC分类号： C09G1/02 ,  B24B37/04

CPC分类号： C09G1/02 ,  B24B37/00 ,  B24B37/042 ,  B24B37/044 ,  C01B33/12 ,  C01F17/0043 ,  C01P2004/64 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/31053

摘要： A polishing liquid comprising abrasive grains, an additive, and water, wherein the abrasive grains include a hydroxide of a tetravalent metal element, produce absorbance of 1.00 or more for light having a wavelength of 400 nm in a first aqueous dispersion having a content of the abrasive grains adjusted to 1.0 mass %, and produce light transmittance of 50%/cm or more for light having a wavelength of 500 nm in the first aqueous dispersion, and a NO3− concentration of a second aqueous dispersion obtained by retaining the first aqueous dispersion at 60° C. for 72 hours is 200 ppm or less.

摘要翻译： 包含磨粒，添加剂和水的抛光液，其中所述磨粒包括四价金属元素的氢氧化物，对于具有400nm波长的第一含水分散体，对波长为400nm的光产生1.00或更高的吸光度 磨粒调节至1.0质量％，并且在第一水分散体中产生具有500nm波长的光的光透射率为50％/ cm以上，并且通过将第一水分散体 在60℃下72小时为200ppm以下。

公开(公告)号：US20160222252A1

公开(公告)日：2016-08-04

申请号：US14917903

申请日：2014-07-01

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Hisataka MINAMI ,  Tomohiro IWANO ,  Keita ARAKAWA ,  Takahiro HIDAKA

IPC分类号： C09G1/02 ,  H01L21/3105

摘要： A polishing liquid comprises: abrasive grains; a compound having an aromatic heterocycle; an additive (excluding the compound having an aromatic heterocycle); and water, wherein: the abrasive grains include a hydroxide of a tetravalent metal element; the aromatic heterocycle has an endocyclic nitrogen atom not bound to a hydrogen atom; and a charge of the endocyclic nitrogen atom obtained by using the Merz-Kollman method is −0.45 or less.

摘要翻译： 抛光液包括：磨粒; 具有芳族杂环的化合物; 添加剂（不包括具有芳族杂环的化合物）; 和水，其中：磨粒包括四价金属元素的氢氧化物; 芳族杂环具有未与氢原子结合的环状氮原子; 通过使用Merz-Kollman法得到的内环氮原子的电荷为-0.45以下。

公开(公告)号：US20210054233A1

公开(公告)日：2021-02-25

申请号：US16981589

申请日：2019-03-20

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Takaaki MATSUMOTO ,  Tomohiro IWANO ,  Tomoyasu HASEGAWA ,  Tomomi KUKITA

IPC分类号： C09G1/02 ,  H01L21/304 ,  H01L21/3105

摘要： A polishing liquid containing: abrasive grains; a hydroxy acid; a polymer compound having at least one selected from the group consisting of a hydroxyl group and an amide group; and a liquid medium, in which a zeta potential of the abrasive grains is positive, and a weight average molecular weight of the polymer compound is 3000 or more.

公开(公告)号：US20210207002A1

公开(公告)日：2021-07-08

申请号：US16497512

申请日：2017-03-27

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Tomohiro IWANO

IPC分类号： C09G1/02 ,  H01L21/321

摘要： A slurry containing abrasive grains and a liquid medium, the abrasive grains including first particles and second particles being in contact with the first particles, the first particles containing ceria, the first particles having a negative zeta potential, the second particles containing a hydroxide of a tetravalent metal element, and the second particles having a positive zeta potential.

公开(公告)号：US20210071037A1

公开(公告)日：2021-03-11

申请号：US16981573

申请日：2019-03-20

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Tomohiro IWANO ,  Takaaki MATSUMOTO ,  Tomomi KUKITA ,  Tomoyasu HASEGAWA

IPC分类号： C09G1/02 ,  H01L21/3105

摘要： According to an aspect of the present invention, there is provided a polishing liquid containing abrasive grains, a hydroxy acid, a polyol, at least one zwitterionic compound selected from the group consisting of an aminocarboxylic acid and an aminosulfonic acid, and a liquid medium, in which a zeta potential of the abrasive grains is positive, an isoelectric point of the aminocarboxylic acid is smaller than 7.0, and pKa of the aminosulfonic acid is larger than 0.

公开(公告)号：US20200369917A1

公开(公告)日：2020-11-26

申请号：US16636816

申请日：2017-08-09

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Yuya OTSUKA ,  Tomohiro IWANO

IPC分类号： C09G1/02 ,  B24B37/04

摘要： Polishing liquid comprising abrasive grains, a phosphonic acid compound having a molecular weight of 210 or more, and at least one selected from the group consisting of amino acids and amino acid derivatives, in which a silanol group density of the abrasive grains is 6.5 groups/nm2 or less, and a degree of association of the abrasive grains is 1.5 or more.

公开(公告)号：US20180258319A1

公开(公告)日：2018-09-13

申请号：US15758399

申请日：2016-06-13

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Toshiaki AKUTSU ,  Hisataka MINAMI ,  Tomohiro IWANO ,  Tetsuro YAMASHITA ,  Masako AOKI ,  Masato FUKASAWA

IPC分类号： C09G1/02 ,  H01L21/304

CPC分类号： C09G1/02 ,  B24B1/00 ,  B24B37/044 ,  C09G1/00 ,  C09G1/04 ,  C09G1/06 ,  C09K3/1454 ,  C09K3/1463 ,  C09K13/06 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/3212

摘要： A polishing liquid comprising a liquid medium, an abrasive grain and a polymer, wherein the polymer includes a first molecular chain having a functional group directly bonded thereto, and a second molecular chain branched from the first molecular chain, and the functional group is at least one selected from the group consisting of a carboxyl group, a carboxylic acid salt group, a hydroxyl group, a sulfo group and a sulfonic acid salt group.

公开(公告)号：US20180251680A1

公开(公告)日：2018-09-06

申请号：US15970953

申请日：2018-05-04

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Tomohiro IWANO ,  Takenori NARITA ,  Daisuke RYUZAKI

IPC分类号： C09K13/12 ,  B24B37/04 ,  H01L21/306 ,  C09K3/14 ,  C09G1/02 ,  H01L21/3105

CPC分类号： C09K13/12 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/30625 ,  H01L21/31053

摘要： The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains satisfy either or both of the following conditions (a) and (b).(a) Producing absorbance of at least 1.50 for light with a wavelength of 400 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %.(b) Producing absorbance of at least 1.000 for light with a wavelength of 290 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 0.0065 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %.