公开(公告)号：US10096451B2

公开(公告)日：2018-10-09

申请号：US15100518

申请日：2014-12-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Hitoshi Namai ,  Tomoaki Yamazaki

IPC: H01J37/28 ,  G01B15/00

Abstract: The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.

公开(公告)号：US10724856B2

公开(公告)日：2020-07-28

申请号：US16330003

申请日：2016-09-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Atsuko Yamaguchi ,  Kazuhisa Hasumi ,  Hitoshi Namai

IPC: G06T7/00 ,  G01B15/04 ,  G01N23/2251 ,  H01J37/28 ,  H01L21/66 ,  H01L27/088

Abstract: To provide an image analysis apparatus capable of easily extracting an edge of an upper layer pattern formed intersecting with a lower layer pattern so as not to be affected by the lower layer pattern, the image analysis apparatus includes a calculation unit that calculates an analysis range including a region where the lower layer pattern intersects with the upper layer pattern and a region where the lower pattern is not formed, a calculation unit that averages a plurality of signal profiles, a calculation unit that calculates a maximum value and a minimum value of a signal intensity, a calculation unit that calculates a threshold level difference using the maximum value and the minimum value, and a calculation unit that calculates the edge of the upper layer pattern on the signal profile.

公开(公告)号：US10186399B2

公开(公告)日：2019-01-22

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka Osaki ,  Chie Shishido ,  Maki Tanaka ,  Hitoshi Namai ,  Fumihiro Sasajima ,  Makoto Suzuki ,  Yoshinori Momonoi

IPC: H01J37/28 ,  H01J37/285 ,  H01J37/244

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.