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公开(公告)号：US20150235804A1
公开(公告)日：2015-08-20
申请号：US14421163
申请日：2013-08-07
Applicant: Hitachi High-Technologies Corporation
Inventor： Mayuka Osaki , Maki Kimura , Chie Shishido , Katsuhiro Sasada
CPC classification number: H01J37/222 , G02B21/008 , G06T5/001 , G06T2207/10061 , H01J37/244 , H01J37/28 , H01J2237/221
Abstract: A charged particle microscope system with a charged particle microscope including an irradiation unit that irradiates a subject to be inspected with a charged particle beam and a detection unit having a detector that detects a charged particle signal from the subject to be inspected irradiated by the irradiation unit; a signal processing unit that converts the charged particle signal detected by the detector of the charged particle microscope into an image signal; and an arithmetic processing unit that corrects the image signal converted by the signal processing unit with the use of signal conversion characteristics.
Abstract translation: 一种具有带电粒子显微镜的带电粒子显微镜系统，其包括用带电粒子束照射待检查对象的照射单元，以及具有检测器的检测单元，所述检测器检测来自被照射单元的被检查物体的带电粒子信号 ; 信号处理单元，将由带电粒子显微镜的检测器检测的带电粒子信号转换为图像信号; 以及算术处理单元，其使用信号转换特性校正由信号处理单元转换的图像信号。
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公开(公告)号：US20140320627A1
公开(公告)日：2014-10-30
申请号：US14360649
申请日：2013-01-30
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Atsushi Miyamoto , Mayuka Osaki , Maki Kimura , Chie Shishido
CPC classification number: G02B21/008 , G01N23/00 , G03F7/70633 , H01J37/28 , H01J2237/2817 , H01L21/0337 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: An pattern evaluation method includes a step of estimating imaging deviation allowed to evaluate an overlay position on one or more evaluation point candidates based on pattern layout information, a step of deciding one or more evaluation points from among the evaluation point candidates based on the allowed imaging deviation, a step of deciding an imaging sequence for imaging the selected evaluation point, and a step of evaluating an overlay position between first and second patterns based on an image obtained by imaging the evaluation point according to the imaging sequence.
Abstract translation: 模式评估方法包括：基于图案布局信息，估计允许评估一个或多个评价点候选的重叠位置的成像偏差的步骤，基于允许成像从评估点候选中确定一个或多个评估点的步骤 偏差，决定用于使所选择的评估点成像的成像序列的步骤，以及基于通过根据成像序列对评估点成像而获得的图像来评估第一和第二图案之间的覆盖位置的步骤。
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公开(公告)号：US10186399B2
公开(公告)日：2019-01-22
申请号：US15445055
申请日：2017-02-28
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Mayuka Osaki , Chie Shishido , Maki Tanaka , Hitoshi Namai , Fumihiro Sasajima , Makoto Suzuki , Yoshinori Momonoi
IPC: H01J37/28 , H01J37/285 , H01J37/244
Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.
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公开(公告)号：US09488815B2
公开(公告)日：2016-11-08
申请号：US14360649
申请日：2013-01-30
Applicant: Hitachi High-Technologies Corporation
Inventor： Atsushi Miyamoto , Mayuka Osaki , Maki Kimura , Chie Shishido
CPC classification number: G02B21/008 , G01N23/00 , G03F7/70633 , H01J37/28 , H01J2237/2817 , H01L21/0337 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: An pattern evaluation method includes a step of estimating imaging deviation allowed to evaluate an overlay position on one or more evaluation point candidates based on pattern layout information, a step of deciding one or more evaluation points from among the evaluation point candidates based on the allowed imaging deviation, a step of deciding an imaging sequence for imaging the selected evaluation point, and a step of evaluating an overlay position between first and second patterns based on an image obtained by imaging the evaluation point according to the imaging sequence.
Abstract translation: 模式评估方法包括：基于图案布局信息，估计允许评估一个或多个评价点候选的重叠位置的成像偏差的步骤，基于允许成像从评估点候选中确定一个或多个评估点的步骤 偏差，决定用于使所选择的评估点成像的成像序列的步骤，以及基于通过根据成像序列对评估点成像而获得的图像来评估第一和第二图案之间的覆盖位置的步骤。
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