公开(公告)号：US09859093B2

公开(公告)日：2018-01-02

申请号：US15115073

申请日：2014-12-03

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenji Nakahira ,  Maki Tanaka

IPC: H01J37/00 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2809

Abstract: A scanning charged particle microscope apparatus includes image quality improvement unit which performs an image quality improvement process on image data which is obtained by detecting particles generated from a sample, the image quality improvement unit divides a region in which the image data is acquired into two or more regions on the basis of a distance from a region in which the image data within a visual field of a charged particle optical unit is not acquired, determines an image quality improvement processing method and a processing parameter for image quality improvement for the image data in each of the separate regions according to the separate regions; and performs an image quality improvement process on the image data in each of the separate regions by using the determined processing method and processing parameter corresponding to the separate region.

公开(公告)号：US09741530B2

公开(公告)日：2017-08-22

申请号：US15110284

申请日：2014-12-03

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Kenji Nakahira ,  Maki Tanaka ,  Shinsuke Kawanishi

IPC: G01K1/08 ,  H01J37/22 ,  H01J37/28 ,  H01J37/18 ,  H01J37/20

CPC classification number: H01J37/222 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/221 ,  H01J2237/2608 ,  H01J2237/2806

Abstract: A charged-particle-beam device is provided with a data processing unit that removes, from a detector signal, the effect that scattering of a primary charged-particle beam before the primary charged-particle beam reaches a specimen has on the spot shape of the primary charged-particle beam. For example, when using an electron microscope to observe a specimen in a non-vacuum atmosphere, the effect that scattering of a primary charged-particle beam due to a barrier film or a gas present in a non-vacuum space has on the spot shape of the primary charged-particle beam is removed from a signal acquired by a detector. This makes it easy to obtain high-quality images.

公开(公告)号：US10186399B2

公开(公告)日：2019-01-22

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka Osaki ,  Chie Shishido ,  Maki Tanaka ,  Hitoshi Namai ,  Fumihiro Sasajima ,  Makoto Suzuki ,  Yoshinori Momonoi

IPC: H01J37/28 ,  H01J37/285 ,  H01J37/244

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

公开(公告)号：US09824853B2

公开(公告)日：2017-11-21

申请号：US15312866

申请日：2015-05-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Mitsutoshi Kobayashi ,  Kenji Nakahira ,  Maki Tanaka

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: In order to enable high-speed imaging of a wide-field image, the imaging method using the electron microscope comprises: irradiating and scanning a wide-field region of the sample with a low-dose amount of electron beam, and acquiring a wide-field image of the sample; setting, from this wide-field image, a narrow-field region; irradiating and scanning this narrow-field region with a high-dose amount of the electron beam, and acquiring a narrow-field image of the sample; determining the noise-removal parameters for the acquired wide-field image and narrow-field image; performing image quality improvement processing on the wide-field image and the narrow-field image; performing drift correction on the narrow-field image undergone the image quality improvement processing; and combining the narrow-field image undergone this drift correction and the wide-field image in such a manner that the visibility of each is at the same level throughout the entirety of the combined image.

公开(公告)号：US09852881B2

公开(公告)日：2017-12-26

申请号：US15039527

申请日：2014-11-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Chie Shishido ,  Takuma Yamamoto ,  Shinya Yamada ,  Maki Tanaka

IPC: H01J37/29 ,  H01J37/26 ,  G01B15/00 ,  G01B21/00 ,  H01J37/244 ,  H01J37/28 ,  G01B15/04 ,  H01L21/66

CPC classification number: H01J37/29 ,  G01B15/00 ,  G01B15/04 ,  G01B2210/56 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/2806 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L22/12

Abstract: In order to allow detecting backscattered electrons (BSEs) generated from the bottom of a hole for determining whether a hole with a super high aspect ratio is opened or for inspecting and measuring the ratio of the top diameter to the bottom diameter of a hole, which are typified in 3D-NAND processes of opening a hole, a primary electron beam accelerated at a high accelerating voltage is applied to a sample. Backscattered electrons (BSEs) at a low angle (e.g. a zenith angle of five degrees or more) are detected. Thus, the bottom of a hole is observed using “penetrating BSEs” having been emitted from the bottom of the hole and penetrated the side wall. Using the characteristics in which a penetrating distance is relatively prolonged through a deep hole and the amount of penetrating BSEs is decreased to cause a dark image, a calibration curve expressing the relationship between a hole depth and the brightness is given to measure the hole depth.

公开(公告)号：US09190240B2

公开(公告)日：2015-11-17

申请号：US14252839

申请日：2014-04-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Maki Tanaka

IPC: G21K7/00 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2817

Abstract: A charged particle microscope apparatus includes a radiation optical system that radiates a focused charged particle beam to an upper side of a sample provided with a pattern and scans the sample; a detection optical system that detects charged particles generated from the sample to which the charged particle beam has been radiated by the radiation optical system; and a processing unit that processes the charged particles detected by the detection optical system to obtain a charged particle image of the sample, estimates diffusion of the charged particles at any depth of the pattern of the sample, on the basis of information on a depth or a material of the pattern of the sample or radiation energy of the charged particle beam in the radiation optical system; corrects the obtained charged particle image using the estimated diffusion of the charged particles; and processes the corrected charged particle image.

Abstract translation: 带电粒子显微镜装置包括：辐射光学系统，其将聚焦的带电粒子束辐射到具有图案的样品的上侧，并扫描样品; 检测光学系统，其检测由所述带电粒子束已经被所述辐射光学系统辐射的样品产生的带电粒子; 以及处理单元，其处理由检测光学系统检测的带电粒子以获得样品的带电粒子图像，根据关于深度的信息估计带电粒子在样本图案的任何深度处的扩散， 辐射光学系统中带电粒子束的样本图案或辐射能的材料; 使用估计的带电粒子的扩散来校正获得的带电粒子图像; 并处理校正的带电粒子图像。

公开(公告)号：US20140319341A1

公开(公告)日：2014-10-30

申请号：US14252839

申请日：2014-04-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Maki Tanaka

IPC: H01J37/26

CPC classification number: H01J37/222 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2817

Abstract: A charged particle microscope apparatus includes a radiation optical system that radiates a focused charged particle beam to an upper side of a sample provided with a pattern and scans the sample; a detection optical system that detects charged particles generated from the sample to which the charged particle beam has been radiated by the radiation optical system; and a processing unit that processes the charged particles detected by the detection optical system to obtain a charged particle image of the sample, estimates diffusion of the charged particles at any depth of the pattern of the sample, on the basis of information on a depth or a material of the pattern of the sample or radiation energy of the charged particle beam in the radiation optical system; corrects the obtained charged particle image using the estimated diffusion of the charged particles; and processes the corrected charged particle image.

Abstract translation: 带电粒子显微镜装置包括：辐射光学系统，其将聚焦的带电粒子束辐射到具有图案的样品的上侧，并扫描样品; 检测光学系统，其检测由所述带电粒子束已经被所述辐射光学系统辐射的样品产生的带电粒子; 以及处理单元，其处理由检测光学系统检测的带电粒子以获得样品的带电粒子图像，根据关于深度的信息估计带电粒子在样本图案的任何深度处的扩散， 辐射光学系统中带电粒子束的样本图案或辐射能的材料; 使用估计的带电粒子的扩散来校正获得的带电粒子图像; 并处理校正的带电粒子图像。