公开(公告)号：US20160320182A1

公开(公告)日：2016-11-03

申请号：US15104574

申请日：2014-11-17

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Satoru YAMAGUCHI ,  Norio HASEGAWA ,  Akiyuki SUGIYAMA ,  Miki ISAWA ,  Akihiro ONIZAWA ,  Ryuji MITSUHASHI

IPC: G01B15/00 ,  H01L21/033 ,  H01L21/66 ,  H01J37/28

CPC classification number: G01B15/00 ,  G01B2210/56 ,  H01J37/28 ,  H01J2237/2817 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L22/12

Abstract: The purpose of the present invention is to provide a pattern measurement device which adequately evaluates a pattern formed by means of a patterning method for forming a pattern that is not in a photomask. In order to fulfil the purpose, the present invention suggests a pattern measurement device provided with a computation device for measuring the dimensions between patterns formed on a sample, wherein: the centroid of the pattern formed on the sample is extracted from data to be measured obtained by irradiating beams; a position alignment process is executed between the extracted centroid and measurement reference data in which a reference functioning as the measurement start point or measurement end point is set; and the dimensions between the measurement start point or the measurement end point of the measurement reference data, which was subjected to position alignment, and the edge or the centroid of the pattern contained in the data to be measured is measured.

Abstract translation: 本发明的目的是提供一种图案测量装置，其适当地评估通过用于形成不在光掩模中的图案的图案化方法形成的图案。 为了实现该目的，本发明提出了一种图案测量装置，其具有用于测量在样品上形成的图案之间的尺寸的计算装置，其中：从获得的待测数据中提取形成在样品上的图案的质心 通过照射光束; 在提取的质心和测量参考数据之间执行位置对准过程，其中设置用作测量开始点或测量终点的参考点; 并且测量经受位置对准的测量参考数据的测量开始点或测量结束点之间的尺寸以及包含在要测量的数据中的图案的边缘或质心。