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公开(公告)号：US10607647B2
公开(公告)日：2020-03-31
申请号：US15611243
申请日：2017-06-01
Applicant: HOYA CORPORATION , HOYA LAMPHUN LTD.
Inventor： Toshio Takizawa , Kraisorn Phandon , Kenichi Nishimori
Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.”
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公开(公告)号：US20150213826A1
公开(公告)日：2015-07-30
申请号：US14424261
申请日：2013-06-28
Applicant: HOYA CORPORATION , HOYA GLASS DISK VIETNAM II LTD.
Inventor： Masanobu Itaya , Kinobu Osakabe , Toshio Takizawa
CPC classification number: G11B5/7315 , G11B5/82
Abstract: A magnetic-disk glass substrate of the present invention has an average value of squares of inclinations of 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more of 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
Abstract translation: 在本发明的磁盘玻璃基板中，在主体上倾斜的样本的情况下，倾斜平方的平均值为0.0025以下，倾斜方格为0.004以上的频率为15％以下 以10nm的间隔获得表面。
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公开(公告)号：US11214713B2
公开(公告)日：2022-01-04
申请号：US16641185
申请日：2018-10-31
Applicant: HOYA CORPORATION
Inventor： Toshio Takizawa
Abstract: Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.
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公开(公告)号：US11081134B2
公开(公告)日：2021-08-03
申请号：US16368046
申请日：2019-03-28
Applicant: HOYA CORPORATION , HOYA GLASS DISK VIETNAM II LTD.
Inventor： Masanobu Itaya , Kinobu Osakabe , Toshio Takizawa
Abstract: A hard disk drive includes a magnetic-disk substrate in which an average value of squares of inclinations is 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more is 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
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5.发明授权Magnetic disk substrate with offset portion on a main surface within a range of 92.0 to 97.0% in a radial direction from a center, magnetic disk with substrate and magnetic disk device 有权在主表面上具有偏移部分的磁盘基板，从中心沿径向方向为92.0〜97.0％，具有基板的磁盘和磁盘装置公开(公告)号：US09183866B2
公开(公告)日：2015-11-10
申请号：US14551675
申请日：2014-11-24
Applicant: HOYA CORPORATION , HOYA GLASS DISK (Thailand) LTD.
Inventor： Toshio Takizawa , Kraisorn Phandon , Kenichi Nishimori
CPC classification number: G11B5/7315 , G11B5/82
Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.”
Abstract translation: 一种磁盘基板，其具有平坦的主表面，端面和形成在主表面和端面之间的倒角面。 该基板具有偏离部分，该主体表面在距离基板中心的径向方向上在92.0至97.0％的范围内。 从基板的中心到基板的端面的径向方向的距离为100％，偏移部相对于连接主面上的两点的虚拟直线上升或下降，设定在92.0的位置 ％和97.0％。 在与虚拟直线垂直的方向上从虚拟直线到偏移部分的最大距离为“最大偏移值”。
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Patent Agency Ranking
公开(公告)号：US12266389B2
公开(公告)日：2025-04-01
申请号：US18547572
申请日：2022-02-24
Applicant: HOYA CORPORATION
Inventor： Shuhei Azuma , Toshio Takizawa
Abstract: A magnetic-disk substrate according to an embodiment includes two main surfaces and an outer circumferential edge surface. In the magnetic-disk substrate, the outer circumferential edge surface includes two chamfered surfaces that are respectively connected to the main surfaces, and a side wall surface that is curved and extends to protrude outward between the two chamfered surfaces. The side wall surface has a radius of curvature of 1100 μm or more on a cross-section of the magnetic-disk substrate extending along a plate thickness direction of the magnetic-disk substrate.
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7.发明授权公开(公告)号：US09038417B2
公开(公告)日：2015-05-26
申请号：US14275630
申请日：2014-05-12
Applicant: HOYA CORPORATION
Inventor： Toshio Takizawa , Takumi Koshimizu , Yoshinori Marumo , Masahiro Katagiri
CPC classification number: B24B7/241 , C03C19/00 , C03C23/0075 , G11B5/8404
Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
Abstract translation: 当在玻璃基板上进行镜面抛光时，通过使抛光垫与玻璃基板的表面接触，同时向衬底表面供给包含抛光颗粒的抛光液体，将抛光液的pH保持在一定范围内或 控制研磨液的附聚度或分散度。 因此，可以保持足够的镜面研磨速度，并且可以获得具有良好端部形状的玻璃基板。
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公开(公告)号：US12252633B2
公开(公告)日：2025-03-18
申请号：US18321385
申请日：2023-05-22
Applicant: HOYA CORPORATION
Inventor： Toshio Takizawa
Abstract: Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, D100 is 3 μm or more, D50 is 0.8 to 2.4 μm, and Dpeak−D5 is less than D95−Dpeak.
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公开(公告)号：US11680187B2
公开(公告)日：2023-06-20
申请号：US17566200
申请日：2021-12-30
Applicant: HOYA CORPORATION
Inventor： Toshio Takizawa
CPC classification number: C09G1/02 , B24B7/241 , B24B7/245 , C03C17/002 , G11B5/73921 , G11B5/8404
Abstract: Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.
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公开(公告)号：US09697861B2
公开(公告)日：2017-07-04
申请号：US14818796
申请日：2015-08-05
Applicant: HOYA CORPORATION , HOYA GLASS DISK (Thailand) LTD.
Inventor： Toshio Takizawa , Kraisorn Phandon , Kenichi Nishimori
CPC classification number: G11B5/7315 , G11B5/82
Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.”
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