公开(公告)号：US20030166294A1

公开(公告)日：2003-09-04

申请号：US10387004

申请日：2003-03-11

Applicant: HRL Laboratories, LLC

Inventor： Kevin W. Kirby ,  Amanda C. Phelps ,  Robert N. Schwartz

IPC: G01N021/00

CPC classification number: G01N21/3504 ,  Y10T436/20 ,  Y10T436/205831

Abstract: A method for detecting the presence and amount of carbon monoxide, comprising the use of infrared spectroscopy to compare the spectra of the test gas containing carbon monoxide and the reference gas. The reference gas is the test gas from which carbon monoxide had been removed by conversion using catalysts. The presence and quantity of carbon monoxide is determined by deducting the spectrum of the reference gas from the spectrum of the test gas. The catalysts comprise nanoparticles of gold precipitated on a metal oxide or hydroxide carrier. An apparatus implementing this method.

Abstract translation: 一种用于检测一氧化碳的存在和量的方法，包括使用红外光谱法比较含有一氧化碳和参考气体的测试气体的光谱。 参考气体是使用催化剂通过转化除去一氧化碳的试验气体。 通过从测试气体的光谱中扣除参考气体的光谱来确定一氧化碳的存在和数量。 催化剂包含在金属氧化物或氢氧化物载体上析出的金纳米颗粒。 实施该方法的装置。

公开(公告)号：US20030016030A1

公开(公告)日：2003-01-23

申请号：US09855315

申请日：2001-05-15

Applicant: HRL Laboratories, LLC

Inventor： Robert N. Schwartz ,  Paul O. Braatz ,  Kevin W. Kirby

IPC: G01R027/26

CPC classification number: H01M8/04089 ,  G01N27/221 ,  H01M8/04194

Abstract: A method and sensor for determining the ratio of two components in a fluid mixture comprising a test cell in open communication with the fluid mixture and a reference cell containing a desired fluid mixture not in contact with the fluid mixture being tested, said reference and test cells having the same cell geometry. By use of a capacitance divider system, one determines the relative capacitances of said cells correlated with the dielectric constants of the respective fluid mixtures and ascertains the ratio of one component to the other component in the fluid mixture on the basis of the linear and monotonic correlation between the dielectric constant of the mixture at a given temperature and the ratio of one component to the other component. Preferably a mixture of methanol and water is tested such as for use as a feed to a reformer used in supplying hydrogen to a fuel cell. A fixed capacitor equivalent to the reference cell at a given temperature is usually substituted for the latter.

Abstract translation: 一种用于确定包含与流体混合物开放连通的测试池的流体混合物中的两种组分的比例的方法和传感器，以及含有不与所测试的流体混合物接触的所需流体混合物的参考池，所述参考和测试池 具有相同的单元几何形状。 通过使用电容分配器系统，可以确定所述电池的相对电容与各流体混合物的介电常数相关，并且基于线性和单调相关性确定流体混合物中的一种组分与另一组分的比例 在给定温度下混合物的介电常数和一种组分与另一组分的比例。 优选地测试甲醇和水的混合物，例如用作用于向燃料电池供应氢气的重整器的进料。 在给定温度下等效于参考电池的固定电容器通常用于后者。

公开(公告)号：US20020055260A1

公开(公告)日：2002-05-09

申请号：US10016894

申请日：2001-12-13

Applicant: HRL Laboratories

Inventor： Lap-Wai Chow ,  Tsung-Yuan Hsu ,  Daniel J. Hyman ,  Robert Y. Loo ,  Paul Ouyang ,  James H. Schaffner ,  Adele Schmitz ,  Robert N. Schwartz

IPC: H01L021/302

CPC classification number: B81C1/00246 ,  B81B2201/014 ,  B81C2201/014 ,  B81C2203/0714 ,  B81C2203/0735 ,  H01H1/58 ,  H01H59/0009 ,  H01H2001/0057

Abstract: A microelectromechanical (MEM) switch is fabricated inexpensively by using processing steps which are standard for fabricating multiple metal layer integrated circuits, such as CMOS. The exact steps may be adjusted to be compatible with the process of a particular foundry, resulting in a device which is both low cost and readily integrable with other circuits. The processing steps include making contacts for the MEM switch from metal plugs which are ordinarily used as vias to connect metal layers which are separated by a dielectric layer. Such contact vias are formed on either side of a sacrificial metallization area, and then the interconnect metallization is removed from between the contact vias, leaving them separated. Dielectric surrounding the contacts is etched back so that they protrude toward each other. Thus, when the contacts are moved toward each other by actuating the MEM switch, they connect firmly without obstruction. Tungsten is typically used to form vias in CMOS processes, and it makes an excellent contact material, but other via metals may also be employed as contacts. Interconnect metallization may be employed for other structural and interconnect needs of the MEM switch, and is preferably standard for the foundry and process used. Various metals and dielectric materials may be used to create the switches, but in a preferred embodiment the interconnect metal layers are aluminum and the dielectric material is SiO2, materials which are fully compatible with standard four-layer CMOS fabrication processes.