LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY
    8.
    发明申请
    LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY 失效
    具有主动阻尼分层的平面设备

    公开(公告)号:US20090122284A1

    公开(公告)日:2009-05-14

    申请号:US12249399

    申请日:2008-10-10

    IPC分类号: G03B27/42 F16F7/10

    CPC分类号: G03F7/709 G03F7/70883

    摘要: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

    摘要翻译: 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统,所述阻尼系统包括界面阻尼块和主动阻尼子系统,以阻尼 界面阻尼块的至少一部分的振动,连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统,主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器,其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置,并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。

    Lithographic apparatus having an active damping subassembly
    10.
    发明授权
    Lithographic apparatus having an active damping subassembly 失效
    具有主动阻尼子组件的平版印刷设备

    公开(公告)号:US08164737B2

    公开(公告)日:2012-04-24

    申请号:US12249399

    申请日:2008-10-10

    CPC分类号: G03F7/709 G03F7/70883

    摘要: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

    摘要翻译: 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统,所述阻尼系统包括界面阻尼块和主动阻尼子系统,以阻尼 界面阻尼块的至少一部分的振动,连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统,主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器,其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置,并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。