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公开(公告)号：US08164737B2
公开(公告)日：2012-04-24
申请号：US12249399
申请日：2008-10-10
申请人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , G03F7/70883
摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.
摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。
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公开(公告)号：US20090122284A1
公开(公告)日：2009-05-14
申请号：US12249399
申请日：2008-10-10
申请人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , G03F7/70883
摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.
摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。
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3.发明申请COMBINATION OF STRUCTURE AND AN ACTIVE DAMPING SYSTEM, AND A LITHOGRAPHIC APPARATUS 失效结构与主动阻尼系统的组合，以及平面设备公开(公告)号：US20090180092A1
公开(公告)日：2009-07-16
申请号：US12267809
申请日：2008-11-10
申请人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , F16F15/002
摘要： An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.
摘要翻译： 一种用于抑制结构的至少一部分的振动的主动阻尼系统，包括确定结构的位置量的装置和致动器，以依据确定的位置量对结构施加力，其中该装置是 计算装置，被配置为基于致动器信号计算结构的位置量。
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4.发明授权Combination of structure and an active damping system, and a lithographic apparatus 失效结构和主动阻尼系统的组合，以及光刻设备公开(公告)号：US08245824B2
公开(公告)日：2012-08-21
申请号：US12267809
申请日：2008-11-10
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , F16F15/002
摘要： An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.
摘要翻译： 一种用于抑制结构的至少一部分的振动的主动阻尼系统，包括确定结构的位置量的装置和致动器，以依据确定的位置量对结构施加力，其中该装置是 计算装置，被配置为基于致动器信号计算结构的位置量。
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5.发明授权Damping arrangement, active damping system, lithographic apparatus, and projection assembly 失效阻尼布置，主动阻尼系统，光刻设备和投影组件公开(公告)号：US08059259B2
公开(公告)日：2011-11-15
申请号：US12268622
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , F16F7/1005 , F16F15/02
摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.
摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。
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6.发明申请Damping Arrangement, Active Damping System, Lithographic Apparatus, And Projection Assembly 失效阻尼布置，主动阻尼系统，平版印刷设备和投影组件公开(公告)号：US20090207393A1
公开(公告)日：2009-08-20
申请号：US12268622
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , F16F7/1005 , F16F15/02
摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.
摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。
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公开(公告)号：US20090091725A1
公开(公告)日：2009-04-09
申请号：US12244879
申请日：2008-10-03
申请人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
发明人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
CPC分类号： G03F7/709 , F16F7/1005
摘要： A lithographic apparatus comprises an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further comprises a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system comprises a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is corrected to a damping mass, the damping mass being connected to the projection system.
摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统。 光刻设备还包括被构造成保持衬底的衬底台; 以及投影系统，被配置为将图案化的光束投影到基板的目标部分上。 提供主动阻尼系统以抑制至少部分投影系统的振动。 主动阻尼系统包括用于测量投影系统的位置量的传感器和根据由传感器提供的信号在投影系统上施加力的致动器的组合。 主动阻尼系统被校正为阻尼质量，阻尼块连接到投影系统。
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公开(公告)号：US08203694B2
公开(公告)日：2012-06-19
申请号：US12244879
申请日：2008-10-03
申请人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
发明人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , F16F7/1005
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is connected to a damping mass, the damping mass being connected to the projection system.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 所述光刻设备还包括构造成保持基板的基板台; 以及投影系统，被配置为将图案化的光束投影到基板的目标部分上。 提供主动阻尼系统以抑制至少部分投影系统的振动。 主动阻尼系统包括测量投影系统的位置量的传感器和根据由传感器提供的信号在投影系统上施加力的致动器的组合。 主动阻尼系统连接到阻尼块，阻尼块连接到投影系统。
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公开(公告)号：US08994919B2
公开(公告)日：2015-03-31
申请号：US12244326
申请日：2008-10-02
CPC分类号： G03F7/70775 , G03F7/709 , G05D19/02
摘要： A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.
摘要翻译： 提供了一种用于控制物体的位置或位置相关量的控制系统。 测量系统被配置为测量对象的位置或位置相关量。 控制器被配置为基于所测量的位置或位置相关量提供控制信号。 执行器基于控制信号致动物体。 可以是部分级过滤器单元的过滤器单元过滤所测量的位置或位置相关量。
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10.发明申请LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS 有权用于校正平面设备阶段的位置的平面设备和方法公开(公告)号：US20110208459A1
公开(公告)日：2011-08-25
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。
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