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101 条记录 (耗时 0.026 秒)

    Visible radiation sensitive composition and recording material producible therefrom
    1.
    发明授权
    Visible radiation sensitive composition and recording material producible therefrom 失效
    可见的辐射敏感组合物和可从其生产的记录材料

    公开(公告)号：US6051366A

    公开(公告)日：2000-04-18

    申请号：US450968

    申请日：1995-05-25

    申请人： Harald Baumann ,  Hans-Joachim Timpe ,  Hans-Peter Herting

    发明人： Harald Baumann ,  Hans-Joachim Timpe ,  Hans-Peter Herting

    IPC分类号： G03F7/029

    CPC分类号： G03F7/029 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/127 ,  Y10S430/148

    摘要： A visible radiation sensitive composition is described which comprises a binder, one or more polymerizable compounds containing at least one polymerizable group, and one or more dyes having an absorption range in the emission range of the radiation source, characterized in that said composition comprises as an initiator an initiator system consisting of a metallocene as a photoinitiator and an onium compound as a coinitiator. The visible radiation sensitive composition shows an increased radiation sensitivity compared to the known radiation sensitive compositions and is especially suitable for recording materials such as printing plates, which can, in particular, also be exposed by means of laser radiation in the visible range.

    摘要翻译： 描述了一种可见的辐射敏感组合物，其包含粘合剂，含有至少一个可聚合基团的一种或多种可聚合化合物和一种或多种在辐射源的发射范围内具有吸收范围的染料，其特征在于所述组合物包含作为 引发剂由作为光引发剂的茂金属和作为共引发剂的鎓化合物组成的引发剂体系。 可见的辐射敏感组合物显示与已知的辐射敏感组合物相比增加的辐射敏感性，并且特别适用于记录诸如印刷板的材料，其特别是也可以通过在可见光范围内的激光辐射曝光。

    Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates
    3.
    发明授权
    Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
    乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用

    公开(公告)号：US5985996A

    公开(公告)日：1999-11-16

    申请号：US917631

    申请日：1997-08-22

    申请人： Harald Baumann ,  Udo Dwars ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Udo Dwars ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    IPC分类号： C08F2/50 ,  C08F8/00 ,  G03F7/021 ,  G03F7/033

    CPC分类号： G03F7/033 ,  C08F8/00 ,  C08F8/12 ,  C08F8/28 ,  C08F8/30 ,  G03F7/0215

    摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## and E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group,R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group,R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 andY is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.

    摘要翻译： 本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在，并且式B的存在量为1至30摩尔％，和 式C的存在量为5至60摩尔％，并且式D的存在量为0至60摩尔％，并且具有下式，并且E以1至40摩尔的量存在 ％，并具有下式：其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基和Y 是饱和或不饱和的链状或环状间隔基团，以及含有该粘合剂的光敏组合物。

    Process for Production of Lithographic Printing Plates
    5.
    发明申请
    Process for Production of Lithographic Printing Plates 审中-公开

    公开(公告)号：US20080145790A1

    公开(公告)日：2008-06-19

    申请号：US11815578

    申请日：2006-02-01

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    IPC分类号： G03F7/12

    CPC分类号： G03F7/322

    摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

    Sulfonamido substituted acetal polymers
    8.
    发明授权
    Sulfonamido substituted acetal polymers 失效
    磺酰胺取代的缩醛聚合物

    公开(公告)号：US5849842A

    公开(公告)日：1998-12-15

    申请号：US917057

    申请日：1997-08-22

    申请人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

    发明人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

    IPC分类号： C08F8/34 ,  G03F7/021 ,  G03F7/033 ,  C08F8/00

    CPC分类号： G03F7/0212 ,  C08F8/34 ,  G03F7/0215 ,  G03F7/033

    摘要： Binders useful in photosensitive compositions contain units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.

    摘要翻译： 用于光敏组合物的粘合剂含有单元A，B，C和D，其中A以0.5至15wt。 ％且为式35重量％。 ％，并且具有式（B）的化合物C的存在量为10至50wt。 ％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基和D以25至70重量％的量存在。 ％，具有式R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

    Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates
    9.
    发明授权
    Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
    乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用

    公开(公告)号：US5700619A

    公开(公告)日：1997-12-23

    申请号：US675024

    申请日：1996-07-03

    申请人： Harald Baumann ,  Udo Dwars ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Udo Dwars ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    IPC分类号： C08F2/50 ,  C08F8/00 ,  G03F7/021 ,  G03F7/033

    CPC分类号： G03F7/033 ,  C08F8/00 ,  C08F8/12 ,  C08F8/28 ,  C08F8/30 ,  G03F7/0215

    摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group, R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.

    摘要翻译： 本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在并且具有式30摩尔％并且具有式（B） ）C以5至60摩尔％的量存在并且具有式（C）的化合物：D的存在量为0至60摩尔％，并且具有式0摩尔％，并且具有式 （E）其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基，Y是 饱和或不饱和的链或环形间隔基，以及含有该粘合剂的光敏组合物。

    Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates
    10.
    发明授权
    Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates 失效
    磺酰胺取代的缩醛聚合物及其在光敏组合物和平版印刷版中的应用

    公开(公告)号：US5698360A

    公开(公告)日：1997-12-16

    申请号：US677703

    申请日：1996-07-10

    申请人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

    发明人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

    IPC分类号： C08F8/34 ,  G03F7/021 ,  G03F7/033

    CPC分类号： G03F7/0212 ,  C08F8/34 ,  G03F7/0215 ,  G03F7/033

    摘要： The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.

    摘要翻译： 本发明涉及包含所述粘合剂的粘合剂和光敏组合物。 粘合剂包含单元A，B，C和D，其中A的存在量为0.5-15wt。 （A）B以10〜35重量％的量存在。 ％，并且具有式50重量％ ％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基或异丙​​基，D以25至70重量％的量存在。 ％，并且具有式（D）的式（I）其中n是1至3的整数，R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。