利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

42 条记录 (耗时 0.03 秒)

    System and method for improving corrosion resistance of magnetic media
    4.
    发明授权
    System and method for improving corrosion resistance of magnetic media 失效
    提高磁性介质耐腐蚀性的系统和方法

    公开(公告)号：US07244521B2

    公开(公告)日：2007-07-17

    申请号：US10740706

    申请日：2003-12-19

    申请人： Jianwei Liu ,  Michael Joseph Stirniman ,  Li-Ping Wang

    发明人： Jianwei Liu ,  Michael Joseph Stirniman ,  Li-Ping Wang

    IPC分类号： G11B5/66

    CPC分类号： C23C14/0605 ,  C23C14/025 ,  C23C14/221 ,  C23C14/5846 ,  G11B5/722 ,  G11B5/82

    摘要： A system and method for corrosion problems in magnetic media resulting from moisture penetrating through the carbon layer into the magnetic layer by diffusion or other methods are overcome by processing the carbon overcoat to stop and/or inhibit the moisture penetration. The process involves removing moisture channels from protective overcoats of thin film magnetic media by irradiating the protective overcoat with ultraviolet (UV) radiation in an inert hydrophobic chemical environment. Afterwards, the thin film magnetic media can be removed into ambient atmosphere where it is coated with a lubricant.

    摘要翻译： 通过加工碳外涂层以阻止和/或抑制水分渗透来克服通过扩散或其它方法通过碳层渗透到磁性层中的水分导致的磁性介质中的腐蚀问题的系统和方法。 该过程涉及通过在惰性疏水化学环境中用紫外线（UV）辐射照射保护性外涂层来从薄膜磁性介质的保护性外涂层去除水分通道。 之后，可以将薄膜磁性介质移除到环境气氛中，在其中涂覆润滑剂。

    High field contrast magnetic stampers/imprinters for contact patterning of magnetic media
    6.
    发明授权
    High field contrast magnetic stampers/imprinters for contact patterning of magnetic media 失效
    用于磁介质接触图形化的高场对比磁压模/打印机

    公开(公告)号：US07028743B1

    公开(公告)日：2006-04-18

    申请号：US10429799

    申请日：2003-05-06

    申请人： Li-Ping Wang ,  David Kuo ,  Jing Gui ,  Koichi Wago

    发明人： Li-Ping Wang ,  David Kuo ,  Jing Gui ,  Koichi Wago

    IPC分类号： B22D23/00 ,  B22D25/00

    CPC分类号： G11B5/865 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/855 ,  G11B11/10578 ,  G11B11/10582 ,  H01F41/32

    摘要： A high field contrast magnetic stamper/imprinter for use in patterning of magnetic and magneto-optical (MO) recording media by contact printing, comprises: (a) a layer of a magnetic material having a high saturation magnetization Bsat≧˜1.2 and high permeability μ≧˜5, including a first, topographically patterned surface and a second surface opposite the first surface, the first, topographically patterned surface comprising a patterned plurality of spaced-apart recesses with a plurality of non-recessed areas therebetween, the topographical pattern corresponding to a magnetic pattern to be formed in a magnetic or MO recording medium; and (b) a layer of Ni on the second surface. A corrosion-resistant protective overcoat layer may be present on the topographically patterned surface. A method for manufacturing the stamper/imprinter is also disclosed.

    摘要翻译： 用于通过接触印刷图案化磁性和磁光（MO）记录介质的高场强对比磁压模/打印机包括：（a）具有高饱和磁化强度的磁性材料层， SUB >> =〜1.2，高磁导率μ> =〜5，包括第一，地形图形表面和与第一表面相对的第二表面，第一，地形图形表面包括图案化的多个间隔开的凹槽， 非凹陷区域，其形状图案对应于要在磁性或MO记录介质中形成的磁性图案; 和（b）第二表面上的Ni层。 耐腐蚀保护性外涂层可能存在于地形图形表面上。 还公开了一种用于制造压模/打印机的方法。

    High field contrast magnetic stampers/imprinters for contact patterning of magnetic media
    7.
    发明授权
    High field contrast magnetic stampers/imprinters for contact patterning of magnetic media 失效
    用于磁介质接触图形化的高场对比磁压模/打印机

    公开(公告)号：US07351484B2

    公开(公告)日：2008-04-01

    申请号：US11358100

    申请日：2006-02-22

    申请人： Li-Ping Wang ,  David Kuo ,  Jing Gui ,  Koichi Wago

    发明人： Li-Ping Wang ,  David Kuo ,  Jing Gui ,  Koichi Wago

    IPC分类号： G11B5/66

    CPC分类号： G11B5/865 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/855 ,  G11B11/10578 ,  G11B11/10582 ,  H01F41/32

    摘要： A high field contrast magnetic stamper/imprinter for use in patterning of magnetic and magneto-optical (MO) recording media by contact printing, comprises: (a) a layer of a magnetic material having a high saturation magnetization Bsat≧˜1.2 and high permeability μ≧˜5, including a first, topographically patterned surface and a second surface opposite the first surface, the first, topographically patterned surface comprising a patterned plurality of spaced-apart recesses with a plurality of non-recessed areas therebetween, the topographical pattern corresponding to a magnetic pattern to be formed in a magnetic or MO recording medium; and (b) a layer of Ni on the second surface. A corrosion-resistant protective overcoat layer may be present on the topographically patterned surface. A method for manufacturing the stamper/imprinter is also disclosed.

    摘要翻译： 用于通过接触印刷图案化磁性和磁光（MO）记录介质的高场强对比磁压模/打印机包括：（a）具有高饱和磁化强度的磁性材料层， SUB >> =〜1.2，高磁导率μ> =〜5，包括第一，地形图形表面和与第一表面相对的第二表面，第一，地形图形表面包括图案化的多个间隔开的凹槽， 非凹陷区域，其形状图案对应于要在磁性或MO记录介质中形成的磁性图案; 和（b）第二表面上的Ni层。 耐腐蚀保护性外涂层可能存在于地形图形表面上。 还公开了一种用于制造压模/打印机的方法。

    Dual-beam interferometer for ultra-smooth surface topographical measurements
    9.
    发明授权
    Dual-beam interferometer for ultra-smooth surface topographical measurements 失效
    双光束干涉仪用于超光滑表面形貌测量

    公开(公告)号：US07019840B2

    公开(公告)日：2006-03-28

    申请号：US10690447

    申请日：2003-10-21

    申请人： Jianmin Wang ,  Jason L. Pressesky ,  Li-Ping Wang

    发明人： Jianmin Wang ,  Jason L. Pressesky ,  Li-Ping Wang

    IPC分类号： G01B9/02

    CPC分类号： G01B11/306 ,  G11B5/012 ,  G11B2005/001

    摘要： A method and apparatus for using a dual-beam interferometer to test surface flatness is provided. The interferometer directs two beams focused at distinct points on a testing surface, such as the surface of a magnetic recording disc. An offset distance “d” between the two beams is provided on the target surface. In the present invention, the separation distance “d” is adjustable. The feature of adjustable separation distance in the interferometer allows the interferometer to meet the different spatial frequency requirements of various applications. In operation, first and second reflected beams are returned to an intensity beam splitter, where they are split and then recombined into two new beams of substantially equal intensity. The second of the two new light beams is constructed by the interference of half intensity of the first and half intensity of second beams, and is sent to a photodiode. The photodiode generates signals in response to the changing interference fringes caused as a result of the modulation of the optical path length difference between the original first and second beams. A local height difference on the reflective surface is calculated relative to the separation distance “d”.

    摘要翻译： 提供了一种使用双光束干涉仪来测试表面平坦度的方法和装置。 干涉仪引导聚焦在测试表面上的不同点的两个光束，例如磁记录盘的表面。 两个光束之间的偏移距离“d”设置在目标表面上。 在本发明中，分离距离“d”是可调节的。 干涉仪间距可调的特点使得干涉仪能够满足各种应用的不同空间频率要求。 在操作中，第一和第二反射光束被返回到强度分束器，在那里它们被分裂，然后再组合成两个基本相等强度的新光束。 两个新光束中的第二个光束由第二光束的第一和第二强度的半强度的干扰构成，并被发送到光电二极管。 光电二极管响应于原始第一和第二光束之间的光程长度差的调制而引起的干扰条纹变化而产生信号。 相对于间隔距离“d”计算反射面上的局部高度差。

    Resist removal from patterned recording media
    10.
    发明授权
    Resist removal from patterned recording media 有权
    阻挡图案化记录介质的去除

    公开(公告)号：US06753130B1

    公开(公告)日：2004-06-22

    申请号：US10047105

    申请日：2002-01-17

    申请人： Jianwei Liu ,  David Shiao-Min Kuo ,  Li-Ping Wang

    发明人： Jianwei Liu ,  David Shiao-Min Kuo ,  Li-Ping Wang

    IPC分类号： G03F700

    CPC分类号： B82Y10/00 ,  G03F7/427 ,  G11B5/74 ,  G11B5/743 ,  G11B5/82 ,  G11B5/8404

    摘要： A method for patterning a carbon-containing substrate utilizing a patterned layer of a resist material as a mask and then safely removing the mask from the substrate without adversely affecting the substrate, comprising sequential steps of: (a) providing a substrate including a surface comprising carbon; (b) forming a thin metal layer on the substrate surface; (c) forming a layer of a resist material on the thin metal layer; (d) patterning the layer of resist material; (e) patterning the substrate utilizing the patterned layer of resist material as a pattern-defining mask; and (f) removing the mask utilizing the thin metal layer as a wet strippable layer or a plasma etch/ash stop layer.

    摘要翻译： 一种利用抗蚀剂材料的图案化层作为掩模来图案化含碳衬底的方法，然后从衬底安全地除去掩模而不会不利地影响衬底，包括以下顺序的步骤：（a）提供包括表面的衬底，包括： 碳;（b）在所述基板表面上形成薄金属层;（c）在所述薄金属层上形成抗蚀剂材料层;（d）图案化所述抗蚀剂材料层;（e） 抗蚀剂材料层作为图案定义掩模; 和（f）使用薄金属层作为湿剥离层或等离子体蚀刻/灰停止层去除掩模。