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公开(公告)号:US07824837B2
公开(公告)日:2010-11-02
申请号:US11876332
申请日:2007-10-22
申请人: Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人: Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
CPC分类号: G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译: 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物,其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元, /或羧基,乙烯基醚封端的交联剂,以及任选的光酸产生剂和/或酸和/或热酸发生剂。 本发明还涉及使用这种组合物的方法。