公开(公告)号：US20070190454A1

公开(公告)日：2007-08-16

申请号：US11562714

申请日：2006-11-22

申请人： Hi Kuk LEE ,  Byung Uk KIM ,  Hyoc Min YOUN ,  Joo Pyo YUN ,  Woo Seok JEON

发明人： Hi Kuk LEE ,  Byung Uk KIM ,  Hyoc Min YOUN ,  Joo Pyo YUN ,  Woo Seok JEON

IPC分类号： G03C1/00

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118

摘要： A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.

摘要翻译： 能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂 为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中， 前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R“ R 1，R 2，R 3和R 3相同或不同，为氢或叔丁基乙烯基醚保护基。

公开(公告)号：US20110206829A1

公开(公告)日：2011-08-25

申请号：US13101973

申请日：2011-05-05

申请人： Ji Sun LEE ,  Hong Sick PARK ,  Jong Hyun CHOUNG ,  Sun Young HONG ,  Bong Kyun KIM ,  Byeong Jin LEE ,  Byung Uk KIM ,  Jong Hyun JEONG ,  Suk Il YOON ,  Seong Bae KIM ,  Sung Gun SHIN ,  Soon Beom HUH ,  Se Hwan JUNG ,  Doo Young JANG

发明人： Ji Sun LEE ,  Hong Sick PARK ,  Jong Hyun CHOUNG ,  Sun Young HONG ,  Bong Kyun KIM ,  Byeong Jin LEE ,  Byung Uk KIM ,  Jong Hyun JEONG ,  Suk Il YOON ,  Seong Bae KIM ,  Sung Gun SHIN ,  Soon Beom HUH ,  Se Hwan JUNG ,  Doo Young JANG

IPC分类号： C23C16/52 ,  B05D5/12

CPC分类号： G03F7/425

摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.

摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。