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    Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product
    3.
    发明授权
    Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product 有权
    单锍盐的制造方法，阳离子聚合引发剂，固化性组合物，固化物

    公开(公告)号：US07709548B2

    公开(公告)日：2010-05-04

    申请号：US12000728

    申请日：2007-12-17

    申请人： Masashi Date ,  Hideki Kimura ,  Shinji Yamashita ,  Jiro Yamamoto

    发明人： Masashi Date ,  Hideki Kimura ,  Shinji Yamashita ,  Jiro Yamamoto

    IPC分类号： C08F2/46

    CPC分类号： C07C381/12 ,  C08G59/687 ,  C08G65/105 ,  G03F7/0045

    摘要： A monosulfonium salt in which very little unreacted raw material remains, which has a purity of at least 96%, and which has one sulfonio group in its molecule is manufactured without a refining step. After (a) an aryl compound, (b) a sulfoxide compound, (c) a dehydrating agent, and (d) a BF4, PF6, AsF6, or SbF6 salt of an alkali metal or an alkaline earth metal are introduced into a reaction system, (e) an inorganic acid is added, so that the aryl compound (a) and the sulfoxide compound (b) are subjected to dehydration condensation.

    摘要翻译： 在没有精制步骤的情况下制造其中保留少量未反应的原料的单锍盐，其具有至少96％的纯度，并且在其分子中具有一个磺酰基。 在（a）芳基化合物中，（b）亚砜化合物，（c）脱水剂和（d）碱金属或碱土金属的BF 4，PF 6，AsF 6或SbF 6盐引入反应 系统，（e）加入无机酸，使芳基化合物（a）和亚砜化合物（b）进行脱水缩合。

    METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE
    6.
    发明申请
    METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE 审中-公开
    生产氟化亚磷酸氢氟酸钠的方法

    公开(公告)号：US20090163723A1

    公开(公告)日：2009-06-25

    申请号：US12094911

    申请日：2006-11-24

    申请人： Hideki Kimura ,  Jiro Yamamoto ,  Shinji Yamashita

    发明人： Hideki Kimura ,  Jiro Yamamoto ,  Shinji Yamashita

    IPC分类号： C07D333/52 ,  C07F9/14

    CPC分类号： C07C381/12 ,  C07F9/14 ,  C07F9/535 ,  G03F7/0045

    摘要： Disclosed is a low cost, efficient method for production of a salt composed of an arylsulfonium and a fluorinated alkylfluorophosphate which method does not required a large excess amount of acid. The method comprises reacting an aryl compound Ar—H and with a compound represented by the formula (I), wherein R1 and R2 denote a hydrocarbon group or a heterocycle group which may be substituted, or they are bonded with each other directly or via —O—, —S—, —SO—, —SO2—, —NH—, —NR′—, —CO—, —COO—, —CONH—, an alkylene group having 1 to 3 carbon atoms or a phenylene group to form a ring structure which may be substituted, wherein R′ denotes a C1-5 alkyl group or a C6-10 aryl group; in the presence of an acid represented by the formula (2), wherein Rf denotes an alkyl group 80% or more of whose hydrogen atoms are substituted by fluorine atoms, “a” is an integer of 1 to 5; and a dehydrating agent to produce the salt of sulfonium represented by the formula (3).

    摘要翻译： 公开了一种生产由芳基锍和氟化烷基氟磷酸盐组成的盐的低成本，高效的方法，该方法不需要大量过量的酸。 该方法包括使芳基化合物Ar-H与式（I）表示的化合物反应，其中R 1和R 2表示可以被取代的烃基或杂环基，或者它们直接或通过 - O - ， - S - ， - SO - ， - SO 2 - ， - NH - ， - NR' - ， - CO-，-COO-，-CONH-，具有1至3个碳原子的亚烷基或亚苯基 形成可被取代的环结构，其中R'表示C 1-5烷基或C 6-10芳基; 在由式（2）表示的酸的存在下，其中，Rf表示其氢原子被氟原子取代的80％以上的烷基，“a”为1〜5的整数， 和脱水剂以制备由式（3）表示的锍盐。

    Method for manufacturing sulfonium salts
    8.
    发明授权
    Method for manufacturing sulfonium salts 失效
    锍盐的制造方法

    公开(公告)号：US07060858B2

    公开(公告)日：2006-06-13

    申请号：US10450517

    申请日：2001-12-17

    申请人： Masashi Date ,  Hideki Kimura ,  Jiro Yamamoto

    发明人： Masashi Date ,  Hideki Kimura ,  Jiro Yamamoto

    IPC分类号： C07C315/00

    CPC分类号： C07C381/12

    摘要： It is an object of the invention to provide a method which makes it possible to manufacture the desired sulfonium salts directly without using a metathesis process and without using acids in large excess amounts. An aryl compound (A) in which a hydrogen atom is bonded to at least one of the carbon atoms of the aryl group, and a sulfoxide compound (B) which can be expressed by the formula: R1 SO R2 (where R1 and R2 indicate hydrocarbon groups or heterocyclic groups which may be substituted, and which may be the same or different) are reacted in the presence of a strong acid (C) which can be expressed by the formula: HMXmYn (where M indicates an element of group IIIa or group Va of the periodic table, X indicates a halogen atom, Y indicates a hydroxyl group, m and n are integers which are such that m+n=4 and n=0 to 3 in cases where M is an element of group IIIa, and m and n are integers which are such that m+n=6 and n=0 to 2 in cases where M is an element of group Va).

    摘要翻译： 本发明的一个目的是提供一种方法，其可以直接制备所需的锍盐而不使用复分解方法，而不使用大量过量的酸。 其中氢原子与芳基的至少一个碳原子键合的芳基化合物（A）和可以由下式表示的亚砜化合物（B）：R 1 SO 2（其中R 1和R 2）表示可被取代的烃基或杂环基，并且可以相同或不同 ）在强酸（C）的存在下反应，所述强酸（C）可以由下式表示：其中M表示IIIa族或第IIIa族的元素 Va表示卤原子，Y表示羟基，m和n为m + n = 4，n = 0〜3的整数，M为IIIa族的元素， m和n是在M是组Va的元素的情况下使m + n = 6且n = 0〜2的整数）。

    Actinic radiation-curable stereolithographic resin composition having improved stability
    9.
    发明授权
    Actinic radiation-curable stereolithographic resin composition having improved stability 有权
    光稳定的可辐射固化的立体光刻树脂组合物具有改进的稳定性

    公开(公告)号：US08338074B2

    公开(公告)日：2012-12-25

    申请号：US10562098

    申请日：2004-06-24

    申请人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    发明人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  C08G59/68

    CPC分类号： C08G59/687 ,  B33Y70/00 ,  C08F2/50 ,  C08F2/56 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/038

    摘要： It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity. A resin composition for stereolithography which is an actinic radiation-curable resin composition containing a cationic-polymerizable organic compound, a radical-polymerizable organic compound, a photo cationic polymerization initiator and a photo radical polymerization initiator, in which the photo cationic polymerization initiator contains a compound represented by the following formula (I) and having a purity of 80% or higher: wherein M represents an antimony atom or a phosphorus atom; and the broken line between S+ and MF6− represents an ionic bond.

    摘要翻译： 旨在提供以下用于立体光刻的树脂组合物，其在操作中的储存稳定性和老化稳定性优异，在长时间保存时不显示粘度增加，具有高的光固化灵敏度，因此可以在 照相照射，通过立体光刻法，在高制造速度和高生产率下尺寸精度，制造精度，耐水性，耐湿性和机械性能都优异。 一种用于立体光刻的树脂组合物，其是含有阳离子可聚合有机化合物，自由基可聚合有机化合物，光阳离子聚合引发剂和光自由基聚合引发剂的光化辐射固化树脂组合物，其中光阳离子聚合引发剂包含 由下式（I）表示的并且纯度为80％以上的化合物：其中M表示锑原子或磷原子; S +和MF6-之间的虚线表示离子键。

    Actinic radiation-curable stereolithographic resin composition having improved stability
    10.
    发明申请
    Actinic radiation-curable stereolithographic resin composition having improved stability 有权
    光稳定的可辐射固化的立体光刻树脂组合物具有改进的稳定性

    公开(公告)号：US20070060682A1

    公开(公告)日：2007-03-15

    申请号：US10562098

    申请日：2004-06-24

    申请人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    发明人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    IPC分类号： C08C1/14

    CPC分类号： C08G59/687 ,  B33Y70/00 ,  C08F2/50 ,  C08F2/56 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/038

    摘要： It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity. A resin composition for stereolithography which is an actinic radiation-curable resin composition containing a cationic-polymerizable organic compound, a radical-polymerizable organic compound, a photo cationic polymerization inhibitor and a photo radical polymerization inhibitor, in which the photo cationic polymerization inhibitor contains a compound represented by the following formula (I) and having a purity of 80% or higher: wherein M represents an antimony atom or a phosphorus atom; and the broken line between S+ and MF6− represents an ionic bond.

    摘要翻译： 旨在提供以下用于立体光刻的树脂组合物，其在操作中的储存稳定性和老化稳定性优异，在长时间保存时不显示粘度增加，具有高的光固化灵敏度，因此可以在 照相照射，通过立体光刻法，在高制造速度和高生产率下尺寸精度，制造精度，耐水性，耐湿性和机械性能都优异。 一种用于立体光刻的树脂组合物，其是含有阳离子可聚合有机化合物，可自由基聚合的有机化合物，光阳离子聚合抑制剂和光自由基聚合抑制剂的光化辐射固化树脂组合物，其中光阳离子聚合抑制剂含有 由下式（I）表示的并且纯度为80％以上的化合物：其中M表示锑原子或磷原子; 并且S SUP + +和/或MF 6之间的虚线表示离子键。