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    Actinic radiation-curable stereolithographic resin composition having improved stability
    2.
    发明授权
    Actinic radiation-curable stereolithographic resin composition having improved stability 有权
    光稳定的可辐射固化的立体光刻树脂组合物具有改进的稳定性

    公开(公告)号：US08338074B2

    公开(公告)日：2012-12-25

    申请号：US10562098

    申请日：2004-06-24

    申请人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    发明人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  C08G59/68

    CPC分类号： C08G59/687 ,  B33Y70/00 ,  C08F2/50 ,  C08F2/56 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/038

    摘要： It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity. A resin composition for stereolithography which is an actinic radiation-curable resin composition containing a cationic-polymerizable organic compound, a radical-polymerizable organic compound, a photo cationic polymerization initiator and a photo radical polymerization initiator, in which the photo cationic polymerization initiator contains a compound represented by the following formula (I) and having a purity of 80% or higher: wherein M represents an antimony atom or a phosphorus atom; and the broken line between S+ and MF6− represents an ionic bond.

    摘要翻译： 旨在提供以下用于立体光刻的树脂组合物，其在操作中的储存稳定性和老化稳定性优异，在长时间保存时不显示粘度增加，具有高的光固化灵敏度，因此可以在 照相照射，通过立体光刻法，在高制造速度和高生产率下尺寸精度，制造精度，耐水性，耐湿性和机械性能都优异。 一种用于立体光刻的树脂组合物，其是含有阳离子可聚合有机化合物，自由基可聚合有机化合物，光阳离子聚合引发剂和光自由基聚合引发剂的光化辐射固化树脂组合物，其中光阳离子聚合引发剂包含 由下式（I）表示的并且纯度为80％以上的化合物：其中M表示锑原子或磷原子; S +和MF6-之间的虚线表示离子键。

    Actinic radiation-curable stereolithographic resin composition having improved stability
    3.
    发明申请
    Actinic radiation-curable stereolithographic resin composition having improved stability 有权
    光稳定的可辐射固化的立体光刻树脂组合物具有改进的稳定性

    公开(公告)号：US20070060682A1

    公开(公告)日：2007-03-15

    申请号：US10562098

    申请日：2004-06-24

    申请人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    发明人： Takashi Ito ,  Tsuneo Hagiwara ,  Hideki Kimura ,  Masashi Date ,  Jiro Yamamoto

    IPC分类号： C08C1/14

    CPC分类号： C08G59/687 ,  B33Y70/00 ,  C08F2/50 ,  C08F2/56 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/038

    摘要： It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity. A resin composition for stereolithography which is an actinic radiation-curable resin composition containing a cationic-polymerizable organic compound, a radical-polymerizable organic compound, a photo cationic polymerization inhibitor and a photo radical polymerization inhibitor, in which the photo cationic polymerization inhibitor contains a compound represented by the following formula (I) and having a purity of 80% or higher: wherein M represents an antimony atom or a phosphorus atom; and the broken line between S+ and MF6− represents an ionic bond.

    摘要翻译： 旨在提供以下用于立体光刻的树脂组合物，其在操作中的储存稳定性和老化稳定性优异，在长时间保存时不显示粘度增加，具有高的光固化灵敏度，因此可以在 照相照射，通过立体光刻法，在高制造速度和高生产率下尺寸精度，制造精度，耐水性，耐湿性和机械性能都优异。 一种用于立体光刻的树脂组合物，其是含有阳离子可聚合有机化合物，可自由基聚合的有机化合物，光阳离子聚合抑制剂和光自由基聚合抑制剂的光化辐射固化树脂组合物，其中光阳离子聚合抑制剂含有 由下式（I）表示的并且纯度为80％以上的化合物：其中M表示锑原子或磷原子; 并且S SUP + +和/或MF 6之间的虚线表示离子键。

    Method for preparing water absorbent resin
    5.
    发明授权
    Method for preparing water absorbent resin 失效
    吸水树脂的制备方法

    公开(公告)号：US5886120A

    公开(公告)日：1999-03-23

    申请号：US995758

    申请日：1997-12-22

    申请人： Keiji Tanaka ,  Masashi Date ,  Kenjiro Tsubota ,  Tsuyoshi Yuki ,  Satoshi Tamabuchi

    发明人： Keiji Tanaka ,  Masashi Date ,  Kenjiro Tsubota ,  Tsuyoshi Yuki ,  Satoshi Tamabuchi

    IPC分类号： A61F13/53 ,  A61F13/49 ,  A61L15/60 ,  B01J20/26 ,  C08F2/02 ,  C08F2/10 ,  C08F2/44 ,  C08F220/04 ,  C08F251/00 ,  C08F283/00 ,  C08F283/02 ,  C08F283/06 ,  C08F291/00 ,  C08F222/38 ,  C08F220/06

    CPC分类号： C08F2/10 ,  A61L15/60 ,  B01J20/26 ,  B01J20/3278 ,  C08F220/04 ,  C08F291/00

    摘要： A method for producing a water absorbent resin by polymerizing a water-soluble monomer having a polymerizable unsaturated group (A) and a crosslinking agent (B) as the essential components by radical polymerization in the presence of water or, polymerizing a water-soluble monomer having an unsaturated group (A) and a crosslinking agent (B) by radical-graft copolymerization with a water-soluble polymer (C) as the backbone polymer in the presence of water, wherein a water-based solid material capable of being endothermally fused or dissolved into water (D) is added when initiating the polymerization, with at least a part of the water-based solid material (D) in a solid state. By the method of the present invention, a water absorbent resin having a high molecular weight and a high absorption capacity with little water-soluble component can be obtained with ease.

    摘要翻译： 一种通过在水存在下通过自由基聚合将具有可聚合不饱和基团（A）和交联剂（B）的交联剂（B）的水溶性单体聚合制备吸水性树脂的方法，或使水溶性单体聚合 在水的存在下，通过与水溶性聚合物（C）作为主链聚合物进行自由基接枝共聚而具有不饱和基团（A）和交联剂（B），其中，能够吸热的水性固体材料 或者当开始聚合时加入水（D），至少一部分水性固体材料（D）处于固态。 通过本发明的方法，可以容易地获得具有高分子量和高吸收能力的少量水溶性成分的吸水性树脂。

    Method for manufacturing sulfonium salts
    7.
    发明授权
    Method for manufacturing sulfonium salts 失效
    锍盐的制造方法

    公开(公告)号：US07060858B2

    公开(公告)日：2006-06-13

    申请号：US10450517

    申请日：2001-12-17

    申请人： Masashi Date ,  Hideki Kimura ,  Jiro Yamamoto

    发明人： Masashi Date ,  Hideki Kimura ,  Jiro Yamamoto

    IPC分类号： C07C315/00

    CPC分类号： C07C381/12

    摘要： It is an object of the invention to provide a method which makes it possible to manufacture the desired sulfonium salts directly without using a metathesis process and without using acids in large excess amounts. An aryl compound (A) in which a hydrogen atom is bonded to at least one of the carbon atoms of the aryl group, and a sulfoxide compound (B) which can be expressed by the formula: R1 SO R2 (where R1 and R2 indicate hydrocarbon groups or heterocyclic groups which may be substituted, and which may be the same or different) are reacted in the presence of a strong acid (C) which can be expressed by the formula: HMXmYn (where M indicates an element of group IIIa or group Va of the periodic table, X indicates a halogen atom, Y indicates a hydroxyl group, m and n are integers which are such that m+n=4 and n=0 to 3 in cases where M is an element of group IIIa, and m and n are integers which are such that m+n=6 and n=0 to 2 in cases where M is an element of group Va).

    摘要翻译： 本发明的一个目的是提供一种方法，其可以直接制备所需的锍盐而不使用复分解方法，而不使用大量过量的酸。 其中氢原子与芳基的至少一个碳原子键合的芳基化合物（A）和可以由下式表示的亚砜化合物（B）：R 1 SO 2（其中R 1和R 2）表示可被取代的烃基或杂环基，并且可以相同或不同 ）在强酸（C）的存在下反应，所述强酸（C）可以由下式表示：其中M表示IIIa族或第IIIa族的元素 Va表示卤原子，Y表示羟基，m和n为m + n = 4，n = 0〜3的整数，M为IIIa族的元素， m和n是在M是组Va的元素的情况下使m + n = 6且n = 0〜2的整数）。

    Process for producing water absorbent resin
    10.
    发明授权
    Process for producing water absorbent resin 失效
    吸水树脂的制造方法

    公开(公告)号：US5384368A

    公开(公告)日：1995-01-24

    申请号：US201234

    申请日：1994-02-24

    申请人： Masashi Date ,  Takashi Sumiya ,  Hitoshi Takai

    发明人： Masashi Date ,  Takashi Sumiya ,  Hitoshi Takai

    IPC分类号： C08F8/30 ,  A61L15/60 ,  B01J20/26 ,  C08G81/00 ,  C08K5/3412 ,  C08L101/00

    CPC分类号： B01J20/26 ,  A61L15/60

    摘要： The present invention relates to a process for producing water absorbent resin comprising a step of adding a high-molecular crosslinking agent which has at least 2 azetidinium salt groups in the molecule and has at least 1000 weight-average molecular weight to the water absorbent resin paticles having carboxylic groups and carboxylic acid salt groups and a step of efficiently crosslinking the vicinity of the surface of the water absorbent resin particles. In the process for producing water absorbent resin according to the present invention, the use of high-molecular crosslinking agent achieves less permeation of the crosslinking agent into the water absorbent resin particles and enables efficient crosslinking of the vicinity of the surface of the water absorbent resin particles. Consequently, the water absorbent resin having high water absorbency both under pressure-free state and under loading can be manufactured. Because the crosslinking agent contains a large amount of azetidinium salt groups highly reactive to carboxylic acid groups or carboxylic acid salt groups in the molecule, the water absorbent resin having high crosslinking efficiency, good safety, and good flowability can be manufactured.

    摘要翻译： 本发明涉及一种生产吸水性树脂的方法，其包括在分子中加入至少具有2个氮杂环丁烷鎓盐基并且具有至少1000重量平均分子量的高分子交联剂的步骤， 具有羧基和羧酸盐基团以及有效地交联吸水性树脂颗粒表面附近的步骤。 在本发明的吸水性树脂的制造方法中，使用高分子交联剂使交联剂在吸水性树脂粒子中的渗透性降低，能够使吸水性树脂表面附近的高效交联 粒子。 因此，可以制造在无压力状态和负载下都具有高吸水性的吸水性树脂。 由于交联剂含有大量与分子中的羧酸基团或羧酸盐基团反应性高的氮杂环丁烷鎓盐基，所以可以制造交联效率高，安全性好，流动性良好的吸水性树脂。