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    Continuous sputtering apparatus
    1.
    发明授权
    Continuous sputtering apparatus 失效
    连续溅射装置

    公开(公告)号：US4675096A

    公开(公告)日：1987-06-23

    申请号：US645671

    申请日：1984-08-30

    申请人： Hideki Tateishi ,  Tamotsu Shimizu ,  Susumu Aiuchi ,  Katsuhiro Iwashita ,  Hiroshi Nakamura

    发明人： Hideki Tateishi ,  Tamotsu Shimizu ,  Susumu Aiuchi ,  Katsuhiro Iwashita ,  Hiroshi Nakamura

    IPC分类号： B65G49/07 ,  C23C14/34 ,  C23C14/56 ,  H01L21/203 ,  C23C14/36

    CPC分类号： C23C14/566 ,  C23C14/568

    摘要： A continuous sputtering apparatus comprising a main vacuum chamber, one loading station and a plurality of process stations capable of having their pressures controlled separately. The process station includes a sub vacuum chamber capable of being in communication with the main vacuum chamber through an opening and an evacuation port. The loading station and the process stations are arranged to be spaced with equal angles. Substrate holders are provided to face the stations and are rotated by said equal angle in a time. The substrate holder opens and closes the opening of the sub vacuum chamber to serve as a gate valve.

    摘要翻译： 一种连续溅射装置，包括主真空室，一个装载站和能够分别控制其压力的多个处理站。 处理站包括能够通过开口和排气口与主真空室连通的副真空室。 装载站和处理站被布置为以相等角度间隔开。 基板保持器被设置成面对车站，并且在一段时间内以相等的角度旋转。 基板保持器打开和关闭副真空室的开口以用作闸阀。

    Projecting apparatus
    2.
    发明授权
    Projecting apparatus 失效
    投影仪

    公开(公告)号：US4420233A

    公开(公告)日：1983-12-13

    申请号：US381675

    申请日：1982-05-24

    申请人： Mineo Nomoto ,  Katsuhiro Iwashita ,  Toru Otsubo ,  Susumu Aiuchi

    发明人： Mineo Nomoto ,  Katsuhiro Iwashita ,  Toru Otsubo ,  Susumu Aiuchi

    IPC分类号： G03B13/36 ,  G02B7/28 ,  G03B3/10 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/34 ,  G03B21/28

    CPC分类号： G03F7/70891 ,  G03B3/10 ,  G03F9/70

    摘要： A projecting apparatus for forming an image of a mask on a wafer by a projector of a unit magnification reflection system having a concave spherical mirror and a convex spherical mirror. The distance from the projector to the mask or the upper side of a mask holder for holding the mask and the distance from the projector to the wafer are measured. An error of the image-forming position is computed from the distance measurements. At least one of the mask, the wafer and the projector is moved along the direction of projection in a manner to eliminate the error of the image-forming position computed, thus attaining automatic focus adjustment.

    摘要翻译： 一种用于通过具有凹球面镜和凸球面镜的单元放大反射系统的投影仪在晶片上形成掩模图像的投影设备。 测量从投影仪到掩模的距离或用于保持面罩的掩模支架的上侧以及从投影仪到晶片的距离。 从距离测量计算图像形成位置的误差。 掩模，晶片和投影仪中的至少一个沿着投影方向移动，以消除所计算的图像形成位置的误差，从而获得自动聚焦调整。