公开(公告)号：US08139198B2

公开(公告)日：2012-03-20

申请号：US11403922

申请日：2006-04-14

申请人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

发明人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

摘要翻译： 通过投影光学系统通过液体的曝光束的一部分进入透光部分，而不通过气体进入光学部件并被聚焦。 即使投影光学系统的数值孔径增加，曝光装置接收来自投影光学系统的曝光光也进行各种测量。

公开(公告)号：US07474386B2

公开(公告)日：2009-01-06

申请号：US11710552

申请日：2007-02-26

申请人： Tadahito Fujisawa ,  Soichi Inoue ,  Makoto Kobayashi ,  Masashi Ichikawa ,  Tsuneyuki Hagiwara ,  Kenichi Kodama

发明人： Tadahito Fujisawa ,  Soichi Inoue ,  Makoto Kobayashi ,  Masashi Ichikawa ,  Tsuneyuki Hagiwara ,  Kenichi Kodama

IPC分类号： G03B27/58 ,  G03B27/32 ,  G03B27/52

CPC分类号： G01B21/30 ,  G01B11/306 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness calculating method is selected according to a position of the site to be evaluated and flatness in the wafer surface is acquired.

摘要翻译： 公开了一种晶片平坦度评估方法，其包括测量晶片的前后表面形状。 测量的晶圆正面分为几个部位。 然后，根据要评估的位置的位置选择平坦度计算方法，并获得晶片表面的平坦度。

公开(公告)号：US20080030715A1

公开(公告)日：2008-02-07

申请号：US11630353

申请日：2005-06-21

申请人： Naoto Kondo ,  Tsuneyuki Hagiwara

发明人： Naoto Kondo ,  Tsuneyuki Hagiwara

IPC分类号： G01N21/00

CPC分类号： G03F9/7026 ,  G03F9/7088

摘要： An aerial image of a measurement mark (PM) arranged on a measurement mask (Rm) is conformed to a center in an X-axis direction of a slit (122) arranged on a Z tilt stage (38). While illuminating the measurement mark with an illumination light (IL), a slit plate (190) on which the slit (122) is formed is continuously moved in a Z-axis direction, and based on position information of the slit (122) obtained during the movement and a photoelectric conversion signal outputted from an optical sensor (24) that receives the illumination light (IL) from the measurement mark (PM) via a projection optical system (PL) and the slit (122), a best focus position is detected. Thus, the best focus position of the projection optical system can be measured in a short period of time.

摘要翻译： 布置在测量掩模（Rm）上的测量标记（PM）的空间图像与布置在Z倾斜台（38）上的狭缝（122）的X轴方向上的中心一致。 在用照明光​​（IL）照射测量标记的同时，形成有狭缝122的狭缝板（190）在Z轴方向上连续移动，并且基于获得的狭缝（122）的位置信息 在从运动中经由投影光学系统（PL）和狭缝（122）从测量标记（PM）接收照明光（IL）的光学传感器（24）输出的光电转换信号中，最佳聚焦位置 被检测到。 因此，可以在短时间内测量投影光学系统的最佳聚焦位置。

公开(公告)号：US20070260419A1

公开(公告)日：2007-11-08

申请号：US11658034

申请日：2005-07-21

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G06F19/00

CPC分类号： G03F7/70358 ,  G03F7/70666 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7069 ,  G03F9/7088

摘要： A main controller moves a reticle stage in a scanning direction, illuminates an area on a reticle including a mark area in which predetermined marks are formed with illumination light, forms an aerial image of at least one mark existing in the mark area via a projection optical system, and measures the aerial image using an aerial image measuring unit. The main controller repeatedly performs such aerial image measurement while moving the reticle stage in the scanning direction. Then, the main controller computes a scanning image plane on which an image of a pattern formed on a reticle is formed by the projection optical system, based on the measurement result of the aerial image of each mark at each movement position. Based on the computation result, the main controller performs focus leveling control of a wafer during scanning exposure. Thus, highly accurate exposure is realized without using a sensor for reticle (mask) position measurement.

摘要翻译： 主控制器沿着扫描方向移动标线片台，照亮包含具有用照明光形成预定标记的标记区域的掩模版上的区域，经由投影光学形成存在于标记区域中的至少一个标记的空间图像 系统，并使用空中图像测量单元测量空中图像。 主控制器在沿着扫描方向移动标线片平台的同时重复执行这种空间图像测量。 然后，主控制器基于每个移动位置处的每个标记的空中图像的测量结果来计算由投影光学系统形成在掩模版上的图案的图像的扫描图像平面。 基于计算结果，主控制器在扫描曝光期间执行晶片的聚焦调平控制。 因此，在不使用用于掩模版（掩模）位置测量的传感器的情况下实现高度准确的曝光。

公开(公告)号：US20070146708A1

公开(公告)日：2007-06-28

申请号：US11602977

申请日：2006-11-22

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01B11/00

CPC分类号： G03F9/7076

摘要： Since a wafer mark formed on a wafer has a periodic structure that weakens the intensity of even-order diffraction light rather than the intensity of odd-order diffraction light that is the reflected light of illumination light from a light source of an alignment system, measurement error of positional information of the wafer mark caused by the even-order diffraction light is reduced. Further, there is no need to set the duty ratio of the wafer mark to 1:1, so that the reflectance of the entire mark can be enhanced and it becomes possible to easily measure the mark position by the alignment system.

摘要翻译： 由于形成在晶片上的晶片标记具有削弱偶数衍射光的强度的周期性结构，而不是来自对准系统的光源的作为照明光的反射光的奇数衍射光的强度，测量 由偶数衍射光引起的晶片标记的位置信息的误差降低。 此外，不需要将晶片标记的占空比设置为1:1，从而可以提高整个标记的反射率，并且可以通过对准系统容易地测量标记位置。

公开(公告)号：US5838433A

公开(公告)日：1998-11-17

申请号：US636511

申请日：1996-04-19

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/956 ,  G01N21/00

CPC分类号： G03F1/84 ,  G01N21/95623

摘要： The present invention discloses a mask defect inspection apparatus for optically detecting a defect on a mask having a circuit pattern, which comprises an illumination system for illuminating the mask with inspection light; a first light receiving optical system for receiving the inspection light reflected by the mask; a second light receiving optical system for receiving the inspection light transmitted by the mask; a first spatial filter for shielding the inspection light passing through a central region including the optical axis of the first light receiving optical system in an optical Fourier transform plane for the circuit pattern in the first light receiving optical system; a second spatial filter for shielding the inspection light passing through a central region including the optical axis of the second light receiving optical system in an optical Fourier transform plane for the circuit pattern in the second light receiving optical system; a first detector for photoelectrically converting the inspection light having passed through the first spatial filter; a second detector for photoelectrically converting the inspection light having passed through the second spatial filter; and a gain adjusting circuit for adjusting a gain of a first output signal from the first detector to output a third output signal and adjusting a gain of a second output signal from the second detector to output a fourth output signal, wherein the defect is detected based on either a relative intensity difference or intensity ratio between the third output signal and the fourth output signal gain-adjusted by the gain adjusting circuit.

摘要翻译： 本发明公开了一种用于光学检测具有电路图案的掩模上的缺陷的掩模缺陷检查装置，其包括用检查光照亮掩模的照明系统; 用于接收由掩模反射的检查光的第一光接收光学系统; 用于接收由掩模传输的检查光的第二光接收光学系统; 第一空间滤波器，用于屏蔽在第一光接收光学系统中的电路图案的光学傅里叶变换平面中通过包括第一光接收光学系统的光轴的中心区域的检查光; 第二空间滤波器，用于屏蔽在第二光接收光学系统中的电路图案的光学傅里叶变换平面中通过包括第二光接收光学系统的光轴的中心区域的检查光; 用于光电转换已经通过第一空间滤光器的检查光的第一检测器; 第二检测器，用于对已通过第二空间滤光器的检查光进行光电转换; 以及增益调整电路，用于调整来自所述第一检测器的第一输出信号的增益以输出第三输出信号，并且调节来自所述第二检测器的第二输出信号的增益以输出第四输出信号，其中，基于所检测的所述缺陷 在第三输出信号和由增益调整电路调节的增益的第四输出信号之间的相对强度差或强度比上。

公开(公告)号：US5736735A

公开(公告)日：1998-04-07

申请号：US715638

申请日：1996-09-18

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/94 ,  G02B26/10 ,  G02F1/01

CPC分类号： G02B26/10 ,  G01N21/94

摘要： An optical scanning device includes a light deflection unit for deflecting a light beam emitted by a light source to be incident on an object to be irradiated, a polarization state adjusting unit for adjusting the polarization state of the light beam, so that the light beam to be incident on the object to be irradiated has a predetermined polarization state with respect to the object to be irradiated, and a rotary driving unit for rotating the light deflection unit and the polarization state adjusting unit together so that the light beam deflected by the light deflection unit scans the object to be irradiated.

摘要翻译： 光学扫描装置包括：光偏转单元，用于使由入射到待照射物体上的光源发射的光束偏转;偏振状态调整单元，用于调节光束的偏振状态，使得光束到 入射到被照射物体上的相对于被照射物体具有预定的偏振状态，以及用于将光偏转单元和偏振状态调整单元一起旋转的旋转驱动单元，使得由光偏转偏转的光束 单位扫描要照射的物体。

公开(公告)号：US5471066A

公开(公告)日：1995-11-28

申请号：US294990

申请日：1994-08-24

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01N21/956 ,  G01R31/34 ,  G01N21/88

CPC分类号： G01R31/34 ,  G01N21/95623

摘要： A simple signal processing system is utilized to detect defects on the surface of a substrate formed with a circuit pattern at high speed. Light flux from a light source illuminates an inspection point P on the wafer. The light flux from the inspection point P passes a Fourier transform lens and forms a Fourier transform spectrum of the circuit pattern on the inspection point P in the rear focal plane. From the Fourier transform spectrum, a Fourier transform spectrum including no defect information is eliminated by a spatial filter and thereafter the light flux is received by a photoelectric converting device. While the wafer is rotated by a turn table and shifted in a y direction, the spatial filter is rotated in synchronism with rotation of the wafer.

摘要翻译： 利用简单的信号处理系统，以高速检测形成有电路图案的基板表面的缺陷。 来自光源的光通量照射晶片上的检查点P. 来自检查点P的光通过傅立叶变换透镜，并在后焦平面上的检查点P上形成电路图案的傅里叶变换光谱。 从傅里叶变换光谱中，通过空间滤波器消除不包括缺陷信息的傅立叶变换光谱，之后由光电转换装置接收光束。 当晶片通过转台旋转并沿y方向移位时，空间滤波器与晶片的旋转同步地旋转。

公开(公告)号：US5442189A

公开(公告)日：1995-08-15

申请号：US124461

申请日：1993-09-22

申请人： Tsuneyuki Hagiwara

发明人： Tsuneyuki Hagiwara

IPC分类号： G01B11/24 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/66

CPC分类号： G01N21/95623

摘要： An apparatus for inspecting defects and foreign substances on an object to be inspected comprises: an illumination optical system for illuminating a spot of illuminated area on a semiconductor wafer; a lens for executing Fourier transform of the patterns of said illuminated area; a spatial filter for blocking the components of the resultant Fourier transform images corresponding to the patterns having no defects; a lens for executing inverse Fourier transform of the light which is transmitted through the spatial filter to form images of the defect(s); and a photo detector array for receiving the images of the defect(s).

摘要翻译： 一种用于检查被检测物体上的缺陷和异物的装置包括：照明光学系统，用于照射半导体晶片上的照明区域的点; 用于执行所述照明区域的图案的傅里叶变换的透镜; 空间滤波器，用于阻止对应于没有缺陷的图案的所得到的傅里叶变换图像的分量; 用于对通过空间滤波器传输的光进行傅里叶逆变换以形成缺陷的图像的透镜; 以及用于接收缺陷的图像的光电检测器阵列。

公开(公告)号：US5363187A

公开(公告)日：1994-11-08

申请号：US76697

申请日：1993-06-15

申请人： Tsuneyuki Hagiwara ,  Fuminori Hayano

发明人： Tsuneyuki Hagiwara ,  Fuminori Hayano

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N2021/4711 ,  G01N21/4788

摘要： A foreign particle detecting apparatus comprises a light source for radiating coherent light onto an object to be detected on a surface of which a circuit pattern is formed, a focusing device for focusing the light emitted from the light source onto the object to be detected at a predetermined angular aperture, a device for moving the incident light focused at the predetermined angular aperture relative to the object to be detected, and a detector for receiving scattered light produced upon incidence of the focused light onto the object to be detected, and which detects foreign matter on the object to be detected on the basis of an output signal from the detector. Foreign matter is discriminated from the circuit pattern on the basis of the output signal from the detector means. The detector comprises at least two light-receiving elements, separated by a spatial angle substantially equal to or slightly larger than the angular aperture of the incident light, for individually outputting signals.

摘要翻译： 异物检测装置包括用于在形成有电路图案的表面上将相干光辐射到待检测物体上的光源，用于将从光源发射的光聚焦到待检测物体的聚焦装置， 预定的角度孔，用于使聚焦在预定角度孔的入射光相对于待检测物体移动的装置，以及用于接收在聚焦光入射到被检测物上时产生的散射光的检测器，并且检测外部 在基于来自检测器的输出信号的待检测物体上的物质。 基于来自检测器装置的输出信号，异物与电路图案区分开。 检测器包括至少两个光接收元件，其被基本上等于或稍大于入射光的角孔径的空间角度分开，用于单独地输出信号。