Manufacturing method of conductive or superconductive thin film
    1.
    发明授权
    Manufacturing method of conductive or superconductive thin film 失效
    导电或超导薄膜的制造方法

    公开(公告)号:US4902671A

    公开(公告)日:1990-02-20

    申请号:US159987

    申请日:1988-02-24

    IPC分类号: C23C14/08 C23C14/34 H01L39/24

    摘要: The present invention provides a manufacturing method of a conductive or superconductive thin film of mixed oxide as an easier way to apply the mixed oxide type superconductive materials to electronic devices, etc. The manufacturing method of the present invention comprises using a mixed oxide composition showing conductivity or superconductivity as a target material and sputtering it onto a substrate to form a thin film. Examples of the mixed oxide compositions showing conductivity or superconductivity and to be used as the target material in the present invention are mixed oxides consisting of lanthanoid, alkali earth metal and copper as main components, particularly, a mixed oxide consisting essentially of La-Sr-Cu-O, La-Ba-Cu-O, La-Ca-Cu-O etc. or mixtures thereof, materials containing a small quantity of other metal oxide(s), or mixed oxides mainly consisting of Yb-Ba-Cu-O, Er-Ba-Cu-O, Ho-Ba-Cu-O, Tm-Ba-Cu-O or mixtures thereof.

    摘要翻译: 本发明提供一种混合氧化物的导电或超导薄膜的制造方法,作为将复合氧化物型超导材料应用于电子器件等的更容易的方法。本发明的制造方法包括使用显示导电性的混合氧化物组合物 或超导性作为靶材料,并将其溅射到衬底上以形成薄膜。 显示出导电性或超导性并用作本发明的靶材料的混合氧化物组合物的实例是以镧系元素,碱土金属和铜为主要成分的混合氧化物,特别是基本上由La-Sr- Cu-O,La-Ba-Cu-O,La-Ca-Cu-O等或其混合物,含有少量其它金属氧化物的材料或主要由Yb-Ba-Cu- O,Er-Ba-Cu-O,Ho-Ba-Cu-O,Tm-Ba-Cu-O或其混合物。

    Process for forming multilayer thin film
    2.
    发明授权
    Process for forming multilayer thin film 失效
    多层薄膜成型工艺

    公开(公告)号:US4933300A

    公开(公告)日:1990-06-12

    申请号:US155546

    申请日:1988-02-12

    摘要: A superlattice film is formed by introducing a mixture of a first gas reactant capable of only plasma-excited chemical reaction and a second gas reactant capable of both plasma-excited chemical reactions into a reaction chamber, discontinuously carrying out plasma-excited chemical reaction, and continuously carrying out light-excited chemical reaction, thereby alternately depositing on a substrate a thin film layer which is formed when the plasma- and light-excited chemical reactions are carried out and another thin film layer which is formed when the plasma-excited chemical reaction is interrupted, thereby forming a thin film of alternately deposited layers.

    摘要翻译: 通过将能够仅进行等离子体激发的化学反应的第一气体反应物和能够等离子体激发的化学反应的第二气体反应物的混合物引入反应室,不连续地进行等离子体激发的化学反应,形成超晶格膜,以及 连续地进行光激发的化学反应,从而在基板上交替地沉积在进行等离子体和光激发的化学反应时形成的薄膜层和当等离子体激发的化学反应形成的另一薄膜层时 被中断,从而形成交替沉积层的薄膜。