公开(公告)号：US09046474B2

公开(公告)日：2015-06-02

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213 ,  G01N2021/214

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

公开(公告)号：US09007583B2

公开(公告)日：2015-04-14

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

公开(公告)号：US20130010296A1

公开(公告)日：2013-01-10

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00

CPC分类号： G01N21/211 ,  G01N2021/213 ,  G01N2021/214

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

公开(公告)号：US09625823B1

公开(公告)日：2017-04-18

申请号：US13094912

申请日：2011-04-27

申请人： Torsten R. Kaack ,  Leonid Poslavsky ,  Yu Tay

发明人： Torsten R. Kaack ,  Leonid Poslavsky ,  Yu Tay

IPC分类号： G01L1/00 ,  G03F7/20

CPC分类号： G03F7/70 ,  G01L5/0047 ,  H01L22/12

摘要： A system and method for local film stress calculation is disclosed. The method may include specifying a plurality of measurement points on a substrate, the substrate being configured to receive a film deposition; obtaining a local film thickness measurement for each measurement point; obtaining a local wafer shape parameter for each measurement point; and calculating a local film stress value for each measurement point based on the local film thickness measurement and the local wafer shape parameter for each corresponding measurement point. The method may further include specifying a plurality of estimation points on the substrate; obtaining a local wafer shape parameter for each estimation point; calculating an estimated local film thickness for each estimation point; and calculating a local film stress value for each estimation point based on the estimated local film thickness and the local wafer shape parameter for each corresponding estimation point.

公开(公告)号：US20130006539A1

公开(公告)日：2013-01-03

申请号：US13524053

申请日：2012-06-15

申请人： Ming Di ,  Torsten R. Kaack ,  Qiang Zhao ,  Xiang Gao ,  Leonid Poslavsky

发明人： Ming Di ,  Torsten R. Kaack ,  Qiang Zhao ,  Xiang Gao ,  Leonid Poslavsky

IPC分类号： G06F19/00 ,  G01J3/02

CPC分类号： G01N21/211 ,  G01N21/8422 ,  G01N2021/213

摘要： The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.

摘要翻译： 本发明包括生成多个半导体晶片的实验（DOE）的三维设计，DOE的第一维度是薄膜的第一分量的相对量，DOE的第二维度是相对的 量的第二分量，DOE的第三维度是薄膜的厚度，获取每个晶片的光谱，通过提取实数分量（n）和产生一组光散射数据 用于识别所述光学色散数据集合中的一个或多个系统特征的每个所获取的光谱的复折射率的虚分量（k）; 以及使用所述一组或多个光学色散数据的一个或多个系统特征来生成多分量Bruggeman有效中等近似（BEMA）模型。

公开(公告)号：US07903250B1

公开(公告)日：2011-03-08

申请号：US12477571

申请日：2009-06-03

申请人： Fabio A. Faccini ,  Torsten R. Kaack ,  Jiyou Fu ,  Zhiming Jiang

发明人： Fabio A. Faccini ,  Torsten R. Kaack ,  Jiyou Fu ,  Zhiming Jiang

IPC分类号： G01N21/55

CPC分类号： G01N21/55 ,  G01N21/9501

摘要： A method of performing an investigation of a substrate, by measuring a reflectivity of the substrate, comparing the reflectivity of the substrate to an anticipated reflectivity value, selectively subjecting the substrate to a laser beam for a predetermined duration and at a predetermined energy only when the reflectivity of the substrate is within a specified tolerance of the anticipated reflectivity value, selectively signaling a fault condition when the reflectivity of the substrate is not within the specified tolerance of the anticipated reflectivity value, and selectively performing the investigation of the substrate only when the reflectivity of the substrate is within the specified tolerance of the anticipated reflectivity value.

摘要翻译： 通过测量衬底的反射率，将衬底的反射率与预期反射率值进行比较来选择性地对衬底进行预定的时间和激光束的处理的方法，只有当 衬底的反射率在预期反射率值的特定公差内，当衬底的反射率不在预期反射率值的规定公差内时选择性地发信号通知故障状态，并且仅当反射率 的基板在预期反射率值的规定公差内。

公开(公告)号：US07453562B1

公开(公告)日：2008-11-18

申请号：US11863334

申请日：2007-09-28

申请人： Torsten R. Kaack ,  Shankar Krishnan ,  Fabio A. Faccini

发明人： Torsten R. Kaack ,  Shankar Krishnan ,  Fabio A. Faccini

IPC分类号： G01N21/00

CPC分类号： G01N21/33

摘要： A method of performing a measurement of properties of a sample, by directing a first beam of light at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The first beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. A length of time is waited, sufficient for the damage to substantially heal, before a second beam of light is directed at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The second beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. The first and second electrical signals are analyzed to determine the properties of the sample.

摘要翻译： 通过在样品处引入第一光束，其中波长，能量和时间长度的组合足以引起对样品的暂时损坏，来执行样品的性质的测量的方法。 第一个光束从样品反射。 感测反射光束的特性以产生信号。 在第二光束被引导到样品之前等待长度的时间足以使损伤基本上愈合，其中波长，能量和时间长度的组合足以引起对样品的暂时损坏。 第二个光束从样品反射。 感测反射光束的特性以产生信号。 分析第一和第二电信号以确定样品的性质。