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公开(公告)号：US20240011894A1
公开(公告)日：2024-01-11
申请号：US18218692
申请日：2023-07-06
Inventor： Thomas Avery Germer
IPC: G01N21/21
CPC classification number: G01N21/211 , G01N2021/215 , G01N2021/214 , G01N2201/126
Abstract: Embodiments of the present invention relate to an ellipsometer that includes a combination of a plurality of reflective devices to measure a Mueller matrix reflectance of a material in the VUV and EUV region. Ellipsometer in accordance with embodiments of the present invention relate to an ellipsometer that includes a multi-mirror polarization state generator combined with a multi-mirror polarization state analyzer and a detector to realize a Mueller matrix ellipsometer. Embodiments of the present invention utilize two rotating assemblies with each assembly including multiple mirrors that combine to act as amplitude and phase retarders.
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公开(公告)号：US20230204493A1
公开(公告)日：2023-06-29
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
CPC classification number: G01N21/211 , G01N21/9501 , G02B27/10 , G01N2021/214
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US09785047B2
公开(公告)日：2017-10-10
申请号：US14754759
申请日：2015-06-30
Inventor： Shiyuan Liu , Weichao Du , Chuanwei Zhang , Yinyin Tan
CPC classification number: G03F7/00 , G01B11/0641 , G01B11/24 , G01B2210/56 , G01N2021/214 , G03F7/70625
Abstract: A device for measuring a large-area and massive scattered field in nanoscale. The device includes a polarization state generator disposed on an output optical path of a laser source, a polarization state analyzer operating to demodulate a polarized light beam emitted thereon, a first objective lens and a first lens disposed on an optical path of a sample stage, and a scanning mirror disposed on an optical path in front of or at the rear of the polarization state generator.
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公开(公告)号：US20160146596A1
公开(公告)日：2016-05-26
申请号：US14704136
申请日：2015-05-05
Applicant: Samsung Display Co., Ltd.
Inventor： Sejoon Oh
IPC: G01B11/26 , G02F1/1337 , G02F1/1368 , G02F1/1335 , G02F1/13 , G02F1/1343
CPC classification number: G01B11/26 , G01N21/21 , G01N2021/214 , G01N2021/218 , G02F1/1309 , G02F1/1337 , G02F1/1393 , G02F2001/133746 , G02F2001/133749 , G02F2001/133773
Abstract: An apparatus and method for measuring a pretilt angle of a liquid crystal (LC) are disclosed. The method includes irradiating polarized light on an LC cell including a first substrate, a second substrate facing the first substrate, and an LC layer between the first substrate and the second substrate. At least one of the first substrate and the second substrate includes a minute branch electrode. Irradiated light is scanned within a predetermined angle range in a direction not parallel to the minute branch electrode, an intensity of light that is transmitted through the LC cell is detected, and a pretilt angle of the LC is obtained by using a light intensity detection signal corresponding to the transmitted light.
Abstract translation: 公开了一种用于测量液晶（LC）的预倾角的装置和方法。 该方法包括在包括第一衬底，面对第一衬底的第二衬底以及第一衬底和第二衬底之间的LC层的LC单元上照射偏振光。 第一基板和第二基板中的至少一个包括微分支电极。 在与分支电极不平行的方向上的预定角度范围内扫描照射的光，检测通过LC单元透射的光的强度，并且通过使用光强度检测信号来获得LC的预倾斜角 对应于透射光。
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公开(公告)号：US20150285735A1
公开(公告)日：2015-10-08
申请号：US14745047
申请日：2015-06-19
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Klaus Flock , Lawrence Rotter , Shankar Krishnan , Johannes D. de Veer , Catalin Filip , Gregory Brady , Muzammil Arain , Andrei Shchegrov
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2021/214 , G01N2021/8848 , G01N2201/06113 , G01N2201/0636
Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。
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Patent Agency Ranking
6.发明授权Fast sample height, AOI and POI alignment in mapping ellipsometer or the like 有权快速样品高度，AOI和POI校准在映射椭偏仪等公开(公告)号：US08436994B2
公开(公告)日：2013-05-07
申请号：US12930762
申请日：2011-01-15
Applicant: Martin M. Liphardt , Jeffrey S. Hale , Ping He , Galen L. Pfeiffer
Inventor： Martin M. Liphardt , Jeffrey S. Hale , Ping He , Galen L. Pfeiffer
IPC: G01J4/00
CPC classification number: G01N21/01 , G01N21/21 , G01N21/211 , G01N21/55 , G01N2021/151 , G01N2021/212 , G01N2021/213 , G01N2021/214 , G01N2201/021 , G01N2201/0693
Abstract: A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling calibration and very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems.
Abstract translation: 与对准系统（AS）功能组合的样本调查系统（ES）以及启用校准和非常快速（例如秒），样本高度，入射角度和入射平面调整的方法，具有 映射椭偏仪等应用。
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公开(公告)号：US20130003068A1
公开(公告)日：2013-01-03
申请号：US13174815
申请日：2011-07-01
Applicant: Shankar Krishnan , Haiming Wang
Inventor： Shankar Krishnan , Haiming Wang
CPC classification number: G01N21/55 , G01B11/065 , G01B2210/56 , G01J3/021 , G01J3/0229 , G01J3/42 , G01N21/00 , G01N21/211 , G01N2021/213 , G01N2021/214 , G01N2201/0675
Abstract: A spectroscopic instrument for conducting multi-wavelength, multi-azimuth, multi-angle-of-incidence readings on a substrate, the instrument having a broadband light source for producing an illumination beam, an objective for directing the illumination onto the substrate at multiple azimuth angles and multiple angels-of-incidence simultaneously, thereby producing a reflection beam, an aperture plate having an illumination aperture and a plurality of collection apertures formed therein for selectively passing portions of the reflection beam having desired discreet combinations of azimuth angle and angle-of-incident, a detector for receiving the discreet combinations of azimuth angle and angle-of-incident and producing readings, and a processor for interpreting the readings.
Abstract translation: 一种用于在衬底上进行多波长，多方位角，多角度入射读数的光谱仪器，该仪器具有用于产生照明光束的宽带光源，用于将多个方位角的照明引导到衬底上的物镜 角度和多个入射角，从而产生反射光束，具有照明孔的孔板和形成在其中的多个收集孔，用于选择性地通过具有期望的方位角和角度的离散组合的反射光束的部分 - 用于接收方位角和入射角的离散组合并产生读数的检测器，以及用于解释读数的处理器。
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8.发明申请公开(公告)号：US20120033216A1
公开(公告)日：2012-02-09
申请号：US13271014
申请日：2011-10-11
Applicant: Fang Huang
Inventor： Fang Huang
IPC: G01J4/00
CPC classification number: G01N21/23 , G01N2021/214 , G01N2201/0683
Abstract: A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled.
Abstract translation: 投影在治疗对象上的治疗方式（例如聚焦点，图像，或干涉图）如果在到达目标物体之前必须通过双折射层，则可能失去精度。 在一般情况下，双折射层将处理束分裂成普通和非凡的分量，其在不同方向上传播并在目标层处形成两个相互置换的图案。 影响位移量的光轴的双折射度和取向通常在工件之间或同一工件上的轨迹之间变化。 本发明测量光轴的取向，并使用该数据来调整治疗光束入射方向，治疗束偏振或两者以将普通和非凡成分叠加成靶上的单一处理图案，防止双折射层引起 模式被模糊或加倍。
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9.发明申请Fast sample height, AOI and POI alignment in mapping ellipsometer or the like 有权快速样品高度，AOI和POI校准在映射椭偏仪等公开(公告)号：US20090103093A1
公开(公告)日：2009-04-23
申请号：US12313760
申请日：2008-11-25
Applicant: Martin M. Liphardt , Jeffrey S. Hale , Ping He , Galen L. Pfeiffer
Inventor： Martin M. Liphardt , Jeffrey S. Hale , Ping He , Galen L. Pfeiffer
IPC: G01N21/21
CPC classification number: G01N21/211 , G01N21/01 , G01N21/21 , G01N21/55 , G01N2021/151 , G01N2021/212 , G01N2021/213 , G01N2021/214 , G01N2201/021 , G01N2201/0693
Abstract: A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems.
Abstract translation: 与对准系统（AS）功能组合的样本调查系统（ES）以及启用非常快速（例如秒），样本高度，入射角度和入射平面调整的方法，应用于 映射椭偏仪等。
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公开(公告)号：US20040246481A1
公开(公告)日：2004-12-09
申请号：US10866424
申请日：2004-06-10
Applicant: Accent Optical Technologies, Inc.
Inventor： John V. Sandusky
IPC: G01J004/00
CPC classification number: G01J3/02 , G01J3/0229 , G01N21/47 , G01N2021/214
Abstract: Methods for differential numerical aperture analysis of samples, utilizing angle-of-incidence measurements resulting from variable illumination or observation numerical apertures, or both. Metrology applications are provided, and more particularly including scatterometer, ellipsometer and similar analysis methods, including bi-directional reflectance or transmission distribution function measurement.
Abstract translation: 使用样品的差分数值孔径分析方法，利用由可变照明或观察数值孔径引起的入射角度测量，或两者。 提供了测量应用，更具体地包括散射仪，椭偏仪和类似的分析方法，包括双向反射或传输分布函数测量。
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