-
1.发明授权公开(公告)号：US07904836B2
公开(公告)日：2011-03-08
申请号：US11785802
申请日：2007-04-20
申请人： Hiroki Yoshikawa , Masahiro Ogawa
发明人： Hiroki Yoshikawa , Masahiro Ogawa
IPC分类号： G06F3/048
CPC分类号： G06F3/0485 , G06F3/0482
摘要： An image reproduction method includes: a reduced-size image reading step of reading a plurality of reduced-size images from a recording medium and storing the reduced-size images in a memory; a display step of multi-displaying the plurality of reduced-size images on a monitor; a cursor movement detection step of detecting a moving speed of a cursor indicating a selected reduced-size image from the plurality of reduced-size images displayed on the monitor; and an image read-ahead step of reading images from the recording medium according to the moving speed of the cursor and storing the image in the memory.
摘要翻译： 一种图像再现方法包括：缩小尺寸图像读取步骤，从记录介质读取多个缩小尺寸图像并将缩小尺寸图像存储在存储器中; 显示步骤，在监视器上多次显示所述缩小尺寸的图像; 光标移动检测步骤，从显示在监视器上的多个缩小尺寸图像中检测指示所选择的缩小图像的光标的移动速度; 以及根据光标的移动速度从记录介质读取图像并将图像存储在存储器中的图像预读步骤。
-
2.发明申请公开(公告)号：US20070258695A1
公开(公告)日：2007-11-08
申请号：US11785802
申请日：2007-04-20
申请人： Hiroki Yoshikawa , Masahiro Ogawa
发明人： Hiroki Yoshikawa , Masahiro Ogawa
IPC分类号： H04N5/91
CPC分类号： G06F3/0485 , G06F3/0482
摘要： An image reproduction method includes: a reduced-size image reading step of reading a plurality of reduced-size images from a recording medium and storing the reduced-size images in a memory; a display step of multi-displaying the plurality of reduced-size images on a monitor; a cursor movement detection step of detecting a moving speed of a cursor indicating a selected reduced-size image from the plurality of reduced-size images displayed on the monitor; and an image read-ahead step of reading images from the recording medium according to the moving speed of the cursor and storing the image in the memory.
摘要翻译： 一种图像再现方法包括：缩小尺寸图像读取步骤，从记录介质读取多个缩小尺寸图像并将缩小尺寸图像存储在存储器中; 显示步骤，在监视器上多次显示所述缩小尺寸的图像; 光标移动检测步骤，从显示在监视器上的多个缩小尺寸图像中检测指示所选择的缩小图像的光标的移动速度; 以及根据光标的移动速度从记录介质读取图像并将图像存储在存储器中的图像预读步骤。
-
公开(公告)号：US09091931B2
公开(公告)日：2015-07-28
申请号：US13494530
申请日：2012-06-12
摘要： According to one embodiment, a photomask blank wherein a second film is stacked on a first film, the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing no chromium and which is etchable by dry etching using fluorine and dry etching using oxygen-containing chlorine.
摘要翻译： 根据一个实施方案，一种光掩模坯料，其中第二膜层叠在第一膜上，所述第一膜含有铬，并且其基本上不被使用氟的干蚀刻蚀刻，并且可通过使用含氧氯的干蚀刻来蚀刻， 并且第二膜不含铬，并且可以通过使用氟的干蚀刻和使用含氧氯的干蚀刻来蚀刻。
-
公开(公告)号：US08012654B2
公开(公告)日：2011-09-06
申请号：US12820927
申请日：2010-06-22
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
IPC分类号： G03F1/00
摘要： A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
摘要翻译： 提供一种光掩模坯料，其包括设置在透明基板上的耐蚀刻干蚀刻和通过氯干蚀刻除去的蚀刻停止膜，设置在蚀刻停止膜上的遮光膜，并且包括至少一层由 过渡金属/硅材料和设置在遮光膜上的抗反射膜。 当光屏蔽膜被干蚀刻以形成图案时，由图案密度依赖性引起的图案尺寸变化减小，使得以高精度产生光掩模。
-
公开(公告)号：US20100261101A1
公开(公告)日：2010-10-14
申请号：US12820927
申请日：2010-06-22
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
IPC分类号： G03F1/00
摘要： A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
-
公开(公告)号：US20100261099A1
公开(公告)日：2010-10-14
申请号：US12820908
申请日：2010-06-22
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
IPC分类号： G03F1/00
摘要： A photomask blank comprises a transparent substrate, a light-shielding film deposited on the substrate and comprising a metal or metal compound susceptible to fluorine dry etching, and an etching mask film deposited on the light-shielding film and comprising another metal or metal compound resistant to fluorine dry etching. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
摘要翻译： 光掩模坯料包括透明基板，沉积在基板上并包含易受氟干蚀刻影响的金属或金属化合物的遮光膜，以及沉积在遮光膜上并包含另一金属或金属化合物的蚀刻掩模膜 到氟干蚀刻。 当光屏蔽膜被干蚀刻以形成图案时，由图案密度依赖性引起的图案尺寸变化减小，使得以高精度产生光掩模。
-
7.发明申请SCREEN UNIT STOWABLE TYPE EQUIPMENT AND IN-VEHICLE MOUNT INFORMATION EQUIPMENT 审中-公开屏幕单元可容纳类型的设备和车载信息设备公开(公告)号：US20100254077A1
公开(公告)日：2010-10-07
申请号：US12742540
申请日：2008-11-11
申请人： Hiroki Yoshikawa
发明人： Hiroki Yoshikawa
IPC分类号： H05K7/00
CPC分类号： B60R11/0211 , B60R11/0235 , B60R2011/0005
摘要： There are provided screen unit stowable type equipment and in-vehicle mount information equipment that have a communication antenna mounted at an image display unit side, and can keep reception sensitivity even under a state that the image display unit is stowed in an equipment main body portion.In screen unit stowable type equipment having an equipment main body portion 10 having an operation panel 30 secured to the front surface thereof and an image display unit 20 that is stowed in the equipment main body portion 10 so as to be pulled out from the front surface of the equipment main body portion 10 with a liquid crystal display screen 21 being placed face down, a radio communication unit which can communicate with an external is provided, and a pattern antenna 110 for radio communication is provided to the tip portion 20a in a pull-out direction of the image display unit 20.
摘要翻译： 提供了具有安装在图像显示单元侧的通信天线的屏幕单元收纳型设备和车载安装信息设备，并且即使在图像显示单元被存储在设备主体部分中的状态下也能够保持接收灵敏度 。 在具有固定在其前表面的操作面板30的设备主体部10的屏幕单元收纳型设备和收纳在设备主体部10中以从前表面拉出的图像显示单元20 设置有面向下设置的液晶显示屏21的设备主体部分10，可以与外部通信的无线电通信单元，并且用于无线电通信的图形天线110以拉动方式提供给尖端部分20a - 图像显示单元20的方向。
-
8.发明申请METHOD FOR INSPECTING PHOTOMASK BLANK OR INTERMEDIATE THEREOF, METHOD FOR DETERMINING DOSAGE OF HIGH-ENERGY RADIATION, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK 有权用于检查光电隔离膜或其中间体的方法，用于确定高能量辐射剂量的方法，以及制造光电离空白的方法公开(公告)号：US20100248091A1
公开(公告)日：2010-09-30
申请号：US12750121
申请日：2010-03-30
申请人： Yukio INAZUKI , Hideo Kaneko , Hiroki Yoshikawa
发明人： Yukio INAZUKI , Hideo Kaneko , Hiroki Yoshikawa
CPC分类号： G03F1/84 , G03F7/70783
摘要： A photomask blank which is manufactured by depositing a phase shift film on a substrate and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment is inspected by measuring a surface topography of the photomask blank after the substrate shape adjusting treatment, removing the phase shift film from the photomask blank, measuring a surface topography of the treated substrate after removal of the phase shift film, and comparing the surface topographies, thereby evaluating a warpage change before and after removal of the phase shift film, due to a stress of the phase shift film having undergone substrate shape adjusting treatment.
摘要翻译： 通过在基板形状调整处理之后测量光掩模坯料的表面形貌来检查通过在基板上沉积相变膜并用高能辐射照射相移膜来进行基板形状调整处理而制造的光掩模坯料， 从光掩模坯料中去除相移膜，在移除相移膜之后测量处理过的基板的表面形貌，并比较表面形貌，由此评估在移相膜之前和之后的翘曲变化，由于 经过衬底形状调整处理的相移膜的应力。
-
公开(公告)号：US07767368B2
公开(公告)日：2010-08-03
申请号：US11882729
申请日：2007-08-03
IPC分类号： G03F1/00
摘要： An opaque area is formed in a sidewall portion of a susceptor by stacking a material that is transparent to flash light and a material that is opaque to the flash light to form the sidewall portion or coating a surface of the opaque material with the transparent material. A top surface of the opaque area in the sidewall portion of the susceptor is designed to have a predetermined positional relationship with a top surface of a substrate; the top surface of the opaque area is set at the same position as that of the top surface of the substrate or higher than the top surface of the substrate by a predetermined height. Thus, obliquely incident flash light is absorbed or irregularly reflected by the opaque quartz portion, surrounding an excavated portion of the susceptor.
摘要翻译： 通过堆叠对闪光透明的材料和对闪光不透明的材料以形成侧壁部分或用透明材料涂覆不透明材料的表面，在基座的侧壁部分中形成不透明区域。 基座的侧壁部分中的不透明区域的顶表面被设计成与基板的顶表面具有预定的位置关系; 不透明区域的顶表面设置在与基板的顶表面相同的位置或高于基板的顶表面预定高度。 因此，倾斜入射的闪光被不透明的石英部分吸收或不规则地反射，围绕基座的挖掘部分。
-
公开(公告)号：US07618753B2
公开(公告)日：2009-11-17
申请号：US11662479
申请日：2005-08-10
申请人： Hiroki Yoshikawa , Yukio Inazuki , Yoshinori Kinase , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Yukio Inazuki , Yoshinori Kinase , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/00
摘要： A metal film is provided as a light shielding layer on one principle surface of a photomask substrate. The metal film cannot be substantially etched by chlorine-based dry etching containing oxygen ((Cl+O)-based dry etching) and can be etched by chlorine-based dry etching not containing oxygen (Cl-based dry etching) and fluorine-based dry etching (F-based dry etching). On the light shielding layer, a metal compound film as an antireflective layer. The metal compound film cannot be substantially etched by chlorine-based dry etching not containing oxygen (Cl based) and can be etched by at least one of chlorine-based dry etching containing oxygen ((Cl+O) based) and fluorine-based dry etching (F based).
摘要翻译： 在光掩模基板的一个主表面上设置金属膜作为遮光层。 通过含有氧（（Cl + O）基干蚀刻）的基于氯的干蚀刻，不能基本上蚀刻金属膜，并且可以通过不含氧的氯基干法蚀刻（基于Cl的干蚀刻）和氟基 干蚀刻（F-干蚀刻）。 在遮光层上，作为抗反射层的金属化合物膜。 金属化合物膜不能通过不含氧（Cl基）的氯基干蚀刻基本上被蚀刻，并且可以通过含氧（（Cl + O）基）的氯基干蚀刻和氟基干法中的至少一种进行蚀刻 蚀刻（基于F）。
-
-
-
-
-
-
-
-
-
搜索结果
130 条记录 (耗时 0.025 秒)
