Projection optical system and method for photolithography and exposure apparatus and method using same
    1.
    发明授权
    Projection optical system and method for photolithography and exposure apparatus and method using same 失效
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US07688517B2

    公开(公告)日:2010-03-30

    申请号:US11907801

    申请日:2007-10-17

    IPC分类号: G02B3/00 G02B1/06 G02B17/00

    摘要: An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.

    摘要翻译: 用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。 至少两个光学元件用于形成至少一个具有第一限定光学元件,第二限定光学元件和液体透镜的液体透镜组,该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 第二分隔光学元件并且包含对紫外光透明的液体。

    Projection optical system, exposure system, and exposure method
    2.
    发明授权
    Projection optical system, exposure system, and exposure method 失效
    投影光学系统,曝光系统和曝光方法

    公开(公告)号:US07688422B2

    公开(公告)日:2010-03-30

    申请号:US11665490

    申请日:2005-10-12

    IPC分类号: G03B27/42 G03B27/58 G03B27/54

    摘要: An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1

    摘要翻译: 成像光学系统是一种允许在液体中的平面平行板被替代的液浸式系统,而不会显着降低成像性能,同时确保边界透镜的足够高的激光电阻。 成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。 第一光学透明构件和第二平面之间的光路可以被第一液体填充,并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。 成像光学系统满足1

    Projection optical system and method for photolithography and exposure apparatus and method using same
    4.
    发明授权
    Projection optical system and method for photolithography and exposure apparatus and method using same 失效
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US07580197B2

    公开(公告)日:2009-08-25

    申请号:US11907908

    申请日:2007-10-18

    IPC分类号: G02B1/06 G02B3/00 G02B17/00

    摘要: A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.

    摘要翻译: 液浸光学系统包括第一光学透明构件和第二光学透明构件,其布置在第一光学透明构件和物体之间的光路中。 第一光学透明构件和第二光学透明构件之间的第一空间可由第一液体填充。 第二光学透明构件和物体之间的第二空间可以用第二液体填充。 第二光学透明构件可拆卸地布置在第一光学透明构件和物体之间的光路中。

    Projection optical system and method for photolithography and exposure apparatus and method using same
    5.
    发明申请
    Projection optical system and method for photolithography and exposure apparatus and method using same 有权
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US20080068573A1

    公开(公告)日:2008-03-20

    申请号:US11907907

    申请日:2007-10-18

    IPC分类号: G03B27/42

    摘要: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is SiO2.

    摘要翻译: 光刻投影装置被布置成使用投影系统将图案从图案形成装置投影到基板上,并且具有液体供应系统,其构造成至少部分地用液体填充投影系统和基板之间的空间。 在配置成与液体接触的表面上,投影图案的投影系统的元件具有SiO 2的保护涂层。

    Projection Optical System, Exposure System, And Exposure Method
    6.
    发明申请
    Projection Optical System, Exposure System, And Exposure Method 失效
    投影光学系统,曝光系统和曝光方法

    公开(公告)号:US20070285633A1

    公开(公告)日:2007-12-13

    申请号:US11665490

    申请日:2005-10-12

    摘要: A imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The optical system satisfies the condition of 1

    摘要翻译: 成像光学系统是一种允许液体中的平面平行板被另一个替代的液浸式系统,而不会显着降低成像性能,同时确保边界透镜的足够高的激光电阻。 成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。 第一光学透明构件和第二平面之间的光路可以被第一液体填充,并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。 光学系统满足1

    Projection optical system, exposure apparatus, and exposure method
    8.
    发明授权
    Projection optical system, exposure apparatus, and exposure method 有权
    投影光学系统,曝光装置和曝光方法

    公开(公告)号:US07471374B2

    公开(公告)日:2008-12-30

    申请号:US11260160

    申请日:2005-10-28

    IPC分类号: G03B27/42 G03B27/52

    摘要: A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the projection optical system and the second surface being filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in the optical path of the projection optical system is 1, and the magnification of the projection optical system being not more than ⅛. In variations, the projection optical system is substantially telecentric on both the first surface side and the second surface side; every optical member having a power in the projection optical system is a transmitting optical member; and a projection exposure in a one shot-area can include a plurality of partial exposures in partial exposure regions.

    摘要翻译: 一种投影光学系统和曝光方法,用于在第二表面上形成第一表面的缩小图像,包括形成在感光基板上的掩模上形成的图案的缩小图像的投影曝光,投影光学系统 并且第二表面填充有折射率大于1.1的介质,其中投影光学系统的光路中的气氛的折射率为1,并且投影光学系统的放大率不大于1/8 。 在变型中,投影光学系统在第一表面侧和第二表面侧都基本上是远心的; 在投影光学系统中具有动力的每个光学构件是透射光学构件; 并且在一个拍摄区域中的投影曝光可以包括部分曝光区域中的多个部分曝光。

    Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
    10.
    发明申请
    Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element 失效
    浸没物镜光学系统,曝光装置,装置制造方法和边界光学元件

    公开(公告)号:US20080080067A1

    公开(公告)日:2008-04-03

    申请号:US11889180

    申请日:2007-08-09

    IPC分类号: G02B17/08 G02B27/18 G02B3/00

    摘要: In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2

    摘要翻译: 在用于在第二平面上形成第一平面的图像的液浸型投影光学系统中,用折射率大于1.5的液体填充光学系统和第二平面之间的光路,并且光学系统具有 边界光学元件,其在第一平面侧的表面与气体接触,并且其表面在第二平面侧与液体接触。 光学系统满足3.2