Projection optical system and method for photolithography and exposure apparatus and method using same
    4.
    发明申请
    Projection optical system and method for photolithography and exposure apparatus and method using same 失效
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US20080068724A1

    公开(公告)日:2008-03-20

    申请号:US11907908

    申请日:2007-10-18

    IPC分类号: G02B1/06

    摘要: A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.

    摘要翻译: 液浸光学系统包括第一光学透明构件和第二光学透明构件,其布置在第一光学透明构件和物体之间的光路中。 第一光学透明构件和第二光学透明构件之间的第一空间可由第一液体填充。 第二光学透明构件和物体之间的第二空间可以用第二液体填充。 第二光学透明构件可拆卸地布置在第一光学透明构件和物体之间的光路中。

    Projection optical system and method for photolithography and exposure apparatus and method using same
    5.
    发明授权
    Projection optical system and method for photolithography and exposure apparatus and method using same 失效
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US07688517B2

    公开(公告)日:2010-03-30

    申请号:US11907801

    申请日:2007-10-17

    IPC分类号: G02B3/00 G02B1/06 G02B17/00

    摘要: An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.

    摘要翻译: 用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。 至少两个光学元件用于形成至少一个具有第一限定光学元件,第二限定光学元件和液体透镜的液体透镜组,该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 第二分隔光学元件并且包含对紫外光透明的液体。

    Projection optical system, exposure system, and exposure method
    6.
    发明授权
    Projection optical system, exposure system, and exposure method 失效
    投影光学系统,曝光系统和曝光方法

    公开(公告)号:US07688422B2

    公开(公告)日:2010-03-30

    申请号:US11665490

    申请日:2005-10-12

    IPC分类号: G03B27/42 G03B27/58 G03B27/54

    摘要: An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1

    摘要翻译: 成像光学系统是一种允许在液体中的平面平行板被替代的液浸式系统,而不会显着降低成像性能,同时确保边界透镜的足够高的激光电阻。 成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。 第一光学透明构件和第二平面之间的光路可以被第一液体填充,并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。 成像光学系统满足1

    Projection optical system, exposure system, and exposure method
    7.
    发明授权
    Projection optical system, exposure system, and exposure method 有权
    投影光学系统,曝光系统和曝光方法

    公开(公告)号:US07978310B2

    公开(公告)日:2011-07-12

    申请号:US12719455

    申请日:2010-03-08

    IPC分类号: G03B27/54 G03B27/32

    CPC分类号: G03F7/70341

    摘要: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

    摘要翻译: 一种液浸型投影光学系统,其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中,在最靠近第二表面(W)侧设置的透光构件(Lp)和第二表面之间的光路填充有折射率大于1.1的液体(Lm1) 并且在透光构件的侧面(41,42)上形成用于遮蔽光通过的遮光膜(36)。 当D是第二表面和遮光膜之间的空间时,Θ是到达第二表面的图像形成光束的最大入射角,Ym是第二表面上的最大图像高度,条件为0.25

    Projection optical system and method for photolithography and exposure apparatus and method using same
    10.
    发明申请
    Projection optical system and method for photolithography and exposure apparatus and method using same 失效
    投影光学系统及光刻法及曝光装置及其使用方法

    公开(公告)号:US20080068576A1

    公开(公告)日:2008-03-20

    申请号:US11976028

    申请日:2007-10-19

    IPC分类号: G03B27/54 G02B3/00

    摘要: A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.

    摘要翻译: 微光刻投影曝光装置的投影透镜包括最终透镜元件和终端元件,该终端元件和终端元件之间没有整体折光力,该终端元件位于最终透镜元件和投影透镜的图像平面之间但间隔开。 图像平面可调节地定位成使得像平面相对于最终透镜元件的位置是可调节的。