公开(公告)号：US20120133912A1

公开(公告)日：2012-05-31

申请号：US13364828

申请日：2012-02-02

申请人： Yasufumi NISHII ,  Hiroyuki NAGASAKA ,  Takeshi OKUYAMA

发明人： Yasufumi NISHII ,  Hiroyuki NAGASAKA ,  Takeshi OKUYAMA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.

摘要翻译： 液体回收系统由浸渍曝光设备使用。 液体回收系统包括：板，其在与第一表面相对的一侧具有第一表面和第二表面; 液体回收部分，其至少一部分与第二表面相对，并且间隔开第一间隙。 液体回收系统通过液体回收部分将液体回收到与板的第一表面相对的可移动物体上。

公开(公告)号：US20120200836A1

公开(公告)日：2012-08-09

申请号：US13449041

申请日：2012-04-17

申请人： Hiroyuki NAGASAKA ,  Takeshi Okuyama

发明人： Hiroyuki NAGASAKA ,  Takeshi Okuyama

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341

摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas.

摘要翻译： 曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。 曝光装置包括具有多个光学元件的投影光学系统，通过该投影光学系统，通过液体将图案图像投影到基板上以露出基板，以及与气体一起回收液体的液体回收系统，并且具有分离器 分离回收的液体和回收的气体。

公开(公告)号：US20120204913A1

公开(公告)日：2012-08-16

申请号：US13454212

申请日：2012-04-24

申请人： Hiroyuki NAGASAKA ,  Yasushi YODA

发明人： Hiroyuki NAGASAKA ,  Yasushi YODA

IPC分类号： B08B3/04 ,  B08B7/04 ,  B08B3/12

CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination.

摘要翻译： 曝光装置通过曝光液体曝光具有曝光光的基板。 曝光装置包括曝光光从该光学元件出射的光学元件; 可在光学元件的光出射侧移动的台; 在舞台上设置的某个会员; 以及振动发生器，其振动所述某些构件以对形成在所述特定构件上的液浸空间中的液体施加振动。 可以抑制否则由任何污染引起的性能的劣化。

公开(公告)号：US20100323303A1

公开(公告)日：2010-12-23

申请号：US12779590

申请日：2010-05-13

申请人： Hiroyuki NAGASAKA

发明人： Hiroyuki NAGASAKA

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus including: an optical system, which has an emergent surface; a first surface, which is disposed at least partly around an optical path of exposure light from the emergent surface; a second surface, which is disposed at least partly around the first surface; a third surface, which is disposed at least partly around the second surface; a first supply port, which is disposed at least partly around the first surface such that the first supply port is directed in an outward radial direction with respect to an optical axis of the optical system, that supplies a first liquid to the second surface; and a second supply port, which is disposed at least partly around the second surface such that the second supply port is directed in an outward radial direction with respect to the optical axis, that supplies a second liquid to the third surface.

摘要翻译： 一种曝光装置，包括：具有出射表面的光学系统; 第一表面，其至少部分地围绕来自出射表面的曝光光的光路设置; 第二表面，其至少部分地围绕第一表面设置; 第三表面，其至少部分地围绕第二表面设置; 第一供应端口，其至少部分地围绕第一表面设置，使得第一供应端口相对于光学系统的光轴在径向方向上被引导，第一供应端口将第一液体供应到第二表面; 以及第二供应口，其至少部分地围绕所述第二表面设置，使得所述第二供应口相对于所述光轴向外径向引导，以将第二液体供应到所述第三表面。

公开(公告)号：US20120062861A1

公开(公告)日：2012-03-15

申请号：US13299891

申请日：2011-11-18

申请人： Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Tomoharu FUJIWARA ,  Soichi OWA ,  Akihiro MIWA

发明人： Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Tomoharu FUJIWARA ,  Soichi OWA ,  Akihiro MIWA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US20130059253A1

公开(公告)日：2013-03-07

申请号：US13593079

申请日：2012-08-23

申请人： Hiroyuki NAGASAKA

发明人： Hiroyuki NAGASAKA

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.

摘要翻译： 曝光装置包括至少设置在曝光光的光路的周边的一部分中的第一部件，并且具有通过第一间隙面对物体的上表面的第一面，并将液体保持在上表面 所述物体和所述第一面的第二构件相对于所述光路设置在所述第一面的外侧，并且具有通过第二间隙面向所述物体的上表面的第二面;第一供给口， 并且提供流体;第一吸入口，设置在第一面和第二面之间，并且通过第二面和第二面之间的间隙吸入第二构件的外部空间中的至少一部分气体， 物体的上面。

公开(公告)号：US20120307220A1

公开(公告)日：2012-12-06

申请号：US13586686

申请日：2012-08-15

申请人： Hiroyuki NAGASAKA ,  Takaya Okada ,  Motoi Ueda ,  Ryuichi Hoshika

发明人： Hiroyuki NAGASAKA ,  Takaya Okada ,  Motoi Ueda ,  Ryuichi Hoshika

IPC分类号： G03B27/52

CPC分类号： G03F7/70975 ,  G03F7/70341

摘要： An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.

摘要翻译： 曝光装置以包含在投影光学系统中的多个光学元件中的预定光学元件LS1和LS2之间的空间KS填充有液体LQ的状态来照射曝光光束EL。 在例如维护等期间曝光用光束EL不被照射的情况下，空间KS中的液体LQ被与液体LQ不同的功能流体LK代替。 这使得可以减少液体LQ对曝光装置的影响。

公开(公告)号：US20130050666A1

公开(公告)日：2013-02-28

申请号：US13593005

申请日：2012-08-23

申请人： Hiroyuki NAGASAKA

发明人： Hiroyuki NAGASAKA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus exposes a substrate to exposure light through liquid. The exposure apparatus includes: a first member which is disposed in at least a portion of the periphery of a light path of the exposure light, and has a first surface that faces an upper surface of an object via a first gap interposed therebetween and holds the liquid between the upper surface of the object and the first surface; a second member which is disposed at the outside of the first surface with respect to the light path, and has a second surface that faces the upper surface of the object via a second gap interposed therebetween; and a suction port which is disposed between the first surface and the second surface, and suctions at least a portion of gas in a space located outside the second member with respect to the light path, through the second gap.

摘要翻译： 曝光装置将基板暴露于通过液体的曝光光。 曝光装置包括：第一构件，设置在曝光光的光路的周边的至少一部分中，并且具有经由第一间隙插入对象的物体的上表面的第一表面，并且保持 物体上表面与第一表面之间的液体; 第二构件，其相对于光路布置在第一表面的外侧，并且具有经由插入其间的第二间隙面对物体的上表面的第二表面; 以及吸入口，其设置在所述第一表面和所述第二表面之间，并且通过所述第二间隙吸入位于所述第二构件外部的相对于所述光路的空间中的气体的至少一部分。

公开(公告)号：US20120094238A1

公开(公告)日：2012-04-19

申请号：US13334773

申请日：2011-12-22

申请人： Hiroyuki NAGASAKA ,  Makoto Shibuta ,  Katsushi Nakano ,  Yuichi Yoshida ,  Hiroaki Takaiwa

发明人： Hiroyuki NAGASAKA ,  Makoto Shibuta ,  Katsushi Nakano ,  Yuichi Yoshida ,  Hiroaki Takaiwa

IPC分类号： G03F7/20 ,  G03B27/58 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  H01L21/6715 ,  H01L21/6838 ,  H01L21/68735 ,  H01L21/6875 ,  Y10T29/49002

摘要： To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

摘要翻译： 提供一种能够防止液体进入基板的背面侧的基板保持装置。 基板保持装置设置有基材，形成在用于保持基板的基材上的第一保持部和形成在基材上的第二保持部，用于通过围绕由 第一保持部。 第二保持部保持板构件，以在板构件的后表面侧形成第二空间。 在板构件的后表面上设置吸收构件，用于吸收从由第一保持部保持的基板与由第二保持部保持的板构件之间的间隙进入的液体。