公开(公告)号：US20120062861A1

公开(公告)日：2012-03-15

申请号：US13299891

申请日：2011-11-18

申请人： Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Tomoharu FUJIWARA ,  Soichi OWA ,  Akihiro MIWA

发明人： Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Tomoharu FUJIWARA ,  Soichi OWA ,  Akihiro MIWA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US20120225388A1

公开(公告)日：2012-09-06

申请号：US13227178

申请日：2011-09-07

申请人： Toshikazu UMATATE ,  Soichi OWA ,  Tomoharu FUJIWARA

发明人： Toshikazu UMATATE ,  Soichi OWA ,  Tomoharu FUJIWARA

IPC分类号： G03F7/20 ,  B44C1/22

CPC分类号： G03F7/70466 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76816

摘要： In a pattern forming method, a first L & S pattern is formed on a wafer; a first protective layer, a second L & S pattern having a perpendicular periodic direction to that of the first L & S pattern, and a photoresist layer are formed to cover the first L & S pattern; a third pattern having first apertures is formed in the photoresist layer to be overlapped with a part of the second L & S pattern; second apertures are formed in the first protective layer via the first apertures; and a part of the first L & S pattern is removed via the second apertures. Accordingly, a pattern including a non-periodic portion finer than a resolution limit of an exposure apparatus is formed.

摘要翻译： 在图案形成方法中，在晶片上形成第一L＆S图案; 第一保护层，具有与第一L＆S图案的垂直周期方向的第二L＆S图案和光致抗蚀剂层形成以覆盖第一L＆S图案; 在光致抗蚀剂层中形成具有第一孔的第三图案，以与第二L＆S图案的一部分重叠; 经由第一孔形成在第一保护层中的第二孔; 并且通过第二孔除去第一L＆S图案的一部分。 因此，形成包括比曝光装置的分辨率极限更细的非周期性部分的图案。

公开(公告)号：US20120088078A1

公开(公告)日：2012-04-12

申请号：US13248331

申请日：2011-09-29

申请人： Soichi OWA ,  Shunji WATANABE ,  Junji SUZUKI ,  Kazuhiro KIDO ,  Hidemitsu TOBA

发明人： Soichi OWA ,  Shunji WATANABE ,  Junji SUZUKI ,  Kazuhiro KIDO ,  Hidemitsu TOBA

IPC分类号： G02B5/20 ,  B32B3/10 ,  B29D11/00 ,  B01F3/08

CPC分类号： G02B1/007 ,  B82Y20/00 ,  G02B1/14 ,  G03F7/20 ,  G03F7/32 ,  Y10T428/24893

摘要： An optical material which has a relative permeability different from 1 to light having a wavelength in, for example, the infrared region or shorter than the infrared region and which is stable in structure, and a liquid and a solid (optical element) using the optical material. The optical material is a powder used as a component of a liquid or solid to which an illuminating light is irradiated, and includes a large number of resonating elements which constitute the powder and each of which is formed of a conductor having a width approximately same as or smaller than a wavelength of the illumination light, and a protective film which is formed of a disc-shaped insulator, wherein an entire surface of each of the split-ring resonators is covered by the protective film.

摘要翻译： 将具有相对磁导率不同于1的光学材料与在例如红外区域或比红外区域更短并且结构稳定的波长的光以及使用光学器件的液体和固体（光学元件） 材料。 光学材料是用作照射照射光的液体或固体的组分的粉末，并且包括大量构成粉末的谐振元件，每个谐振元件由宽度大致相同的导体形成 或小于照明光的波长，以及由盘形绝缘体形成的保护膜，其中每个分裂环谐振器的整个表面被保护膜覆盖。

公开(公告)号：US20100099049A1

公开(公告)日：2010-04-22

申请号：US12648648

申请日：2009-12-29

申请人： Soichi OWA ,  Shigeru HIRUKAWA

发明人： Soichi OWA ,  Shigeru HIRUKAWA

IPC分类号： G03F7/22 ,  G03B27/42

CPC分类号： G03F9/7003 ,  G03F7/70291 ,  G03F7/70475 ,  G03F9/7015 ,  G03F9/7019

摘要： During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a positional relation between an illumination light and the stage (and hence a positional relation between the illumination light and the wafer) is detected. With this operation, even if the information on the positional relation between the illumination light and the wafer varies due to some reason, information on the variation can be detected while performing the exposure to the plurality of shot areas. Accordingly, high-precision exposure can be achieved in an exposure operation, by considering this detection results.

摘要翻译： 在开始曝光到在晶片上曝光的多个照射区域直到完成曝光之前的期间，接收经由图案生成装置经由经由经由经由图案生成装置保持晶片的台阶上的狭缝对的照明光的光， 并且检测关于照明光和舞台之间的位置关系的信息（因此照明光和晶片之间的位置关系）。 通过该操作，即使关于照明光和晶片之间的位置关系的信息由于某些原因而变化，也可以在对多个拍摄区域进行曝光的同时检测关于变化的信息。 因此，通过考虑该检测结果，可以在曝光操作中实现高精度的曝光。

公开(公告)号：US20120224154A1

公开(公告)日：2012-09-06

申请号：US13473438

申请日：2012-05-16

申请人： Naoyuki KOBAYASHI ,  Soichi OWA ,  Shigeru HIRUKAWA ,  Yasuhiro OMURA

发明人： Naoyuki KOBAYASHI ,  Soichi OWA ,  Shigeru HIRUKAWA ,  Yasuhiro OMURA

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/7075 ,  G03F7/70891

摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

摘要翻译： 曝光装置通过液体将基板上的曝光光照射而曝光基板。 曝光装置具有用于保持基板的基板保持件，能够移动由基板保持件保持的基板的基板台和用于调整基板保持器的温度的温度调节系统。 控制基板的温度，使得基板和液体之间的温度没有差异，从而防止由液体温度变化引起的曝光精度的降低。

公开(公告)号：US20110187810A1

公开(公告)日：2011-08-04

申请号：US13085001

申请日：2011-04-12

申请人： Soichi OWA ,  Junji SUZUKI

发明人： Soichi OWA ,  Junji SUZUKI

IPC分类号： B41J2/47 ,  G02B26/08

CPC分类号： G02B26/0841 ,  B81B3/0051 ,  B81B2201/042 ,  B81B2203/053 ,  B81B2203/058 ,  G02B26/001 ,  G03F7/70291 ,  G03F7/70825 ,  Y10S359/90

摘要： A pair of support members each having a spring section in a part thereof support a mirror element, and a pair of drive mechanisms arranged respectively corresponding to a pair of the support members transform the spring sections of the corresponding support members, thereby changing a distance between each of support points at which the support members support the mirror element and a base. Accordingly, the mirror element can be translated by driving all of the drive mechanisms, or the mirror element can be inclined with respect to the base by driving some of the drive mechanisms.

摘要翻译： 在其一部分中具有弹簧部分的一对支撑构件支撑反射镜元件，并且分别对应于一对支撑构件设置的一对驱动机构使相应的支撑构件的弹簧部分变换，从而改变 每个支撑点支撑构件支撑镜子元件和基座。 因此，可以通过驱动所有的驱动机构来平移镜元件，或者通过驱动一些驱动机构，镜元件可以相对于基座倾斜。

公开(公告)号：US20110273684A1

公开(公告)日：2011-11-10

申请号：US12967707

申请日：2010-12-14

申请人： Soichi OWA ,  Masaomi KAMEYAMA

发明人： Soichi OWA ,  Masaomi KAMEYAMA

IPC分类号： G03B27/42

CPC分类号： G03F7/0002 ,  B29C33/303 ,  B29C43/003 ,  B29C43/021 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3438 ,  B29C2043/3634 ,  B29C2043/525 ,  B29C2043/561 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7003

摘要： There is provided a nanoimprint method for pressing a template having a pattern of a rugged or uneven shape, to a substrate coated with a curable resin the method including a measuring step for measuring positions of preselected sample measurement points of a predetermined number, which are set for object regions, respectively, of the substrate; a calculating step for performing statistical operations using the measurement positions of the sample measurement points as operation parameters thereby to calculate the deformed states of the object regions; a deforming step for deforming the template based on the deformed states of the object regions calculated at the calculating step; and a pressing step for pressing the deformed template onto the object regions. Accordingly, a nanoimprint method and a nanoimprint apparatus capable of forming a pattern highly precisely on a substrate are provided.

摘要翻译： 提供了一种用于将具有粗糙或不均匀形状的图案的模板压制到涂覆有可固化树脂的基板上的方法，该方法包括：测量步骤，用于测量预定数量的预选样品测量点的位置，该测量步骤被设置 分别用于基板的物体区域; 计算步骤，用于使用样本测量点的测量位置作为操作参数进行统计运算，从而计算对象区域的变形状态; 变形步骤，用于基于在所述计算步骤计算出的所述对象区域的变形状态使所述模板变形; 以及将变形的模板按压到物体区域上的按压步骤。 因此，提供能够在基板上高精度地形成图案的纳米压印法和纳米压印装置。

公开(公告)号：US20090117494A1

公开(公告)日：2009-05-07

申请号：US12266367

申请日：2008-11-06

申请人： Soichi OWA

发明人： Soichi OWA

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70191 ,  G03F7/20 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70291

摘要： An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

摘要翻译： 一种曝光方法，用于以每种类型图案的高通量和最佳照明条件曝光包括多种图案的掩模图案。 该方法包括将来自照明光的脉冲光照射的第一空间光调制器的光引导到第二空间光调制器，并且用来自第二空间光调制器的光曝光晶片，伴随着：控制第二空间光调制器 包括多个第二镜元件; 以及控制包括多个第一反射镜元件的第一空间光调制器的转换状态，以控制照明光在第一空间光调制器和第二空间光调制器之间的预定平面上的强度分布。

公开(公告)号：US20120057141A1

公开(公告)日：2012-03-08

申请号：US13292724

申请日：2011-11-09

申请人： Soichi OWA ,  Shigeru Hirukawa

发明人： Soichi OWA ,  Shigeru Hirukawa

IPC分类号： G03B27/42

CPC分类号： G03F9/7003 ,  G03F7/70291 ,  G03F7/70475 ,  G03F9/7015 ,  G03F9/7019

摘要： During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a positional relation between an illumination light and the stage (and hence a positional relation between the illumination light and the wafer) is detected. With this operation, even if the information on the positional relation between the illumination light and the wafer varies due to some reason, information on the variation can be detected while performing the exposure to the plurality of shot areas. Accordingly, high-precision exposure can be achieved in an exposure operation, by considering this detection results.

摘要翻译： 在开始曝光到在晶片上曝光的多个照射区域直到完成曝光之前的期间，接收经由图案生成装置经由经由经由经由图案生成装置保持晶片的台阶上的狭缝对的照明光的光， 并且检测关于照明光和舞台之间的位置关系的信息（因此照明光和晶片之间的位置关系）。 通过该操作，即使关于照明光和晶片之间的位置关系的信息由于某些原因而变化，也可以在对多个拍摄区域进行曝光的同时检测关于变化的信息。 因此，通过考虑该检测结果，可以在曝光操作中实现高精度的曝光。

公开(公告)号：US20110272382A1

公开(公告)日：2011-11-10

申请号：US12967572

申请日：2010-12-14

申请人： Soichi OWA ,  Katsura OTAKI

发明人： Soichi OWA ,  Katsura OTAKI

IPC分类号： C23F1/02 ,  C23F1/00 ,  G01N21/00 ,  B05D3/12

CPC分类号： G03F7/0002 ,  B29C33/424 ,  B29C43/003 ,  B29C43/021 ,  B29C43/14 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3634 ,  B29C2043/525 ,  B29C2043/561 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/9501 ,  G03F1/84

摘要： There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

摘要翻译： 提供了一种模板检查装置，其通过压印方法从具有凹凸形状的主模板检查复制模板，该模板检查装置包括：发出平面波的检查光的检查光源部; 配置成将所述主模板和所述副本模板配置成彼此靠近并被所述检查光照射的台; 以及检测部，其检测通过所述主模板和所述副本模板发送的与所述平面波不同的部件的光。 因此，可以在短时间内检查模板。