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1.发明申请Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part 有权曝光装置，曝光方法，制造装置和光学部件的方法公开(公告)号：US20070242242A1
公开(公告)日：2007-10-18
申请号：US10581307
申请日：2004-12-03
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译： 曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。 曝光装置（EX）具有用于保持基板（P）的基板台（PT），具有防液平面（30A）的板构件（30）可替换地设置在基板台（PT）上，以防止 液体保留，保持良好的曝光精度。
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2.发明申请Exposure apparatus, exposure method, method for producing device, and optical part 审中-公开曝光装置，曝光方法，制造装置的方法和光学部件公开(公告)号：US20070115450A1
公开(公告)日：2007-05-24
申请号：US11639245
申请日：2006-12-15
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译： 曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。 曝光装置（EX）具有用于保持基板（P）的基板台（PT），具有防液平面（30A）的板构件（30）可替换地设置在基板台（PT）上，以防止 液体保留，保持良好的曝光精度。
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3.发明授权Exposure apparatus, exposure method, method for producing device, and optical part 有权曝光装置，曝光方法，制造装置的方法和光学部件公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译： 曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。 曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止 剩余液体，保持良好的曝光精度。
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4.发明授权Exposure apparatus, exposure method, method for producing device, and optical part 有权曝光装置，曝光方法，制造装置的方法和光学部件公开(公告)号：US08054447B2
公开(公告)日：2011-11-08
申请号：US10581307
申请日：2004-12-03
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译： 曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。 曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止 剩余液体，保持良好的曝光精度。
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5.发明申请Maintenance Method, Exposure Method, Exposure Apparatus, and Method for Producing Device 审中-公开维护方法，曝光方法，曝光装置以及生产装置的方法公开(公告)号：US20120307220A1
公开(公告)日：2012-12-06
申请号：US13586686
申请日：2012-08-15
申请人： Hiroyuki NAGASAKA , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
发明人： Hiroyuki NAGASAKA , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
IPC分类号： G03B27/52
CPC分类号： G03F7/70975 , G03F7/70341
摘要： An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.
摘要翻译： 曝光装置以包含在投影光学系统中的多个光学元件中的预定光学元件LS1和LS2之间的空间KS填充有液体LQ的状态来照射曝光光束EL。 在例如维护等期间曝光用光束EL不被照射的情况下，空间KS中的液体LQ被与液体LQ不同的功能流体LK代替。 这使得可以减少液体LQ对曝光装置的影响。
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6.发明申请Maintenance Method, Exposure Method, Exposure Apparatus, And Method For Producing Device 审中-公开维护方法，曝光方法，曝光装置和生产装置的方法公开(公告)号：US20070285634A1
公开(公告)日：2007-12-13
申请号：US11667856
申请日：2005-11-18
申请人： Hiroyuki Nagasaka , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
发明人： Hiroyuki Nagasaka , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
IPC分类号： G03B27/42
CPC分类号： G03F7/70975 , G03F7/70341
摘要： An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.
摘要翻译： 曝光装置照射曝光光束，其中预定光学元件之间的空间和包括在投影光学系统中的多个光学元件之间的空间被填充有液体。 当例如维护等期间曝光光束不被照射时，空间中的液体被不同于液体的功能流体代替。 这使得可以减少液体对曝光装置的影响。
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公开(公告)号：US20120044469A1
公开(公告)日：2012-02-23
申请号：US13317169
申请日：2011-10-12
IPC分类号： G03B27/52
CPC分类号： G03F7/70608 , G03F7/2041 , G03F7/70341 , G03F7/70858
摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
摘要翻译： 一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜 投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。
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公开(公告)号：US20070139632A1
公开(公告)日：2007-06-21
申请号：US11640842
申请日：2006-12-19
IPC分类号： G03B27/52
CPC分类号： G03F7/70608 , G03F7/2041 , G03F7/70341 , G03F7/70858
摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
摘要翻译： 一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜 投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。
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9.发明授权Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice 有权光学元件，基于其使用的曝光装置，曝光方法和微型装置的制造方法公开(公告)号：US08724075B2
公开(公告)日：2014-05-13
申请号：US12923282
申请日：2010-09-13
申请人： Takao Kokubun , Ryuichi Hoshika
发明人： Takao Kokubun , Ryuichi Hoshika
IPC分类号： G03B27/52
CPC分类号： G03D3/00 , G03B27/42 , G03F7/70341
摘要： An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
摘要翻译： 光学元件包括基材，设置在基材表面的至少一部分上的防液构件，以及设置在基材和防液构件之间的防光构件，用于保护防液剂 会员通过减少光线从光线辐射。 光学元件可用于通过液体使基板曝光的液浸曝光装置。 可以避免通过光学元件使液体在液浸区域中的任何流入到意想不到的地方。
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10.发明申请Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice 有权光学元件，基于其使用的曝光装置，曝光方法和微型装置的制造方法公开(公告)号：US20070201011A1
公开(公告)日：2007-08-30
申请号：US11512087
申请日：2006-08-30
申请人： Takao Kokubun , Ryuichi Hoshika
发明人： Takao Kokubun , Ryuichi Hoshika
IPC分类号： G03B27/42
CPC分类号： G03D3/00 , G03B27/42 , G03F7/70341
摘要： An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
摘要翻译： 光学元件包括基材，设置在基材表面的至少一部分上的防液构件，以及设置在基材和防液构件之间的防光构件，用于保护防液剂 会员通过减少光线从光线辐射。 光学元件可用于通过液体使基板曝光的液浸曝光装置。 可以避免通过光学元件使液体在液浸区域中的任何流入到意想不到的地方。
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