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1.发明授权Ca—La—F based transparent ceramic, Ca—La—F based transparent ceramic, optical element, optical system, and ceramic-forming composition 有权Ca-La-F系透明陶瓷，Ca-La-F系透明陶瓷，光学元件，光学系统和陶瓷成形组合物公开(公告)号：US08618008B2
公开(公告)日：2013-12-31
申请号：US13495826
申请日：2012-06-13
申请人： Hitoshi Ishizawa
发明人： Hitoshi Ishizawa
CPC分类号： C04B35/553 , B82Y30/00 , C04B35/6263 , C04B35/62635 , C04B35/6264 , C04B35/645 , C04B35/6455 , C04B2235/3208 , C04B2235/3225 , C04B2235/3227 , C04B2235/449 , C04B2235/5252 , C04B2235/5436 , C04B2235/5445 , C04B2235/5454 , C04B2235/549 , C04B2235/661 , C04B2235/761 , C04B2235/9653 , C04B2235/9661 , G02B1/02
摘要： A Ca—La—F based transparent ceramic, including: mixing CaF2 particles and LaF3 particles that are prepared separately from the CaF2 particles to form a mixed body of particles, and sintering the mixed body of particles and making the mixed body transparent, thereby producing a transparent ceramic.
摘要翻译： 一种Ca-La-F系透明陶瓷，其特征在于，包括：将CaF 2粒子和与所述CaF 2粒子分开制备的LaF 3粒子混合，形成粒子的混合体，烧结所述粒子的混合体，使所述混合体透明化， 透明陶瓷。
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2.发明申请MGF2 OPTICAL THIN FILM INCLUDING AMORPHOUS SILICON OXIDE BINDER, OPTICAL ELEMENT PROVIDED WITH THE SAME, AND METHOD FOR PRODUCING MGF2 OPTICAL THIN FILM 审中-公开MGF2光学薄膜，其中包括非晶硅氧化物粘合剂，与此相同的光学元件，以及生产MGF2光学薄膜的方法公开(公告)号：US20120058261A1
公开(公告)日：2012-03-08
申请号：US13293718
申请日：2011-11-10
CPC分类号： G02B1/116 , C03C17/007 , C03C2217/45 , C03C2217/475 , C03C2218/113 , G02B1/111 , G02B1/113 , G02B1/118 , G02B1/14 , G02B2207/107 , G02B2207/109 , Y10T428/2495 , Y10T428/258
摘要： An MgF2 optical thin film is formed on an optical surface of a base material. The MgF2 optical thin film includes MgF2 particles and an amorphous silicon oxide-based binder which exists on the surfaces of the MgF2 particles and between the MgF2 particles. Owing to this amorphous silicon oxide-based binder, the optical thin film can have high mechanical strength and high adhesion to the base material, while having excellent environment resistance and a lower refractive index.
摘要翻译： 在基材的光学表面上形成MgF2光学薄膜。 MgF2光学薄膜包括存在于MgF 2颗粒表面和MgF 2颗粒之间的MgF 2颗粒和无定形氧化硅基粘合剂。 由于这种非晶氧化硅类粘合剂，光学薄膜可以具有高的机械强度和对基材的高粘附性，同时具有优异的耐环境性和较低折射率。
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公开(公告)号：US07993008B2
公开(公告)日：2011-08-09
申请号：US12292271
申请日：2008-11-14
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G02B1/105 , G02B1/14 , G03F7/70875 , G03F7/70958 , G03F7/70983
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
摘要翻译： 光学元件用于曝光装置，其被配置为用曝光光束照射掩模，用于通过投影光学系统将掩模上的图案转印到基板上，并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。
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4.发明申请MGF2 OPTICAL THIN FILM INCLUDING AMORPHOUS SILICON OXIDE BINDER, OPTICAL ELEMENT PROVIDED WITH THE SAME, AND METHOD FOR PRODUCING MGF2 OPTICAL THIN FILM 审中-公开MGF2光学薄膜，包括非晶硅氧化物粘合剂，提供其的光学元件和生产MGF2光学薄膜的方法公开(公告)号：US20110122497A1
公开(公告)日：2011-05-26
申请号：US12968268
申请日：2010-12-14
CPC分类号： G02B1/116 , C03C17/007 , C03C2217/45 , C03C2217/475 , C03C2218/113 , G02B1/111 , G02B1/113 , G02B1/118 , G02B1/14 , G02B2207/107 , G02B2207/109 , Y10T428/2495 , Y10T428/258
摘要： An MgF2 optical thin film is formed on an optical surface of a base material. The MgF2 optical thin film includes MgF2 particles and an amorphous silicon oxide-based binder which exists on the surfaces of the MgF2 particles and between the MgF2 particles. Owing to this amorphous silicon oxide-based binder, the optical thin film can have high mechanical strength and high adhesion to the base material, while having excellent environment resistance and a lower refractive index.
摘要翻译： 在基材的光学表面上形成MgF2光学薄膜。 MgF2光学薄膜包括存在于MgF 2颗粒表面和MgF 2颗粒之间的MgF 2颗粒和无定形氧化硅基粘合剂。 由于这种非晶氧化硅类粘合剂，光学薄膜可以具有高的机械强度和对基材的高粘附性，同时具有优异的耐环境性和较低折射率。
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公开(公告)号：US07760447B2
公开(公告)日：2010-07-20
申请号：US12469805
申请日：2009-05-21
IPC分类号： G02B7/02
CPC分类号： G02B7/027 , G02B1/11 , Y10T428/239
摘要： A method, for producing an optical member, includes attaching a holding member, which is used integrally with a lens, to the lens so that the holding member is brought into contact with a periphery of the lens to hold the lens, and then forming an optical thin film on a surface of the lens by a spin coating to obtain the optical member.
摘要翻译： 一种用于制造光学构件的方法包括将与透镜一体使用的保持构件附接到透镜，使得保持构件与透镜的周边接触以保持透镜，然后形成 通过旋涂在透镜的表面上的光学薄膜获得光学构件。
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公开(公告)号：US20090284848A1
公开(公告)日：2009-11-19
申请号：US12469805
申请日：2009-05-21
CPC分类号： G02B7/027 , G02B1/11 , Y10T428/239
摘要： A method, for producing an optical member, includes attaching a holding member, which is used integrally with a lens, to the lens so that the holding member is brought into contact with a periphery of the lens to hold the lens, and then forming an optical thin film on a surface of the lens by a spin coating to obtain the optical member.
摘要翻译： 一种用于制造光学构件的方法包括将与透镜一体使用的保持构件附接到透镜，使得保持构件与透镜的周边接触以保持透镜，然后形成 通过旋涂在透镜的表面上的光学薄膜获得光学构件。
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公开(公告)号：US20060291060A1
公开(公告)日：2006-12-28
申请号：US10569207
申请日：2004-08-26
IPC分类号： G02B1/10
CPC分类号： G03F7/70341 , G02B1/105 , G02B1/14 , G03F7/70875 , G03F7/70958 , G03F7/70983
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
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8.发明授权Exposure apparatus, exposure method, method for producing device, and optical part 有权曝光装置，曝光方法，制造装置的方法和光学部件公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译： 曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。 曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止 剩余液体，保持良好的曝光精度。
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公开(公告)号：US20120212716A1
公开(公告)日：2012-08-23
申请号：US13407620
申请日：2012-02-28
CPC分类号： G03F7/70958 , G03F7/70341
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
摘要翻译： 光学元件用于曝光装置，其被配置为用曝光光束照射掩模，用于通过投影光学系统将掩模上的图案转印到基板上，并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。
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公开(公告)号：US08189170B2
公开(公告)日：2012-05-29
申请号：US12659121
申请日：2010-02-25
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G02B1/105 , G02B1/14 , G03F7/70875 , G03F7/70958 , G03F7/70983
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
摘要翻译： 光学元件用于曝光装置，其被配置为用曝光光束照射掩模，用于通过投影光学系统将掩模上的图案转印到基板上，并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。
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