公开(公告)号：US20090081887A1

公开(公告)日：2009-03-26

申请号：US12232751

申请日：2008-09-23

申请人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

发明人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： H01L21/26 ,  C23C16/54

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： The number of substrates held by a substrate holder is increased compared with conventional techniques while uniformity of a heat treatment is ensured. The substrate holder holds a plurality of substrates at predetermined vertical intervals. The substrate holder is carried into a heat treating furnace. A predetermined heat treatment is performed on the substrates. The substrate holder has two holder constituting bodies. Each of the holder constituting bodies has a plurality of columns and substrate holding sections. The columns are arranged on the circumference of the same imaginary circle. The substrate holding sections hold circumferential portions of the respective substrates. One of the holder constituting bodies holds the substrates under the condition that front surfaces of the substrates face upward, while the other of the holder constituting bodies holds the substrates under the condition that back surfaces of the substrates face upward. The substrate with the front surface facing upward and the substrate with the back surface facing upward are alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of substrates that are vertically adjacent to each other and have the respective front surfaces facing each other and the other of the first pair of substrates is set to ensure uniformity of the treatment and larger than a distance between one of a second pair of substrates that are vertically adjacent to each other and have the respective back surfaces facing each other and the other of the second pair of substrates.

摘要翻译： 与常规技术相比，由基板保持器保持的基板的数量增加，同时确保热处理的均匀性。 衬底保持器以预定的垂直间隔保持多个衬底。 衬底保持器被携带到热处理炉中。 对基板进行预定的热处理。 基板支架具有两个支架结构体。 保持器构成体中的每一个具有多个列和基板保持部。 列布置在同一虚构圆的圆周上。 基板保持部保持各基板的周向部。 保持器构成体中的一个在基板的前表面朝上的状态下保持基板，而另一个保持器构造体在基板的背面朝上的状态下保持基板。 前表面朝上的基板和背面朝上的基板在垂直方向交替排列。 保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。 设置彼此垂直相邻并具有彼此相对的各个前表面和第一对基板中的另一个的第一对基板中的一个之间的距离，以确保处理的均匀性并且大于一个 第二对基板彼此垂直相邻并且具有彼此相对的相应后表面和第二对基板中的另一个。

公开(公告)号：US07900579B2

公开(公告)日：2011-03-08

申请号：US12232751

申请日：2008-09-23

申请人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

发明人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： C23C16/00 ,  H01L21/00 ,  F27D3/12

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： A heat treatment method includes a substrate holder that holds a plurality of substrates at predetermined vertical intervals and is carried into a heat treating furnace for performing a predetermined heat treatment on the substrates. The substrate holder has two holder constituting bodies each having a plurality of columns and substrate holding sections. One of the holder constituting bodies holds the substrates at a first, vertically adjacent distance so that their front surfaces face each other, while the other of the holder constituting bodies holds the substrates at a second, vertically adjacent distance so that their back surfaces face each other wherein the second distance is smaller than the first distance to ensure uniformity of the heat treatment. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other.

摘要翻译： 热处理方法包括以预定的垂直间隔保持多个基板并被载入到用于对基板进行预定热处理的热处理炉中的基板保持器。 衬底保持器具有两个具有多个柱和衬底保持部的保持器构造体。 保持器构造体中的一个将基板保持在第一垂直相邻距离处，使得它们的前表面彼此面对，而另一个保持器构造体将基板保持在第二垂直相邻的距离，使得它们的背面面对每个 其中第二距离小于第一距离以确保热处理的均匀性。 保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。

公开(公告)号：US20110162633A1

公开(公告)日：2011-07-07

申请号：US12987406

申请日：2011-01-10

申请人： Hisashi INOUE ,  Shunichi Matsumoto ,  Yasushi Takeuchi

发明人： Hisashi INOUE ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： F24C1/00

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates.

摘要翻译： 热处理设备具有一个具有两个保持器构成体的衬底保持器，每个保持器构成体具有多个列和衬底保持部。 保持器构造体中的一个保持基板，使得它们的前表面朝上，而另一个保持基板，使得它们的后表面朝上。 保持器构造体中的至少一个垂直移动以改变保持器构造体相对于彼此的位置。 第一对垂直相邻基板中的一个彼此相对的前表面和第一对基板之间的距离设定为确保处理均匀性并且大于第二对垂直方向之间的距离 相邻的基板，其各自的后表面彼此相对，另一个是第二对基板。

公开(公告)号：US08741064B2

公开(公告)日：2014-06-03

申请号：US13533206

申请日：2012-06-26

申请人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

发明人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： C23C16/00

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.

摘要翻译： 衬底保持器具有两个保持器构成体，每个保持器构造体具有布置在假想圆上的多个列，以及保持各个衬底周向部分的衬底保持部。 保持器构成体保持基板，使得它们的前表面或其背面朝向上方具有面向上的基板和具有面向上的后部的基板沿垂直方向交替布置。 保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。 设置第一对垂直相邻的基板与它们各自的前表面彼此面对的距离，以确保处理均匀性，并且大于第二对垂直相邻基板之间的距离，并且其相应的后表面彼此面对。

公开(公告)号：US08230806B2

公开(公告)日：2012-07-31

申请号：US12987406

申请日：2011-01-10

申请人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

发明人： Hisashi Inoue ,  Shunichi Matsumoto ,  Yasushi Takeuchi

IPC分类号： B05B5/00 ,  C23C16/00

CPC分类号： H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

摘要： A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates.

摘要翻译： 热处理设备具有一个具有两个保持器构成体的衬底保持器，每个保持器构成体具有多个列和衬底保持部。 保持器构造体中的一个保持基板，使得它们的前表面朝上，而另一个保持基板，使得它们的后表面朝上。 保持器构造体中的至少一个垂直移动以改变保持器构造体相对于彼此的位置。 第一对垂直相邻基板中的一个彼此相对的前表面和第一对基板之间的距离设定为确保处理均匀性并且大于第二对垂直方向之间的距离 相邻的基板，其各自的后表面彼此相对，另一个是第二对基板。

公开(公告)号：US08951347B2

公开(公告)日：2015-02-10

申请号：US13128908

申请日：2009-11-13

申请人： Hitoshi Kato ,  Yasushi Takeuchi

发明人： Hitoshi Kato ,  Yasushi Takeuchi

IPC分类号： C23C16/455 ,  C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45551 ,  C23C16/45519 ,  C23C16/45578 ,  C23C16/45591

摘要： A film deposition apparatus is provided with a gas nozzle in which ejection holes that eject a reaction gas are formed along a longitudinal direction of the gas nozzle, and a flow regulation member that protrudes from the gas nozzle in either one of upstream and downstream directions of a rotation direction of a turntable. In such a configuration, a separation gas flowing from an upstream side of the rotation direction to the gas nozzle is restricted from flowing between the gas nozzle and the turntable on which a substrate is placed, and the reaction gas flowing upward from the turntable is restricted by the separation gas, thereby impeding a reaction gas concentration in a process area from being lowered.

摘要翻译： 一种成膜装置设置有气体喷嘴，其中沿着气体喷嘴的纵向方向形成喷射反应气体的喷射孔，以及流量调节构件，其从上游和下游方向中的任一个中的气体喷嘴突出 转台的旋转方向。 在这种构造中，从旋转方向的上游侧流向气体喷嘴的分离气体被限制在气体喷嘴与放置基板的转盘之间的流动，并且从转台向上流动的反应气体受到限制 通过分离气体，从而阻止处理区域中的反应气体浓度降低。

公开(公告)号：US20120222615A1

公开(公告)日：2012-09-06

申请号：US13221188

申请日：2011-08-30

申请人： Hitoshi KATO ,  Tsuneyuki Okabe ,  Manabu Honma ,  Takeshi Kumagai ,  Yasushi Takeuchi

发明人： Hitoshi KATO ,  Tsuneyuki Okabe ,  Manabu Honma ,  Takeshi Kumagai ,  Yasushi Takeuchi

IPC分类号： C23C16/455

CPC分类号： H01L21/68764 ,  C23C16/45551 ,  H01L21/68771

摘要： A film deposition apparatus includes a first turntable including at least ten substrate receiving areas that receive corresponding 300 mm substrates; a first reaction gas supplying portion arranged in a first area inside the chamber to supply a first reaction gas; a second reaction gas supplying portion arranged in a second area away from the first reaction gas supplying portion along the rotation direction of the first turntable to supply a second reaction gas; and a separation area arranged between the first and the second areas. The separation area includes a separation gas supplying portion that supplies a separation gas that separates the first reaction and the second reaction gases, and a ceiling surface having a height so that a pressure in a space between the ceiling surface and the first turntable is higher with the separation gas than pressures in the first and the second areas.

摘要翻译： 一种成膜装置包括：第一转盘，其包括至少十个接收对应的300mm基板的基板接收区域; 第一反应气体供给部，其布置在所述室内的第一区域中，以供应第一反应气体; 第二反应气体供给部，其沿着第一转台的旋转方向配置在远离第一反应气体供给部的第二区域，供给第二反应气体; 以及布置在第一和第二区域之间的分离区域。 分离区域包括供给分离第一反应和第二反应气体的分离气体的分离气体供给部以及具有使顶棚面与第一转台之间的空间内的压力较高的高度的顶面， 分离气体而不是第一和第二区域中的压力。

公开(公告)号：US08195911B2

公开(公告)日：2012-06-05

申请号：US12852777

申请日：2010-08-09

申请人： Takahiko Endo ,  Yasushi Takeuchi

发明人： Takahiko Endo ,  Yasushi Takeuchi

IPC分类号： G06F13/14

CPC分类号： G05B19/4155 ,  G05B2219/34192 ,  G05B2219/34196

摘要： A memory other than a non-volatile memory in a numerical controller is divided into a plurality of memory areas in response to a command from a computer connected to the numerical controller. Whether a machining program has been stored in each of the divided memory areas is decided before a machining program stored on a hard disk in the computer is transferred to the memory other than the non-volatile memory. The machining program stored on the hard disk is then written to an area for which it is determined that no machining program is stored.

摘要翻译： 响应于来自连接到数字控制器的计算机的命令，数字控制器中的非易失性存储器之外的存储器被分成多个存储区域。 在存储在计算机中的硬盘上的加工程序被传送到非易失性存储器之外的存储器之前，决定加工程序是否已经存储在每个分割的存储区域中。 然后将存储在硬盘上的加工程序写入确定不存储加工程序的区域。

公开(公告)号：US20120076937A1

公开(公告)日：2012-03-29

申请号：US13237999

申请日：2011-09-21

申请人： Hitoshi KATO ,  Yasushi Takeuchi

发明人： Hitoshi KATO ,  Yasushi Takeuchi

IPC分类号： C23C16/455 ,  C23C16/458

CPC分类号： C23C16/45551 ,  Y02T50/67

摘要： A film deposition device includes a chamber, a turntable, a first reactive gas supplying portion, a second reactive gas supplying portion, and a separation gas supplying portion. A convex part includes a ceiling surface to cover both sides of the separation gas supplying portion, form a first space between the ceiling surface and the turntable where a separation gas flows, and form a separation area between a first area and a second area, to maintain a pressure in the first space to be higher than pressures in the first area and the second area so that a first reactive gas and a second reactive gas are separated by the separation gas in the separation area. A block member is arranged to form a second space between the turntable and an internal surface of the chamber at an upstream part of the separation area along a rotation direction of the turntable.

摘要翻译： 膜沉积装置包括腔室，转台，第一反应气体供应部分，第二反应气体供应部分和分离气体供应部分。 凸部包括覆盖分离气体供给部的两侧的顶面，在分离气体流动的顶棚面与转台之间形成第一空间，在第一区域与第二区域之间形成分离区域， 保持第一空间中的压力高于第一区域和第二区域中的压力，使得第一反应气体和第二反应气体由分离区域中的分离气体分离。 块体构件被布置成沿着转台的旋转方向在分离区域的上游部分处在转台和腔室的内表面之间形成第二空间。

公开(公告)号：US08105691B2

公开(公告)日：2012-01-31

申请号：US11995617

申请日：2006-06-21

申请人： Yasushi Takeuchi ,  Shinya Kuwazuru ,  Masaakira Horino

发明人： Yasushi Takeuchi ,  Shinya Kuwazuru ,  Masaakira Horino

IPC分类号： B32B5/16

CPC分类号： C08J3/12 ,  A61K8/0241 ,  A61K8/44 ,  A61K8/8117 ,  A61K8/8152 ,  A61K8/88 ,  A61K8/89 ,  A61K2800/412 ,  A61K2800/623 ,  A61Q1/02 ,  A61Q1/04 ,  A61Q1/06 ,  A61Q1/10 ,  A61Q1/12 ,  A61Q3/02 ,  A61Q5/02 ,  A61Q9/02 ,  A61Q17/04 ,  A61Q19/10 ,  C08J7/047 ,  C08J2471/00 ,  Y10T428/2991 ,  Y10T428/2998

摘要： By coating the surface of a powder comprising a silicone resin and/or an organic powder with a specific hydrophilizing agent, such powder is hydrophilized. Such coated (treated) powder has extremely great dispersibility (ease of dispersion) and very good dispersion stability (long-term dispersion stability with lapse of time) in aqueous dispersion media, particularly under acidic and alkaline conditions, specifically at pH 3 through 13. Using the surface-treated powder, additionally, a dispersion with good dispersibility (ease of dispersion) and great dispersion stability, preferably for cosmetics can be provided. The use of the surface-treated powder, or the use of the dispersion can provide further a cosmetic excellent in dispersibility and dispersion stability and further in re-dispersibility and dispersion stability with lapse of time and smooth feeling as compared to the related art when selecting aqueous cosmetic as an agent form.

摘要翻译： 通过用特定的亲水剂涂布含有有机硅树脂和/或有机粉末的粉末的表面，将这种粉末亲水化。 这种涂布（处理）粉末在水分散介质中，特别是在酸性和碱性条件下，特别是在pH 3至13下，具有非常好的分散性（易于分散）和非常好的分散稳定性（随时间的长时间分散稳定性）。 另外，也可以使用表面处理粉末，优选分散性（易分散性），分散稳定性优异的化妆品。 使用表面处理粉末或分散体的使用可以进一步提供分散性和分散稳定性优异的化妆品，并且当选择时，与现有技术相比，随着时间的流逝和平滑的感觉进一步具有再分散性和分散稳定性 水性化妆品作为试剂形式。