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公开(公告)号：US11163974B2
公开(公告)日：2021-11-02
申请号：US17086608
申请日：2020-11-02
Applicant: HITACHI, LTD.
Inventor： Ryoko Araki , Teruo Kohashi , Jun Xie
Abstract: In an image acquisition system, a distortion distribution is easily measured in a wide range. A standard image of magnetic domain of a sample serving as a standard is acquired by radiation of light using a standard external magnetic field which serves as a standard, a plurality of magnetic domain images are acquired in a state where an external magnetic field is applied while being changed, a plurality of subtraction images obtained by subtracting the standard image of magnetic domain from each of the plurality of magnetic domain images are acquired, a magnetization reversal area in which a magnetic domain is reversed is extracted from each of the plurality of subtraction images, and a composite image having a plurality of magnetization reversal areas is acquired by compositing the plurality of subtraction images each having the magnetization reversal area.
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Patent Agency Ranking
公开(公告)号：US10304657B2
公开(公告)日：2019-05-28
申请号：US15548531
申请日：2015-02-09
Applicant: Hitachi, Ltd.
Inventor： Hiroyasu Shichi , Masaki Hasegawa , Teruo Kohashi , Shinichi Matsubara
Abstract: A device including an imaging-type or a projection-type ion detection system and being capable of performing observation or inspection at high speed with an ultrahigh resolution in a sample observation device using an ion beam is provided. The device includes a gas field ion source that generates an ion beam, an irradiation optical system that irradiates a sample with the ion beam, a potential controller that controls an accelerating voltage of the ion beam and a positive potential to be applied to the sample and an ion detection unit that images or projects ions reflected from the sample as a microscope image, in which the potential controller includes a storage unit storing a first positive potential allowing the ion beam to collide with the sample and a second positive potential for reflecting the ion beam before allowing the ion beam to collide with the sample.
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公开(公告)号：US20240126061A1
公开(公告)日：2024-04-18
申请号：US18380309
申请日：2023-10-16
Applicant: Hitachi, Ltd.
Inventor： Masanari Koguchi , Teruo Kohashi , Tomihiro Hashizume
CPC classification number: G02B21/04 , G01Q30/025 , G01Q70/14 , G02B21/0076
Abstract: To provide a scanning probe microscope capable of easily determining a measurement location even when a numerical aperture of an objective lens is relatively large. The scanning probe microscope comprises: a probe which scans a sample; a light source which irradiates the probe with excitation light via an objective lens; and a detector which detects fluorescence generated at the probe. The scanning probe microscope further includes: a reflective member arranged between the objective lens and the sample; and an imaging device which images a reflecting surface of the reflective member.
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公开(公告)号：US11587226B2
公开(公告)日：2023-02-21
申请号：US17682441
申请日：2022-02-28
Applicant: Hitachi, Ltd
Inventor： Ryoko Araki , Teruo Kohashi
Abstract: To provide a magnetic domain image processing apparatus and a magnetic domain image processing method by which strain of an electromagnetic steel sheet can be evaluated in more detail. The invention is a magnetic domain image processing apparatus that processes a magnetic domain image, and the magnetic domain image processing apparatus includes: an image acquisition unit configured to acquire a reference magnetic domain image and a positive magnetic domain image or acquire the reference magnetic domain image and a negative magnetic domain image, the reference magnetic domain image being a magnetic domain image that is obtained when a stimulus of a reference intensity that is an intensity serving as a reference is applied to a sample, the positive magnetic domain image being a magnetic domain image that is obtained when the stimulus of an intensity higher than the reference intensity is applied to the sample, and the negative magnetic domain image being a magnetic domain image that is obtained when the stimulus of an intensity lower than the reference intensity is applied to the sample; and an image generation unit configured to generate, based on the reference magnetic domain image and the positive magnetic domain image, or based on the reference magnetic domain image and the negative magnetic domain image, a stress distribution image indicating a distribution of a stress region that is a region where stress is generated.
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公开(公告)号：US10395885B2
公开(公告)日：2019-08-27
申请号：US15736098
申请日：2015-06-23
Applicant: HITACHI, LTD.
Inventor： Teruo Kohashi
IPC: H01J37/09 , H01J37/04 , H01J37/147 , H01J37/28 , H01J37/20
Abstract: Provided is an optical system which can adjust, including increase, a spin polarization degree of an electron beam. Disclosed is a charged particle device having a charged particle source which generates charged particles, a sample table on which a sample is placed, and a transport optical system which is disposed between the charged particle source and the sample table and transports the charged particles as charged particle flux toward the sample table. In this device, the transport optical system includes a magnetic field generating section which generates a magnetic field having a vertical component to a course of the charged particle flux, an electric field generating section which generates an electric field having a vertical component to the course of the charged particle flux, and a shielding section which shields at least a part of the charged particle flux passed through the magnetic field generating section and the electric field generating section. Moreover, the vertical component of the magnetic field has a magnetic field gradient, and the vertical component of the electric field gives an electrostatic force in a direction opposite to a Lorentz force received by the charged particle flux.
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公开(公告)号：US10210962B2
公开(公告)日：2019-02-19
申请号：US15117075
申请日：2014-02-05
Applicant: HITACHI, LTD.
Inventor： Ken Harada , Teruo Kohashi , Tomohiro Iwane
Abstract: The outer shape and size of a diffraction grating including an edge dislocation is made smaller than the irradiation areas of light waves and electromagnetic waves, by using an opener different from in the diffraction grating, the shape and size of the opening is superposed on the shape of a spiral wave that is generated by an edge dislocation diffraction grating, and the shape and size of the opening are reflected in the shape and size of the spiral wave on the diffractive surface. In addition, not only a diffraction grating system including a pair of a single opener and a single diffraction grating, but also a diffraction grating system in which plural openers and plural edge dislocation diffraction gratings are combined are used, and plural spiral waves can be generated on the diffractive surface with a higher degree of freedom.
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