Processing System and Charged Particle Beam Apparatus

    公开(公告)号:US20230314128A1

    公开(公告)日:2023-10-05

    申请号:US18127858

    申请日:2023-03-29

    Abstract: A processing system and a charged particle beam apparatus for the purpose of determining the degree of growth or the presence or absence of a defect in an epitaxial layer grown in a groove or a hole such as between inner spacers from an image of the groove or the hole are proposed. In a processing system including a computer system, the computer system calculates a distance and a brightness value related to a layer between a plurality of structures from a signal profile in accordance with one direction on a two-dimensional plane related to the layer, which is obtained by irradiating the layer with an electron beam, and determines or outputs a state of the layer based on the distance and the brightness value.

    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR CALCULATING ROUGHNESS INDEX

    公开(公告)号:US20230095456A1

    公开(公告)日:2023-03-30

    申请号:US17909876

    申请日:2020-03-30

    Abstract: Roughness measurement corrects a machine difference utilizing first PSD data indicating power spectral density of a line pattern measured for a line pattern formed on a wafer for machine difference management by a reference machine in roughness index calculation and second PSD data indicating power spectral density of a line pattern measured for the line pattern formed on the wafer for machine difference management by a correction target machine are used to obtain a correction method for correcting the power spectral density of the second PSD data to the power spectral density of the first PSD data, power spectral density of a line pattern is measured as third PSD data from a scanning image of the line pattern, and corrected power spectral density obtained by correcting the power spectral density of the third PSD data by the obtained correction method is calculated.

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