公开(公告)号：US20220351934A1

公开(公告)日：2022-11-03

申请号：US17621503

申请日：2019-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Erina KAWAMOTO ,  Soichiro MATSUNAGA ,  Souichi KATAGIRI ,  Keigo KASUYA ,  Takashi DOI ,  Tetsuya SAWAHATA ,  Minoru YAMAZAKI

IPC: H01J37/077 ,  H01J37/18 ,  H01J37/075

Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.

公开(公告)号：US20230162943A1

公开(公告)日：2023-05-25

申请号：US17915034

申请日：2020-03-31

Applicant: Hitachi High-Tech Corporation

Inventor： U OH ,  Minoru YAMAZAKI ,  Yuko SASAKI

IPC: H01J37/22 ,  H01J37/28 ,  G01N23/2251 ,  G06F16/2455

CPC classification number: H01J37/222 ,  H01J37/28 ,  G01N23/2251 ,  G06F16/2455 ,  H01J2237/24564 ,  H01J2237/24521 ,  H01J2237/24578 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507 ,  G01N2223/6116

Abstract: The present invention provides a charged particle beam device with which optimal parameters for the device can be effectively derived in a short time period. This charged particle beam device comprises: an electron gun (1) that irradiates a sample (10) with an electron beam (2); an image processing unit (901) that acquires an image of the sample (10) from a signal (12) generated by the sample (10) due to the electron beam (2); a database (604) that holds correspondence between a first parameter that is an optical condition, a second parameter that is a value pertaining to device performance, and a third parameter that is information pertaining to the device configuration, and stores a plurality of analysis values and measurement values; and a learning machine (605) that searches the database (604) and derives a first parameter that satisfies a target value of the second parameter.

公开(公告)号：US20230095456A1

公开(公告)日：2023-03-30

申请号：US17909876

申请日：2020-03-30

Applicant: Hitachi High-Tech Corporation

Inventor： Daisuke BIZEN ,  Kei SAKAI ,  Junichi KAKUTA ,  Masumi SHIRAI ,  Minoru YAMAZAKI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  G06T7/13

Abstract: Roughness measurement corrects a machine difference utilizing first PSD data indicating power spectral density of a line pattern measured for a line pattern formed on a wafer for machine difference management by a reference machine in roughness index calculation and second PSD data indicating power spectral density of a line pattern measured for the line pattern formed on the wafer for machine difference management by a correction target machine are used to obtain a correction method for correcting the power spectral density of the second PSD data to the power spectral density of the first PSD data, power spectral density of a line pattern is measured as third PSD data from a scanning image of the line pattern, and corrected power spectral density obtained by correcting the power spectral density of the third PSD data by the obtained correction method is calculated.

公开(公告)号：US20210313140A1

公开(公告)日：2021-10-07

申请号：US17210805

申请日：2021-03-24

Applicant: Hitachi High-Tech Corporation

Inventor： Kaori BIZEN ,  Yuzuru MIZUHARA ,  Minoru YAMAZAKI ,  Daisuke BIZEN ,  Noritsugu TAKAHASHI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/22

Abstract: A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration sample that is a sample having a flat surface. The image generation unit generates a composite image by synthesizing the first signal and the second signal with respect to an observation sample using the composite ratio.