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公开(公告)号:US09881769B2
公开(公告)日:2018-01-30
申请号:US15023456
申请日:2014-10-07
Applicant: Hitachi High-Technologies Corporation
Inventor: Kenji Aoki , Tsutomu Saitou , Kotaro Hosoya , Mitsuhiro Nakamura , Kunji Shigeto
IPC: H01J37/28 , H01J37/29 , H01J37/073 , H01J37/244
CPC classification number: H01J37/292 , H01J37/073 , H01J37/244 , H01J37/28 , H01J2237/18 , H01J2237/24465 , H01J2237/24475 , H01J2237/24495 , H01J2237/248 , H01J2237/2809
Abstract: The objective of the present invention is to provide a charged particle beam device, wherein the positional relationship between reflected electron detection elements and a sample and the vacuum state of the sample surroundings are evaluated to select automatically a reflected electron detection element appropriate for acquiring an intended image. In this charged particle beam device, all the reflected electron detection elements are selected when the degree of vacuum inside the sample chamber is high and the sample is distant from the reflected electron detectors, while a reflected electron detection element appropriate for acquiring a compositional image or a height map image is selected when the degree of vacuum inside the sample chamber is high and the sample is close to the reflected electron detectors. When the degree of vacuum inside the sample chamber is low, all the reflected electron detection elements are selected.
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公开(公告)号:US20150179394A1
公开(公告)日:2015-06-25
申请号:US14404115
申请日:2013-04-22
Applicant: Hitachi High-Technologies Corporation
Inventor: Tsutomu Saito , Kenji Aoki
CPC classification number: H01J37/10 , H01J37/09 , H01J37/18 , H01J37/26 , H01J2237/103
Abstract: A preferred aim of the present invention is to provide a charged particle beam device having a high differential exhaust performance while maintaining a large dynamic range of an irradiation current by effectively arranging an aperture for differential pumping (111) and an objective final aperture (110). The present invention has features that a lens barrel including therein an optical system of the charged particle beam device (100) includes a first space (106) having a first degree of vacuum and a second space (105) having a degree of vacuum higher than the first degree of vacuum, and that the objective final aperture (110) is arranged in the second space (105).
Abstract translation: 本发明的优选目的是提供一种具有高差分排气性能的带电粒子束装置,同时通过有效地布置差分泵浦(111)和目标最终孔径(110)的孔径来保持辐射电流的大动态范围, 。 本发明的特征在于,其中包括带电粒子束装置(100)的光学系统的镜筒包括具有第一真空度的第一空间(106)和具有高于 第一真空度,并且目标最终孔(110)布置在第二空间(105)中。
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