公开(公告)号：US20180019096A1

公开(公告)日：2018-01-18

申请号：US15544958

申请日：2016-01-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Takashi ICHIMURA ,  Hiroyuki ITO ,  Shinichi KATO ,  Hisaya MURAKOSHI ,  Tadashi FUJIEDA ,  Tatsuya MIYAKE ,  Takashi NAITOU ,  Takuya AOYAGI ,  Kenji TANIMOTO

IPC: H01J37/16 ,  H01J37/12 ,  C23D5/02

CPC classification number: H01J37/16 ,  C23D5/02 ,  H01J9/18 ,  H01J37/065 ,  H01J37/12 ,  H01J37/147 ,  H01J37/3178

Abstract: The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance. Coating vanadium glass onto walls of a space where it is desirable to form a high vacuum, for example walls in the vicinity of an electron source, reduces gas discharge in the vicinity of the electron source, and the getter effect of the coating layer induces localized evacuation and enables the formation of an extremely high vacuum, even in spaces having a complex structure, without providing a large high-vacuum pump.