公开(公告)号：US20160379857A1

公开(公告)日：2016-12-29

申请号：US14908452

申请日：2015-01-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yoshifumi OGAWA ,  Masanori KADOTANI ,  Masakazu ISOZAKI ,  Nobuhide NUNOMURA

IPC: H01L21/67 ,  F16K31/06 ,  F16K51/02

CPC classification number: H01L21/67253 ,  C23C16/45561 ,  F15B20/008 ,  F16K31/1245 ,  F16K31/128 ,  F16K51/02 ,  H01L21/3065

Abstract: The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves.The present invention provides a vacuum processing apparatus including: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit including an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves.

Abstract translation: 本发明提供一种真空处理装置，其特征在于，包括：气体供给单元，其向进行真空处理的处理室供给用于进行使用常闭型气动阀的真空处理的气体，所述气体供给单元具有互锁功能 其中，当一对气动阀的第一阀打开时，该对的第二阀关闭，气体供给单元包括控制空气驱动空气驱动阀的空气回路，空气回路 使用具有对应于一对空气驱动阀中的每一个的螺线管线圈的电磁阀构成。

公开(公告)号：US20210231571A1

公开(公告)日：2021-07-29

申请号：US16646487

申请日：2019-02-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshifumi OGAWA ,  Yutaka KOUZUMA ,  Masaru IZAWA

IPC: G01N21/73 ,  H01J37/32 ,  H05H1/24 ,  H01L21/67 ,  C23C16/52

Abstract: Provided is a detecting device of gas components that includes a gas component detecting unit for detection of a light emission of plasma that is formed by re-excitation downstream of an arrangement position of an object to be processed. The gas component detecting unit includes an introduced gas supply portion that supplies an introduced gas, a nozzle portion that is provided with a hole through which the introduced gas that is supplied from the introduced gas supply portion passes through and an opening through which a part of a gas to be analyzed flowing through an exhaust pipe portion is introduced into an inside of the hole, the opening being provided in an intermediate portion of the hole, a discharge electrode portion that generates plasma inside the nozzle portion by causing the gas to be analyzed that is introduced from the opening into an inside of the nozzle portion and the introduced gas that is supplied into the inside of the hole to discharge, and a light emission detecting unit that detects a light emission of the plasma generated inside the nozzle portion by the discharge electrode portion.