公开(公告)号：US09040221B2

公开(公告)日：2015-05-26

申请号：US13699007

申请日：2011-05-19

申请人： Hitoshi Osaki ,  Yusuke Asano ,  Mitsuo Sato ,  Tomoki Nagai

发明人： Hitoshi Osaki ,  Yusuke Asano ,  Mitsuo Sato ,  Tomoki Nagai

IPC分类号： G03F7/004 ,  C08F22/18 ,  C08F220/26 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F24/00 ,  C08F220/24

CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

公开(公告)号：US20130122426A1

公开(公告)日：2013-05-16

申请号：US13699007

申请日：2011-05-19

申请人： Hitoshi Osaki ,  Yusuke Asano ,  Mitsuo Sato ,  Tomoki Nagai

发明人： Hitoshi Osaki ,  Yusuke Asano ,  Mitsuo Sato ,  Tomoki Nagai

IPC分类号： G03F7/004 ,  C08F22/18 ,  G03F7/20 ,  C07C69/753 ,  C08F24/00 ,  C07C69/653 ,  C07D307/93

CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。