Abstract:
A new method of metal deposition with reduced metal residue after metal etching by cooling the wafer before metal deposition is described. A first patterned conducting layer is provided overlying a dielectric layer on the surface of a semiconductor substrate. The wafer is cooled to a temperature of less than about 20.degree. C. Thereafter, a metal layer is deposited overlying the first patterned conducting layer. The metal layer is etched away where it is not covered by a mask to complete formation of the metal line. Cooling of the wafer before metal deposition decreases the metal residue found after metal etching.
Abstract:
A pixel structure and a manufacturing method thereof are provided. The pixel structure includes a substrate, a scan line, a data line, a first insulating layer, an active device, a second insulating layer, a common electrode and a first pixel electrode. The data line crossed to the scan line is disposed on the substrate and includes a linear transmitting part and a cross-line transmitting part. The first insulating layer covering the scan line and the linear transmitting part is disposed between the scan line and the cross-line transmitting part. The active device, including a gate, an oxide channel, a source and a drain, is connected to the scan line and the data line. The second insulating layer is disposed on the oxide channel and the linear transmitting part. The common electrode is disposed above the linear transmitting part. The first pixel electrode is connected to the drain.
Abstract:
A pixel structure includes a scan line, a data line, an active element, a first passivation layer, a second passivation layer and a pixel electrode. The data line includes a first data metal segment and a second data metal layer. The active element includes a gate electrode, an insulating layer, a channel layer, a source and a drain. The channel layer is positioned on the insulating layer above the gate electrode. The source and the drain are positioned on the channel layer. The source is coupled to the data line. The first passivation layer and the second passivation layer cover the active element and form a first contact hole to expose a part of the drain. The second passivation layer covers a part edge of the drain. The pixel electrode is disposed across the second passivation layer and coupled to the drain via the first contact hole.
Abstract:
A reflective type touch-sensing display panel including a front substrate, scan lines, data lines, pixel structures, photo-sensors, readout devices, a rear substrate and a reflective display medium is provided. The front substrate has an inner surface. The scan lines and the data lines are on the inner surface of the front substrate and intersected to each other. The pixel structures are disposed on the inner surface of the front substrate, and each pixel structure is electrically connected to one of the scan lines and one of the data lines correspondingly. The photo-sensors are disposed on the inner surface of the front substrate. Each readout device is electrically connected to one of the photo-sensor correspondingly. The rear substrate is disposed opposite to the front substrate. The reflective display medium is sealed between the front substrate and the rear substrate.
Abstract:
This invention in one aspect relates to a pixel structure. In one embodiment, the pixel structure includes a scan line formed on a substrate and a data line formed over the substrate defining a pixel area, a switch formed inside the pixel area on the substrate, a shielding electrode having a first portion and a second portion extending from the first portion, and formed over the scan line, the data line and the switch, where the first portion is overlapped with the switch and the second portion is overlapped with the data line, and a pixel electrode having a first portion and a second portion extending from the first portion, and formed over the shielding electrode in the pixel area, where the first portion is overlapped with the first portion of the shielding electrode so as to define a storage capacitor therebetween and the second portion has no overlapping with the second portion of the shielding electrode.
Abstract:
An electrophoresis display pixel including an electrophoresis display film, a substrate, a first active device, a second active device, a first electrode, and a second electrode is provided. The substrate is disposed on the electrophoresis display film, and the substrate has a transparent region and a non-transparent region. The first active device and the second active device are disposed on the substrate and located in the non-transparent region. The first electrode is disposed on the substrate, located in the transparent region, and electrically connected to the first active device. The second electrode is disposed on the substrate, located in the non-transparent region, and electrically connected to the second active device. A light passes through the transparent region and enters the electrophoresis display film to be displayed. A display apparatus including the abovementioned electrophoresis display pixel is also provided.
Abstract:
An active matrix substrate including a substrate, a plurality of scan lines, a plurality of data lines and a plurality of sub-pixels is provided. The scan lines and the data lines are disposed on the substrate, and define a plurality of sub-pixel regions distributed in a delta arrangement. The sub-pixels corresponding to the sub-pixel regions are disposed on the substrate. The sub-pixels are electrically connected with corresponding scan lines and corresponding data lines. Between two sub-pixel regions corresponding to any two adjacent sub-pixels at a same side of one scan line, there are two data lines. Each sub-pixel includes an active device and a pixel electrode. The active device is electrically connected with a corresponding scan line and a corresponding data line. The pixel electrode is electrically connected with the active device, and extends from the sub-pixel region corresponding to the sub-pixel to a position over the data line.
Abstract:
A manufacturing method of a color filter comprising the following steps is provided. At first, a transparent substrate is provided. Next, a black matrix is formed on the transparent substrate to define a plurality of pixel areas on the transparent substrate. Then, an isolation layer is formed and patterned on the black matrix and then Red/Green/Blue color filter inks are filled into each of the pixel areas separately by inkjet printing. After that, the color filter inks are dried to form color filter units and optionally the isolation layer can further be patterned to form plenty of photo spacers on the black matrix. The isolation layers prevented the color filter inks from spilling out of the pixel areas and color mixing problems during color filter inkjet fabrication. Besides, it is characterized that the color filter units can be formed with even thickness.
Abstract:
A pixel structure of a liquid crystal display panel and the method thereof is provided. The gate electrode and data line of the pixel structure are formed by a first patterned conductive layer, the scan line is formed by a second patterned conductive layer, and the common electrode and the pixel electrode are formed on a substrate. The common electrode, the pixel electrode, and the insulating layer disposed therebetween compose a storage capacitor. Also, the pixel or the common electrode has a slit structure.
Abstract:
An active device array substrate and its fabricating method are provided. According to the subject invention, the elements of an array substrate such as the thin film transistors, gate lines, gate pads, data lines, data pads and storage electrodes, are provided by forming a patterned first metal layer, an insulating layer, a patterned semiconductor layer and a patterned metal multilayer. Furthermore, the subject invention uses the means of selectively etching certain layers. Using the aforesaid means, the array substrate of the subject invention has some layers with under-cut structures, and thus, the number of the time-consuming and complicated mask etching process involved in the production of an array substrate can be reduced. The subject invention provides a relatively simple and time-saving method for producing an array substrate.