公开(公告)号：US06797621B2

公开(公告)日：2004-09-28

申请号：US09801804

申请日：2001-03-09

申请人： Hyung-Soo Song ,  Ky-Sub Kim ,  Min-Choon Park ,  Sok-Joo Lee

发明人： Hyung-Soo Song ,  Ky-Sub Kim ,  Min-Choon Park ,  Sok-Joo Lee

IPC分类号： H01L21302

CPC分类号： C23F1/26

摘要： An etchant composition for molybdenum includes: 5 to 20% by weight of hydrogen peroxide (H2O2); 75 to 94% by weight of water; and an additive including a pH controlling agent. The etching composition is particularly useful for the fabrication of semiconductor devices. Molybdenum may be etched from a substrate by applying the etchant composition, preferably by spraying or immersion, and preferably at a temperature range of 30° C. to 45° C.

摘要翻译： 用于钼的蚀刻剂组合物包括：5至20重量％的过氧化氢（H 2 O 2）; 75至94重量％的水; 和包含pH控制剂的添加剂。 蚀刻组合物特别适用于制造半导体器件。 可以通过施加蚀刻剂组合物，优选通过喷涂或浸渍，优选在30℃至45℃的温度范围内从基底上蚀刻钼。

公开(公告)号：US20050020081A1

公开(公告)日：2005-01-27

申请号：US10925003

申请日：2004-08-25

申请人： Hyung-Soo Song ,  Ky-Sub Kim ,  Min-Choon Park ,  Sok-Joo Lee

发明人： Hyung-Soo Song ,  Ky-Sub Kim ,  Min-Choon Park ,  Sok-Joo Lee

IPC分类号： C23F1/26 ,  H01L21/302 ,  H01L21/461 ,  H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC分类号： C23F1/26

摘要： An etchant composition for molybdenum includes: 5 to 20% by weight of hydrogen peroxide (H2O2); 75 to 94% by weight of water; and an additive including a pH controlling agent. The etching composition is particularly useful for the fabrication of semiconductor devices. Molybdenum may be etched from a substrate by applying the etchant composition, preferably by spraying or immersion, and preferably at a temperature range of 30° C. to 45° C.

摘要翻译： 用于钼的蚀刻剂组合物包括：5至20重量％的过氧化氢（H 2 O 2）; 75至94重量％的水; 和包含pH控制剂的添加剂。 蚀刻组合物特别适用于制造半导体器件。 可以通过施加蚀刻剂组合物，优选通过喷涂或浸渍，优选在30℃至45℃的温度范围内，从基底上蚀刻钼。

公开(公告)号：US20050000110A1

公开(公告)日：2005-01-06

申请号：US10852965

申请日：2004-05-25

申请人： Yong-Seok Park ,  Kyung-Chul Kim ,  Sok-Joo Lee

发明人： Yong-Seok Park ,  Kyung-Chul Kim ,  Sok-Joo Lee

IPC分类号： B65G49/06 ,  B65G49/07 ,  H01L21/00 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68 ,  F26B19/00

CPC分类号： H01L21/6719 ,  H01L21/67028 ,  H01L21/67196

摘要： A substrate transferring/treating system includes a substrate stacking base, a substrate transferring member for receiving/transferring the substrate from/to the base, a substrate cleaning/drying device for cleaning and drying the substrate transferred from the substrate transferring member, and a substrate treating device for treating the substrate that is cleaned and dried by the substrate cleaning/drying device and transferred by the substrate transferring member.

摘要翻译： 基板转印/处理系统包括：基板堆叠基座，用于从基板接收/转移基板的基板转印部件，用于清洁和干燥从基板转印部件转印的基板的基板清洗/干燥装置;以及基板 处理装置，用于处理由基板清洗/干燥装置清洗和干燥并被基板转印部件转印的基板。

公开(公告)号：US20090190109A1

公开(公告)日：2009-07-30

申请号：US12323807

申请日：2008-11-26

申请人： Chun-Seok Jeong ,  Ho-Youn Park ,  Sok-Joo Lee ,  Seung-Won Lee

发明人： Chun-Seok Jeong ,  Ho-Youn Park ,  Sok-Joo Lee ,  Seung-Won Lee

IPC分类号： G03B27/42

CPC分类号： H01L21/67718 ,  G02F1/1303 ,  H01L21/6776

摘要： A substrate transfer apparatus that is designo provide an inclined transfer function that improves liquid saving efficiency of a process solution (developing solution) during the transfer of the substrate. The substrate transfer apparatus includes a first transfer unit for transferring a substrate, a second transfer unit spaced apart from an end of the first transfer unit, a third transfer unit disposed between the first and second transfer units and providing an inclined transfer that is capable of saving a developing solution adhered to the substrate during transfer of the substrate, and a transfer controller for controlling an inclined transfer angle and a connection state of the third transfer unit.

摘要翻译： 一种基板转印装置，其设计提供了一种倾斜的传递函数，其在基底转印期间提高了处理溶液（显影液）的液体节省效率。 基片传送装置包括用于传送基片的第一传送单元，与第一传送单元的端部隔开的第二传送单元，设置在第一和第二传送单元之间的第三传送单元，提供能够 在基板的转印过程中节约了附着在基板上的显影液，以及用于控制第三转印单元的倾斜转印角度和连接状态的转印控制器。

公开(公告)号：US06817387B2

公开(公告)日：2004-11-16

申请号：US10413557

申请日：2003-04-15

申请人： Yong-Seok Park ,  Sang-Ho Kim ,  Sok-Joo Lee

发明人： Yong-Seok Park ,  Sang-Ho Kim ,  Sok-Joo Lee

IPC分类号： B65B120

CPC分类号： C03C23/0075 ,  B08B3/02 ,  C03C15/00

摘要： A fluid supplying system for LCD manufacturing equipment and a wet processing bath therefor are provided. The fluid supplying system includes a bath united with storage tank in which a fluid collection bath is united with a fluid storage tank. The storage tank having a small size is individually provided to each bath. Further, the body of the wet processing bath is made of a durable material with a chemical resistive material coated thereon. Therefore, the wet processing unit can be widely used regardless of the different types of chemical fluid.

摘要翻译： 提供了一种用于LCD制造设备的流体供应系统及其湿处理槽。 流体供应系统包括与储存罐结合的浴，其中流体收集池与流体储存罐结合。 具有小尺寸的储罐分别提供给每个浴室。 此外，湿法处理槽的主体由涂覆有化学电阻材料的耐用材料制成。 因此，湿处理单元可以被广泛使用，而不管不同类型的化学流体如何。

公开(公告)号：US07632028B2

公开(公告)日：2009-12-15

申请号：US12323807

申请日：2008-11-26

申请人： Chun-Seok Jeong ,  Ho-Youn Park ,  Sok-Joo Lee ,  Seung-Won Lee

发明人： Chun-Seok Jeong ,  Ho-Youn Park ,  Sok-Joo Lee ,  Seung-Won Lee

IPC分类号： G03D5/00 ,  G03D5/04

CPC分类号： H01L21/67718 ,  G02F1/1303 ,  H01L21/6776

摘要： A substrate transfer apparatus that is designed provide an inclined transfer function that improves liquid saving efficiency of a process solution (developing solution) during the transfer of the substrate. The substrate transfer apparatus includes a first transfer unit for transferring a substrate, a second transfer unit spaced apart from an end of the first transfer unit, a third transfer unit disposed between the first and second transfer units and providing an inclined transfer that is capable of saving a developing solution adhered to the substrate during transfer of the substrate, and a transfer controller for controlling an inclined transfer angle and a connection state of the third transfer unit.

摘要翻译： 设计的基板输送装置提供倾斜的传递函数，其在基板传送期间提高处理溶液（显影液）的液体节省效率。 基片传送装置包括用于传送基片的第一传送单元，与第一传送单元的端部隔开的第二传送单元，设置在第一和第二传送单元之间的第三传送单元，提供能够 在基板的转印过程中节约了附着在基板上的显影液，以及用于控制第三转印单元的倾斜转印角度和连接状态的转印控制器。

公开(公告)号：US07152613B2

公开(公告)日：2006-12-26

申请号：US10413556

申请日：2003-04-15

申请人： Sok-Joo Lee ,  Gi-Bum Park

发明人： Sok-Joo Lee ,  Gi-Bum Park

IPC分类号： B08B3/00

CPC分类号： H01J9/38 ,  B08B3/022

摘要： Provided is a cleaning apparatus having a fluid mixing nozzle, the cleaning apparatus having a fluid mixing nozzle, the cleaning apparatus for cleaning a glass plate used in the manufacture of a flat-panel display and which mixes a cleaning fluid with a gas and sprays the mixture uniformly on the entire surface of a glass plate, thereby providing superior cleaning effects with a minimum amount of cleaning fluid. The fluid mixing nozzle includes a nozzle in the shape of a rectangle, which mixes a cleaning fluid and a pressured gas and sprays a mixture on the flat-panel display. By tightening the nozzle in a direction of the short axis of the nozzle with use of streamlined structures at a predetermined interval, it is possible to prevent a gap of the nozzle from being elastically deformed. Even with a small amount of cleaning fluid, it is possible for the mixture to be sprayed uniformly on the entire surface of the flat-panel display and for the cleaning effects of a glass plate used in manufacturing the flat-panel display to be improved.

公开(公告)号：US07065900B2

公开(公告)日：2006-06-27

申请号：US10852965

申请日：2004-05-25

申请人： Yong-Seok Park ,  Kyung-Chul Kim ,  Sok-Joo Lee

发明人： Yong-Seok Park ,  Kyung-Chul Kim ,  Sok-Joo Lee

IPC分类号： F26B3/08

CPC分类号： H01L21/6719 ,  H01L21/67028 ,  H01L21/67196

摘要： A substrate transferring/treating system includes a substrate stacking base, a substrate transferring member for receiving/transferring the substrate from/to the base, a substrate cleaning/drying device for cleaning and drying the substrate transferred from the substrate transferring member, and a substrate treating device for treating the substrate that is cleaned and dried by the substrate cleaning/drying device and transferred by the substrate transferring member.

摘要翻译： 基板转印/处理系统包括：基板堆叠基座，用于从基板接收/转移基板的基板转印部件，用于清洁和干燥从基板转印部件转印的基板的基板清洗/干燥装置;以及基板 处理装置，用于处理由基板清洗/干燥装置清洗和干燥并被基板转印部件转印的基板。