摘要:
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
摘要:
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
摘要:
Methods and apparatus for reducing or eliminating reflection at the interface between a binary or multi-level diffractive element and a surrounding medium. A non-planar diffractive surface of a diffractive optical element is coated forming a plurality of nanostructures on the non-planar diffractive surface and, in certain embodiments, on a planar surface as well. The nanostructures are chosen for providing adiabatic refractive index matching at the optical interface between the non-planar diffractive surface and a surrounding medium subject to matching tangential fields at surface discontinuities.
摘要:
A connector assembly for connecting a peripheral device to a computer includes a male connector having a plurality of first connecting pins and a female connector having a plurality of second connecting pins. The plurality of first connecting pins is configured to connect to the peripheral device. The plurality of second connecting pins is configured to connect to the computer. The plurality of second connecting pins is defined on the first circuit board in a second row and a third row. The plurality of second connecting pins comprises a plurality of differential pairs, and each differential pair comprises two differential transmission lines. The two differential transmission lines of each of the plurality of differential pairs are defined on a single row of the second and third rows.
摘要:
A flexible liquid crystal display and a flexible fluid display are provided. The flexible liquid crystal display includes a first module, a second module, at least two supporting structures and a liquid crystal layer. The second module is disposed correspondingly to the first module. The supporting structures are separately disposed between the first module and the second module and used for abutting the first module and the second module, so that a space between the first module and the second module is divided into a flexible area and two non-flexible areas. The flexible area is located between the two non-flexible areas. The liquid crystal layer is disposed in the flexible area and the two non-flexible areas.
摘要:
A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a semiconductor substrate including an active region including a plurality of device regions. The semiconductor device further includes a first device disposed in a first device region of the plurality of device regions, the first device including a first gate structure, first gate spacers disposed on sidewalls of the first gate structure, and first source and drain features. The semiconductor device further includes a second device disposed in a second device region of the plurality of device regions, the second device including a second gate structure, second gate spacers disposed on sidewalls of the second gate structure, and second source and drain features. The second and first source and drain features having a source and drain feature and a contact feature in common. The common contact feature being a self-aligned contact.
摘要:
A display includes a flexible display panel having a back face, two backlight modules disposed on the back face of the display panel and each including a contact end, and an outer casing having two casing panels respectively connected to and supporting the backlight modules oppositely of the display panel. The casing panels are pivotal to move the backlight modules and the display panel between collapsed and non-collapsed positions. In the collapsed position, the display panel is folded, and the backlight modules are parallelly spaced apart. In the non-collapsed position, the display panel is laid flat, the backlight modules coplanarly cover the back face of the display panel, and the contact ends of the backlight modules abut against each other.
摘要:
A power supply circuit for protecting a battery from current leakage when the battery is not in use includes a control signal input circuit and a switch circuit. The control signal input circuit receives a first control signal from a chip and output a second control signal. The switch circuit receives the second control signal and turns on or off an electronic connection between the battery and the chip. Wherein when the battery is not in use and not being charged by the adaptor, there is a possibility of current leakage from the battery. In such case, the switch circuit turns off the electronic connection between the battery and the chip, and the battery does not provide power to the chip.
摘要:
Improved silicide formation and associated devices are disclosed. An exemplary method includes providing a semiconductor material having spaced source and drain regions therein, forming a gate structure interposed between the source and drain regions, performing a gate replacement process on the gate structure to form a metal gate electrode therein, forming a hard mask layer over the metal gate electrode, forming silicide layers on the respective source and drain regions in the semiconductor material, removing the hard mask layer to expose the metal gate electrode, and forming source and drain contacts, each source and drain contact being conductively coupled to a respective one of the silicide layers.