公开(公告)号：US3214060A

公开(公告)日：1965-10-26

申请号：US11597861

申请日：1961-06-09

Applicant: IBM

Inventor： STRICKER ALFRED A ,  MASTERSON FRANK H

IPC: H01L21/00

CPC classification number: H01L21/67138

公开(公告)号：US2939058A

公开(公告)日：1960-05-31

申请号：US80403259

申请日：1959-04-03

Applicant: IBM

Inventor： MASTERSON FRANK H

IPC: H01L21/00 ,  H01L21/60 ,  H01L23/04 ,  H01L23/488

CPC classification number: H01L24/01 ,  H01L21/00 ,  H01L21/67126 ,  H01L23/041 ,  H01L23/488 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01025 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01044 ,  H01L2924/01049 ,  H01L2924/01068 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12036 ,  H01L2924/12043 ,  H01L2924/00

公开(公告)号：US3645622A

公开(公告)日：1972-02-29

申请号：US3645622D

申请日：1970-03-31

Applicant: IBM

Inventor： CACHON RENE P ,  GRUNDON FORREST R ,  MASTERSON FRANK H ,  MILLER JOSEPH C ,  WUSTRAU FRED E

IPC: G03F7/20 ,  H01L21/68 ,  G03B27/02

CPC classification number: G03F7/70691 ,  H01L21/682

Abstract: Apparatus and method for accurately aligning a semiconductor wafer to a photomask, comprising a base and a frame for the apparatus. The base portion includes a chamber in which is mounted a piston which is restrained from lateral movement while permitting vertical reciprocation thereof. In the upper portion of the piston is a socket which supports a gimbal, the gimbal including a surface for receiving a wafer thereon. Mounted on the frame is a carriage which includes a mask clamp for positioning a mask in superimposed overlapping relation relative to the gimbal while clamping the mask to the frame. A source of fluid is connected to the socket so that the gimbal will float on a cushion, for example, of air. The piston is elevated by air pressure to cause the piston to raise beyond the point of contact of a wafer mounted on the gimbal with the mask. In response to the increase in fluid pressure which results from the contact of the wafer with the mask a sensor stops the air pressure to piston. Thereafter the piston is lowered a preset and predetermined amount to thereby space the wafer from the mask permitting adjustment of the base relative to the frame. Also disclosed is a novel gimbal with a wafer alignment apparatus build in so as to automatically initially position the wafer in a desired predetermined position on the gimbal.

Abstract translation: 用于将半导体晶片精确对准到光掩模的装置和方法，包括用于该装置的基座和框架。 底座部分包括一个室，其中安装有活塞，该活塞在允许其垂直往复运动的同时被限制在横向运动中。 在活塞的上部是支撑万向节的插座，万向架包括用于在其上接收晶片的表面。 安装在框架上的是一种托架，其包括用于将掩模相对于万向架叠加重叠的关系定位的掩模夹具，同时将掩模夹在框架上。 流体源连接到插座，使得万向架将浮在例如空气的垫子上。 活塞通过空气压力升高以使活塞升高超过安装在万向节上的晶片与面罩的接触点。 响应于晶片与面罩的接触导致的流体压力的增加，传感器将空气压力停止到活塞。 此后，活塞降低预设和预定量，从而使晶片与掩模相隔离，允许基座相对于框架的调节。

公开(公告)号：US3064341A

公开(公告)日：1962-11-20

申请号：US63059656

申请日：1956-12-26

Applicant: IBM

Inventor： MASTERSON FRANK H

IPC: H01L21/00 ,  H01L21/60 ,  H01L23/04 ,  H01L23/488

CPC classification number: H01L24/01 ,  H01L21/00 ,  H01L21/67126 ,  H01L23/041 ,  H01L23/488 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01025 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01044 ,  H01L2924/01049 ,  H01L2924/01068 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12036 ,  H01L2924/12043 ,  H01L2924/00