公开(公告)号：US20150166347A1

公开(公告)日：2015-06-18

申请号：US14484430

申请日：2014-09-12

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chen-Lung LIN ,  Yen-Chun LIU ,  Hui-Wen CHANG ,  Kuo-Chan CHIOU ,  Hsien-Lin HU

IPC: C01B31/04 ,  C08G73/14

CPC classification number: C01B31/04 ,  C01B32/20 ,  C08G73/1035 ,  C08G73/1042 ,  C08G73/1053 ,  C08G73/1067 ,  C08G73/1071 ,  C08G73/14 ,  C09D179/08

Abstract: A polyamide-imide represented by the following formula is provided. A graphite film prepared by performing a thermal treatment process on the polyamide-imide represented by the above-mentioned formula is also provided. In the thermal treatment process, the temperature range of the thermal treatment process ranges from 25° C. to 2,900° C.

Abstract translation: 提供由下式表示的聚酰胺 - 酰亚胺。 还提供了通过对由上述式表示的聚酰胺 - 酰亚胺进行热处理工艺制备的石墨膜。 在热处理过程中，热处理工艺的温度范围为25℃至2900℃。

公开(公告)号：US20140178823A1

公开(公告)日：2014-06-26

申请号：US13908082

申请日：2013-06-03

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chen-Lung LIN ,  Fu-Shun HSU ,  Kuo-Chan CHIOU

IPC: G03F7/038

CPC classification number: G03F7/0387 ,  G03F7/027 ,  G03F7/0388

Abstract: A photosensitive polyimide and negative type photo-resist composition containing the same are provided. The photosensitive polyimide is represented by formula (I): wherein X1 and X3 are the same or different organic functional groups having four covalent bonds; X2 and X4 are the same or different organic functional groups having two covalent bonds, and X2 contains functional groups of OH or COOH and any one selected from the functional groups below: wherein R is H or CH3, p and q are integers of 1 to 20, and m and n in formula (I) are numbers of repeat units.

Abstract translation: 提供含有它们的光敏聚酰亚胺和负型光致抗蚀剂组合物。 光敏聚酰亚胺由式（I）表示：其中X1和X3是具有四个共价键的相同或不同的有机官能团; X 2和X 4是具有两个共价键的相同或不同的有机官能团，X 2包含OH或COOH的官能团和选自以下官能团的任何一个：其中R是H或CH 3，p和q是1至 20，式（I）中的m和n为重复单元数。