公开(公告)号：US20140144382A1

公开(公告)日：2014-05-29

申请号：US13726658

申请日：2012-12-26

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Ming-Hsien Ko ,  Li-Wen Lai ,  Kun-Wei Lin ,  Chun-Hao Chang ,  Tai-Hung Chen

IPC: C23C16/455

CPC classification number: C23C16/4401 ,  C23C16/45578 ,  C23C16/50 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449

Abstract: A plasma apparatus including a chamber, an electrode set and a gas supplying tube set is provided. The chamber has a supporting table. The gas supplying tube set is disposed in the chamber and located between the supporting table and the electrode set. The gas supplying tube set includes at least one outer gas supplying tube and at least one first inner gas supplying tube. The first inner gas supplying tube is telescoped within the outer gas supplying tube. The outer gas supplying tube and the first inner gas supplying tube both have a plurality of gas apertures, and an amount of the gas apertures of the outer gas supplying tube is greater than an amount of the gas apertures of the first inner gas supplying tube.

Abstract translation: 提供了包括室，电极组和供气管组的等离子体装置。 房间有一个支撑台。 气体供给管组设置在室内并且位于支撑台和电极组之间。 气体供给管组包括至少一个外部气体供给管和至少一个第一内部气体供给管。 第一内部气体供给管可伸缩在外部气体供给管内。 外部气体供给管和第一内部气体供给管都具有多个气体孔，外部气体供给管的气体孔的量大于第一内部气体供给管的气体孔的量。