MULTI-STAGE ELECTRONIC DESIGN AUTOMATION PARAMETER TUNING

    公开(公告)号:US20230195993A1

    公开(公告)日:2023-06-22

    申请号:US17645093

    申请日:2021-12-20

    CPC classification number: G06F30/398

    Abstract: Techniques regarding parameter tuning for an EDA protocol are provided. For example, one or more embodiments described herein can comprise a system, which can comprise a memory that can store computer executable components. The system can also comprise a processor, operably coupled to the memory, and that can execute the computer executable components stored in the memory. The computer executable components can comprise a tuning component that tunes an electronic design automation protocol via a cooperative co-evolutionary optimization framework that shares parameter knowledge across multiple stages of the electronic design automation protocol.

    AUTONOMOUS PLACEMENT TO SATISFY SELF-ALIGNED DOUBLE PATTERNING CONSTRAINTS

    公开(公告)号:US20200057836A1

    公开(公告)日:2020-02-20

    申请号:US16103011

    申请日:2018-08-14

    Abstract: Techniques regarding functional placement of one or more logic gates in a periodic circuit row configuration are provided. For example, one or more embodiments described herein can comprise a system, which can comprise a memory that can store computer executable components. The system can comprise a processor, operably coupled to the memory, and that can execute the computer executable components stored in the memory. The computer executable components can comprise an optimization component, operatively coupled to the processor, that can determine functional placement of a logic gate in a self-aligned double patterning process that can form a periodic circuit row configuration.

    Dynamic SADP region generation
    7.
    发明授权

    公开(公告)号:US11087062B1

    公开(公告)日:2021-08-10

    申请号:US16936146

    申请日:2020-07-22

    Abstract: Techniques for dynamically generating self-aligned double patterning (SADP) gate regions based on gate distribution and the relocation of the gates to their matched region are provided. In one aspect, a method for generating SADP gate regions in a circuit design includes: obtaining a circuit design having SADP gates, and a placement solution for the SADP gates that, while non-overlapping, violates SADP track routing matching requirements; determining approximate locations of SADP regions in the circuit design; assigning the SADP gates to the SADP regions using a minimum-cost maximum-flow (min-cost max-flow) process; and identifying, once all of the SADP gates have been assigned to the SADP regions, non-overlapping locations for the SADP gates in the SADP regions.

    Autonomous placement to satisfy self-aligned double patterning constraints

    公开(公告)号:US10796064B2

    公开(公告)日:2020-10-06

    申请号:US16103011

    申请日:2018-08-14

    Abstract: Techniques regarding functional placement of one or more logic gates in a periodic circuit row configuration are provided. For example, one or more embodiments described herein can comprise a system, which can comprise a memory that can store computer executable components. The system can comprise a processor, operably coupled to the memory, and that can execute the computer executable components stored in the memory. The computer executable components can comprise an optimization component, operatively coupled to the processor, that can determine functional placement of a logic gate in a self-aligned double patterning process that can form a periodic circuit row configuration.

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