公开(公告)号：US20030196679A1

公开(公告)日：2003-10-23

申请号：US10124842

申请日：2002-04-18

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： John Michael Cotte ,  Emily E. Fisch ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Harald Okorn-Schmidt ,  Keith R. Pope ,  John P. Simons ,  William A. Syverson ,  Charles J. Taft

IPC: B08B003/12

CPC classification number: B08B3/12 ,  B08B7/0021 ,  B81C1/00841 ,  B81C2201/117 ,  H01L21/67017

Abstract: A process and apparatus for the processing of a precision surface. The process and apparatus includes contacting of a precision surface in a process chamber with liquid or supercritical carbon dioxide in which sonic waves are generated.

Abstract translation: 用于加工精密表面的工艺和设备。 该方法和装置包括将处理室中的精密表面与产生声波的液体或超临界二氧化碳接触。

公开(公告)号：US20030003746A1

公开(公告)日：2003-01-02

申请号：US09893266

申请日：2001-06-27

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC: H01L021/302

CPC classification number: H01L21/7684 ,  H01L21/02063

Abstract: A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.

Abstract translation: 提供具有电互连能力的半导体器件的过程，其中在化学机械抛光之前将牺牲材料引入半导体器件的形貌特征中，使得在化学机械抛光期间形成的碎屑不能落入存在于半导体器件上的形貌特征。 牺牲材料随后被液体或超临界二氧化碳除去。

公开(公告)号：US20030003762A1

公开(公告)日：2003-01-02

申请号：US09893207

申请日：2001-06-27

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC: H01L021/302

CPC classification number: H01L21/02101 ,  H01L21/02057

Abstract: A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.

Abstract translation: 从蚀刻精密表面除去残留物的方法。 在该过程中，蚀刻的精密表面与包括液体或超临界二氧化碳和产生氟化物质的组合物接触。

公开(公告)号：US20030000556A1

公开(公告)日：2003-01-02

申请号：US10207509

申请日：2002-07-29

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC: B08B009/00

CPC classification number: B08B7/0021

Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

Abstract translation: 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US20040113079A1

公开(公告)日：2004-06-17

申请号：US10320835

申请日：2002-12-16

Applicant: International Business Machines Corporation

Inventor： John M. Cotte ,  Kenneth J. McCullough ,  Wayne M. Moreau ,  Keith R. Pope ,  Robert J. Purtell ,  John P. Simons ,  Charles J. Taft

IPC: G01N021/35

CPC classification number: G01N21/359 ,  G01N21/3504

Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.

Abstract translation: 提供了一种用于半导体制造工艺的工艺参数的现场监测和分析的方法和装置，包括利用超临界流体或诸如CO 2的高压液体清洗半导体晶片。 该方法和装置利用具有靠近保持高压流体的容器的反射镜的光谱仪。 通过窗口传输到容器中并通过相对的窗口传出容器的NIR辐射被反射和检测和测量，并且确定压力容器中的流体的组成，允许用户基于测量的组成来控制工艺参数。

公开(公告)号：US20040112865A1

公开(公告)日：2004-06-17

申请号：US10320834

申请日：2002-12-16

Applicant: International Business Machines Corporation

Inventor： Kenneth J. McCullough ,  Wayne M. Moreau ,  Keith R. Pope ,  Robert J. Purtell ,  John P. Simons ,  William A. Syverson ,  Charles J. Taft

IPC: B44C001/22

CPC classification number: B01D67/0032 ,  B01D61/147 ,  B01D67/003 ,  B01D67/0088 ,  B01D67/0093 ,  B01D69/10 ,  B01D2323/225 ,  B01D2323/34

Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.

Abstract translation: 提供了用于通过减去技术制造微过滤器的方法，该技术除去过滤材料的组分或部分以在过滤材料中形成孔隙，以及将过滤材料沉积到多孔下面的基底上的添加技术。 所有方法都采用超临界流体或混合物，其具有非常高的溶解性能和低粘度，而CO 2是优选的超临界流体。

公开(公告)号：US20030045117A1

公开(公告)日：2003-03-06

申请号：US09945596

申请日：2001-09-04

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC: H01L021/302

CPC classification number: H01L21/02071 ,  B08B7/0021 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/50 ,  C11D11/0047 ,  H01L21/31116

Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

Abstract translation: 包括液体或超临界二氧化碳和pKa小于约4的酸的组合物。该组合物用于从精密表面与精密表面接触的精密表面（例如半导体样品）中除去残余物的方法 在热力学条件下的组成与液体或超临界二氧化碳在液体或超临界状态下的保留一致。