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公开(公告)号：US06534998B1
公开(公告)日：2003-03-18
申请号：US09716381
申请日：2000-11-21
IPC分类号： G01R3108
CPC分类号： H01L29/7395 , H03K17/08128
摘要： Disclosed is a semiconductor device capable of stabilizing a gate voltage at high voltage and high current, protecting the device from breakdown by preventing current nonuniformity and oscillations and the like, thereby improving reliability, and a method for controlling the semiconductor device. The semiconductor device comprises an n-type base layer, a p-type emitter layer, which is formed on a surface of the n-type base layer, a collector electrode, formed on a surface of the p-type emitter layer, a p-type base layer, formed on a surface on the n-type base layer which is opposite to the p-type emitter layer, an n-type source layer, formed in a surface of the p-type base layer, an emitter electrode, formed on the n-type source layer and the p-type base layer, and a gate electrode, contacting the n-type source layer, the p-type base layer and the n-type base layer, with a gate insulating film interposed therebetween, wherein when a voltage is applied between the collector electrode and the emitter electrode, the capacitance of the gate electrode is always a positive value or zero.
摘要翻译： 公开了一种能够在高电压和高电流下稳定栅极电压的半导体器件，通过防止电流不均匀性和振荡等来保护器件免于击穿，从而提高可靠性，以及用于控制半导体器件的方法。 半导体器件包括n型基极层，形成在n型基极层的表面上的p型发射极层，形成在p型发射极层的表面上的集电极，p 型基底层，形成在与p型发射极层相对的n型基底层的表面上，形成在p型基底层的表面中的n型源极层，发射极电极， 形成在n型源极层和p型基极层上的栅极电极和与n型源极层，p型基极层和n型基极层接触的栅极电极，其间插入有栅极绝缘膜 其中当在集电极和发射极之间施加电压时，栅电极的电容总是为正值或零。
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公开(公告)号：US6153896A
公开(公告)日：2000-11-28
申请号：US41792
申请日：1998-03-13
IPC分类号： H01L27/04 , H01L21/822 , H01L29/739 , H01L29/78 , H03K17/0812
CPC分类号： H01L29/7395 , H03K17/08128
摘要： Disclosed is a semiconductor device capable of stabilizing a gate voltage at high voltage and high current, protecting the device from breakdown by preventing current nonuniformity and oscillations and the like, thereby improving reliability, and a method for controlling the semiconductor device. The semiconductor device comprises an n-type base layer, a p-type emitter layer, which is formed on a surface of the n-type base layer, a collector electrode, formed on a surface of the p-type emitter layer, a p-type base layer, formed on a surface on the n-type base layer which is opposite to the p-type emitter layer, an n-type source layer, formed in a surface of the p-type base layer, an emitter electrode, formed on the n-type source layer and the p-type base layer, and a gate electrode, contacting the n-type source layer, the p-type base layer and the n-type base layer, with a gate insulating film interposed therebetween, wherein when a voltage is applied between the collector electrode and the emitter electrode, the capacitance of the gate electrode is always a positive value or zero.
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公开(公告)号：US5883402A
公开(公告)日：1999-03-16
申请号：US744245
申请日：1996-11-05
CPC分类号： H01L27/0248 , H01L2924/0002
摘要： A semiconductor device comprises a main switching element, an electric field detector and an on-voltage application unit. The main switching element includes a high-voltage main electrode, at least a low-voltage main electrode and at least a first gate electrode. The electric field detector has a MOS structure making conductive between the high-voltage main electrode and the first gate electrode in a path other than the main switching element in accordance with a predetermined electric field generated in the main switching element. The on-voltage application unit applies an on-voltage to the first gate electrode on the basis of the conductive state.
摘要翻译： 半导体器件包括主开关元件，电场检测器和导通电压施加单元。 主开关元件包括高压主电极，至少低电压主电极和至少第一栅电极。 电场检测器根据主开关元件中产生的预定电场，在主开关元件以外的路径中，在高电压主电极与第一栅电极之间导通MOS结构。 导通电压单元基于导通状态对第一栅电极施加导通电压。
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公开(公告)号：US07800168B2
公开(公告)日：2010-09-21
申请号：US11833401
申请日：2007-08-03
申请人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
发明人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
IPC分类号： H01L29/76
CPC分类号： H01L29/1095 , H01L29/0619 , H01L29/0692 , H01L29/0696 , H01L29/083 , H01L29/0834 , H01L29/7394 , H01L29/7397
摘要： A semiconductor device includes a base layer of a first conductivity type, a barrier layer of a first conductivity type formed on the base layer, a trench formed from the surface of the barrier layer to such a depth as to reach a region in the vicinity of an interface between the barrier layer and the base layer, a gate electrode formed in the trench via a gate insulating film, a contact layer of a second conductivity type selectively formed in a surface portion of the barrier layer, a source layer of the first conductivity type selectively formed in the surface portion of the barrier layer so as to contact the contact layer and a side wall of the gate insulating film in the trench, and a first main electrode formed so as to contact the contact layer and the source layer.
摘要翻译： 半导体器件包括第一导电类型的基底层，形成在基底层上的第一导电类型的阻挡层，从阻挡层的表面形成的沟槽到达达到 阻挡层和基底层之间的界面，通过栅极绝缘膜形成在沟槽中的栅极电极，选择性地形成在阻挡层的表面部分中的第二导电类型的接触层，第一导电性的源极层 形成在所述阻挡层的表面部分中以与所述沟槽中的所述接触层和所述栅极绝缘膜的侧壁接触的第一主电极以及与所述接触层和所述源极层接触的第一主电极。
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公开(公告)号：US07319257B2
公开(公告)日：2008-01-15
申请号：US11626141
申请日：2007-01-23
CPC分类号： H01L29/0696 , H01L29/0619 , H01L29/0839 , H01L29/407 , H01L29/4236 , H01L29/66348 , H01L29/7394 , H01L29/7395 , H01L29/7397
摘要： A power semiconductor device includes trenches disposed in a first base layer of a first conductivity type at intervals to partition main and dummy cells, at a position remote from a collector layer of a second conductivity type. In the main cell, a second base layer of the second conductivity type, and an emitter layer of the first conductivity type are disposed. In the dummy cell, a buffer layer of the second conductivity type is disposed. A gate electrode is disposed, through a gate insulating film, in a trench adjacent to the main cell. A buffer resistor having an infinitely large resistance value is inserted between the buffer layer and emitter electrode. The dummy cell is provided with an inhibiting structure to reduce carriers of the second conductivity type to flow to and accumulate in the buffer layer from the collector layer.
摘要翻译： 功率半导体器件包括在距离第二导电类型的集电极层的位置处间隔设置在第一导电类型的第一基极层中的沟槽，以分隔主单元和虚设单元。 在主电池中，设置第二导电类型的第二基极层和第一导电类型的发射极层。 在虚拟电池中设置第二导电类型的缓冲层。 栅电极通过栅极绝缘膜设置在与主电池相邻的沟槽中。 具有无限大电阻值的缓冲电阻器插入在缓冲层和发射极之间。 虚设电池具有抑制结构，以减少第二导电类型的载流子从集电极层流入和积聚在缓冲层中。
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公开(公告)号：US20070114570A1
公开(公告)日：2007-05-24
申请号：US11626141
申请日：2007-01-23
IPC分类号： H01L31/00
CPC分类号： H01L29/0696 , H01L29/0619 , H01L29/0839 , H01L29/407 , H01L29/4236 , H01L29/66348 , H01L29/7394 , H01L29/7395 , H01L29/7397
摘要： A power semiconductor device includes trenches disposed in a first base layer of a first conductivity type at intervals to partition main and dummy cells, at a position remote from a collector layer of a second conductivity type. In the main cell, a second base layer of the second conductivity type, and an emitter layer of the first conductivity type are disposed. In the dummy cell, a buffer layer of the second conductivity type is disposed. A gate electrode is disposed, through a gate insulating film, in a trench adjacent to the main cell. A buffer resistor having an infinitely large resistance value is inserted between the buffer layer and emitter electrode. The dummy cell is provided with an inhibiting structure to reduce carriers of the second conductivity type to flow to and accumulate in the buffer layer from the collector layer.
摘要翻译： 功率半导体器件包括在距离第二导电类型的集电极层的位置处间隔设置在第一导电类型的第一基极层中的沟槽，以分隔主单元和虚设单元。 在主电池中，设置第二导电类型的第二基极层和第一导电类型的发射极层。 在虚拟电池中设置第二导电类型的缓冲层。 栅电极通过栅极绝缘膜设置在与主电池相邻的沟槽中。 具有无限大电阻值的缓冲电阻器插入在缓冲层和发射极之间。 虚设电池具有抑制结构，以减少第二导电类型的载流子从集电极层流入和积聚在缓冲层中。
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公开(公告)号：US20090039386A1
公开(公告)日：2009-02-12
申请号：US12249573
申请日：2008-10-10
IPC分类号： H01L29/739
CPC分类号： H01L29/1095 , H01L29/0834 , H01L29/7397
摘要： A semiconductor device comprises a first base layer of a first conductivity type; a plurality of second base layers of a second conductivity type, provided on a part of a first surface of the first base layer; trenches formed on each side of the second base layers, and formed to be deeper than the second base layers; an emitter layer formed along the trench on a surface of the second base layers; a collector layer of the second conductivity type, provided on a second surface of the first base layer opposite to the first surface; an insulating film formed on an inner wall of the trench, the insulating film being thicker on a bottom of the trench than on a side surface of the trench; a gate electrode formed within the trench, and isolated from the second base layers and the emitter layer by the insulating film; and a space section provided between the second base layers adjacent to each other, the space section being deeper than the second base layers and being electrically isolated from the emitter layer and the second base layers.
摘要翻译： 半导体器件包括第一导电类型的第一基极层; 多个第二导电类型的第二基层，设置在所述第一基底层的第一表面的一部分上; 沟槽形成在第二基底层的每一侧上，并且形成为比第二基底层更深; 在所述第二基底层的表面上沿着所述沟槽形成的发射极层; 设置在与第一表面相对的第一基底层的第二表面上的第二导电类型的集电极层; 形成在所述沟槽的内壁上的绝缘膜，所述绝缘膜在所述沟槽的底部比在所述沟槽的侧表面上更厚; 形成在所述沟槽内并与所述第二基极层和所述发射极层通过所述绝缘膜隔离的栅电极; 以及设置在彼此相邻的第二基底层之间的空间部分，空间部分比第二基底层更深，并且与发射极层和第二基底层电隔离。
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公开(公告)号：US07268390B2
公开(公告)日：2007-09-11
申请号：US11102851
申请日：2005-04-11
申请人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
发明人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
IPC分类号： H01L29/76
CPC分类号： H01L29/1095 , H01L29/0619 , H01L29/0692 , H01L29/0696 , H01L29/083 , H01L29/0834 , H01L29/7394 , H01L29/7397
摘要： A semiconductor device includes a base layer of a first conductivity type, a barrier layer of a first conductivity type formed on the base layer, a trench formed from the surface of the barrier layer to such a depth as to reach a region in the vicinity of an interface between the barrier layer and the base layer, a gate electrode formed in the trench via a gate insulating film, a contact layer of a second conductivity type selectively formed in a surface portion of the barrier layer, a source layer of the first conductivity type selectively formed in the surface portion of the barrier layer so as to contact the contact layer and a side wall of the gate insulating film in the trench, and a first main electrode formed so as to contact the contact layer and the source layer.
摘要翻译： 半导体器件包括第一导电类型的基底层，形成在基底层上的第一导电类型的阻挡层，从阻挡层的表面形成的沟槽到达达到 阻挡层和基底层之间的界面，通过栅极绝缘膜形成在沟槽中的栅极电极，选择性地形成在阻挡层的表面部分中的第二导电类型的接触层，第一导电性的源极层 形成在所述阻挡层的表面部分中以与所述沟槽中的所述接触层和所述栅极绝缘膜的侧壁接触的第一主电极以及与所述接触层和所述源极层接触的第一主电极。
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公开(公告)号：US20050179083A1
公开(公告)日：2005-08-18
申请号：US11102851
申请日：2005-04-11
申请人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
发明人： Tsuneo Ogura , Tomoki Inoue , Hideaki Ninomiya , Koichi Sugiyama
IPC分类号： H01L29/78 , H01L21/8228 , H01L29/06 , H01L29/10 , H01L29/739 , H01L29/76 , H01L29/94 , H01L31/0328 , H01L31/0336 , H01L31/062 , H01L31/072 , H01L31/109
CPC分类号： H01L29/1095 , H01L29/0619 , H01L29/0692 , H01L29/0696 , H01L29/083 , H01L29/0834 , H01L29/7394 , H01L29/7397
摘要： A semiconductor device includes a base layer of a first conductivity type, a barrier layer of a first conductivity type formed on the base layer, a trench formed from the surface of the barrier layer to such a depth as to reach a region in the vicinity of an interface between the barrier layer and the base layer, a gate electrode formed in the trench via a gate insulating film, a contact layer of a second conductivity type selectively formed in a surface portion of the barrier layer, a source layer of the first conductivity type selectively formed in the surface portion of the barrier layer so as to contact the contact layer and a side wall of the gate insulating film in the trench, and a first main electrode formed so as to contact the contact layer and the source layer.
摘要翻译： 半导体器件包括第一导电类型的基底层，形成在基底层上的第一导电类型的阻挡层，从阻挡层的表面形成的沟槽到达达到 阻挡层和基底层之间的界面，通过栅极绝缘膜形成在沟槽中的栅极电极，选择性地形成在阻挡层的表面部分中的第二导电类型的接触层，第一导电性的源极层 形成在所述阻挡层的表面部分中以与所述沟槽中的所述接触层和所述栅极绝缘膜的侧壁接触的第一主电极以及与所述接触层和所述源极层接触的第一主电极。
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公开(公告)号：US20060006409A1
公开(公告)日：2006-01-12
申请号：US11221702
申请日：2005-09-09
IPC分类号： H01L29/423
CPC分类号： H01L29/0696 , H01L29/0619 , H01L29/0839 , H01L29/407 , H01L29/4236 , H01L29/66348 , H01L29/7394 , H01L29/7395 , H01L29/7397
摘要： A power semiconductor device includes trenches disposed in a first base layer of a first conductivity type at intervals to partition main and dummy cells, at a position remote from a collector layer of a second conductivity type. In the main cell, a second base layer of the second conductivity type, and an emitter layer of the first conductivity type are disposed. In the dummy cell, a buffer layer of the second conductivity type is disposed. A gate electrode is disposed, through a gate insulating film, in a trench adjacent to the main cell. A buffer resistor having an infinitely large resistance value is inserted between the buffer layer and emitter electrode. The dummy cell is provided with an inhibiting structure to reduce carriers of the second conductivity type to flow to and accumulate in the buffer layer from the collector layer.
摘要翻译： 功率半导体器件包括在距离第二导电类型的集电极层的位置处间隔设置在第一导电类型的第一基极层中的沟槽，以分隔主单元和虚设单元。 在主电池中，设置第二导电类型的第二基极层和第一导电类型的发射极层。 在虚拟电池中设置第二导电类型的缓冲层。 栅电极通过栅极绝缘膜设置在与主电池相邻的沟槽中。 具有无限大电阻值的缓冲电阻器插入在缓冲层和发射极之间。 虚设电池具有抑制结构，以减少第二导电类型的载流子从集电极层流入和积聚在缓冲层中。
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