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公开(公告)号：US20240028055A1
公开(公告)日：2024-01-25
申请号：US18481298
申请日：2023-10-05
Applicant: Ichor Systems, Inc.
Inventor： Daniel T. Mudd , Marshall B. Grill , Norman L. Batchelor, II , Sean Joseph Penley , Michael Maeder , Patti J. Mudd , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC classification number: G05D7/0126 , G05D7/0682 , G01F1/6842 , G01F1/6847 , G01F15/002 , G05D7/0635 , F16K27/003
Abstract: A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
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公开(公告)号：US20240026909A1
公开(公告)日：2024-01-25
申请号：US18375629
申请日：2023-10-02
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC classification number: F15D1/025 , H01L21/67017 , F16K1/32
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US11585444B2
公开(公告)日：2023-02-21
申请号：US16985635
申请日：2020-08-05
Applicant: Ichor Systems, Inc.
Inventor： Matthew Eric Kovacic , Zachariah Ezekiel McIntyre , Sean Joseph Penley , Christopher Bryant Davis
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on effectively sealed flow restrictors which can eliminate leakage of process gas around the flow restrictors. In one embodiment, a seal for a flow restrictor is disclosed, the seal comprising a plastic cylinder which is shrink fit onto a sealing portion of the flow restrictor. In another embodiment, a seal for a flow restrictor is disclosed, the seal having a first sealing ring with a flow aperture, a flow restrictor installed into the flow aperture.
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公开(公告)号：US11639865B2
公开(公告)日：2023-05-02
申请号：US16985540
申请日：2020-08-05
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US20220220986A1
公开(公告)日：2022-07-14
申请号：US17710290
申请日：2022-03-31
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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Patent Agency Ranking
公开(公告)号：US20210041279A1
公开(公告)日：2021-02-11
申请号：US16985540
申请日：2020-08-05
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US20210004027A1
公开(公告)日：2021-01-07
申请号：US17027333
申请日：2020-09-21
Applicant: Ichor Systems, Inc.
Inventor： Daniel T. Mudd , Marshall B. Grill , Norman L. Batchelor, II , Sean Penley , Michael Maeder , Patti J. Mudd , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
Abstract: A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The third flow component mounting region has a first sensing port fluidly coupled to the gas outlet of the monolithic base.
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公开(公告)号：US11841036B2
公开(公告)日：2023-12-12
申请号：US17710290
申请日：2022-03-31
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC classification number: F15D1/025 , F16K1/32 , H01L21/67017
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US20220004209A1
公开(公告)日：2022-01-06
申请号：US17468042
申请日：2021-09-07
Applicant: Ichor Systems, Inc.
Inventor： Daniel T. Mudd , Marshall B. Grill , Norman L. Batchelor, II , Sean Joseph Penley , Michael Maeder , Patti J. Mudd , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
Abstract: A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
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公开(公告)号：US20210041027A1
公开(公告)日：2021-02-11
申请号：US16985635
申请日：2020-08-05
Applicant: Ichor Systems, Inc.
Inventor： Matthew Eric Kovacic , Zachariah Ezekiel McIntyre , Sean Joseph Penley , Christopher Bryant Davis
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on effectively sealed flow restrictors which can eliminate leakage of process gas around the flow restrictors. In one embodiment, a seal for a flow restrictor is disclosed, the seal comprising a plastic cylinder which is shrink fit onto a sealing portion of the flow restrictor. In another embodiment, a seal for a flow restrictor is disclosed, the seal having a first sealing ring with a flow aperture, a flow restrictor installed into the flow aperture.
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