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公开(公告)号：US12268791B2
公开(公告)日：2025-04-08
申请号：US17182967
申请日：2021-02-23
Applicant: Illinois Tool Works Inc.
Inventor： Mark Edward Hogsett , Steven Bernard Heymann , Carl Newberg
Abstract: Systems and methods for sterilization using nonthermal plasma (NTP) ionization are disclosed. An example method for inactivation of viable microorganisms includes: inactivating viable microorganisms in a predetermined volume by: installing a plurality of ceiling mounted direct current (DC) or alternating current (AC), bipolar or steady-state, ion emitter modules based on a geometry of the predetermined volume; and producing, using the plurality of ceiling mounted ion emitter modules, a DC or AC, bipolar or steady-state, nonthermal plasma (NTP), each of the ceiling mounted ion emitter modules comprising a high voltage power supply (HVPS).
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公开(公告)号：USD1038356S1
公开(公告)日：2024-08-06
申请号：US29787263
申请日：2021-06-04
Applicant: Illinois Tool Works Inc.
Designer： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero
Abstract: FIG. 1 is a front perspective view of an ionizing blower;
FIG. 2 is a front elevation view thereof;
FIG. 3 is a rear elevation view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a left side elevation view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a top plan view thereof; and,
FIG. 8 is a front and bottom perspective view thereof.
The broken lines in the drawings illustrate portions of the ionizing blower that form no part of the claimed design.-
公开(公告)号：US10758947B2
公开(公告)日：2020-09-01
申请号：US15928261
申请日：2018-03-22
Applicant: Illinois Tool Works Inc.
Inventor： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero , Edward Anthony Oldynski , Gee Kuen Chong
Abstract: Automatic emitter point cleaners are disclosed. An automatic emitter point cleaning system includes: a fan configured to direct a stream of air through an air path; a point emitter configured to produce at least one of positive ions or negative ions within or proximate to the air path; a brush; a first gear coupled to the brush and configured to move the brush into contact with the point emitter; a second gear to engage the first gear; and a motor to actuate the second gear such that the second gear actuates the first gear to move the brush past the point emitter.
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公开(公告)号：US12070781B2
公开(公告)日：2024-08-27
申请号：US18151878
申请日：2023-01-09
Applicant: Illinois Tool Works Inc.
Inventor： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero , Edward Anthony Oldynski , Gee Kuen Chong
Abstract: Automatic emitter point cleaners are disclosed. An automatic emitter point cleaning system includes: a fan configured to direct a stream of air through an air path; a point emitter configured to produce at least one of positive ions or negative ions within or proximate to the air path; a brush; a first gear coupled to the brush and configured to move the brush into contact with the point emitter; a second gear to engage the first gear; and a motor to actuate the second gear such that the second gear actuates the first gear to move the brush past the point emitter.
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公开(公告)号：USD1038355S1
公开(公告)日：2024-08-06
申请号：US29787262
申请日：2021-06-04
Applicant: Illinois Tool Works Inc.
Designer： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero , Edward Anthony Oldynski
Abstract: FIG. 1 is a front perspective view of an ionizing blower;
FIG. 2 is a front elevation view thereof;
FIG. 3 is a rear elevation view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a left side elevation view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
The broken lines in the drawings illustrate portions of the ionizing blower that form no part of the claimed design.-
Patent Agency Ranking
公开(公告)号：US10925985B2
公开(公告)日：2021-02-23
申请号：US16204567
申请日：2018-11-29
Applicant: Illinois Tool Works Inc.
Inventor： Mark Edward Hogsett , Steven Bernard Heymann , Carl Newberg
IPC: B01J19/08 , B23H3/02 , B23H7/14 , C25B11/00 , A61L2/14 , A61L2/26 , H01T23/00 , A61L9/22 , A61L2/24
Abstract: Systems and methods for sterilization using nonthermal plasma (NTP) ionization are disclosed. An example method for inactivation of viable microorganisms includes: inactivating viable microorganisms in a predetermined volume by: installing a plurality of ceiling mounted direct current (DC) or alternating current (AC), bipolar or steady-state, ion emitter modules based on a geometry of the predetermined volume; and producing, using the plurality of ceiling mounted ion emitter modules, a DC or AC, bipolar or steady-state, nonthermal plasma (NTP), each of the ceiling mounted ion emitter modules comprising a high voltage power supply (HVPS).
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公开(公告)号：US11548039B2
公开(公告)日：2023-01-10
申请号：US17009347
申请日：2020-09-01
Applicant: Illinois Tool Works Inc.
Inventor： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero , Edward Anthony Oldynski , Gee Kuen Chong
Abstract: Automatic emitter point cleaners are disclosed. An automatic emitter point cleaning system includes: a fan configured to direct a stream of air through an air path; a point emitter configured to produce at least one of positive ions or negative ions within or proximate to the air path; a brush; a first gear coupled to the brush and configured to move the brush into contact with the point emitter; a second gear to engage the first gear; and a motor to actuate the second gear such that the second gear actuates the first gear to move the brush past the point emitter.
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公开(公告)号：US20220407294A1
公开(公告)日：2022-12-22
申请号：US17831036
申请日：2022-06-02
Applicant: Illinois Tool Works Inc.
Inventor： Steven Bernard Heymann , Edward Anthony Oldynski , Joseph Cassio , Juan Guerrero
Abstract: An example apparatus for charge neutralization includes: a first emitter nozzle; a power supply configured to supply a high frequency alternating current (AC) signal to the first emitter nozzle; control circuitry configured to: provide a polarity signal to the power supply to generate a DC offset signal, wherein a combination of the high frequency AC signal and the DC offset signal causes the power supply to output a positive ion generation pulse or a negative ion generation pulse; control the polarity signal to cause the power supply to provide a period of positive ion generation and a period of negative ion generation; determine a balance voltage at an output of the first emitter nozzle; and control the polarity signal to adjust a relative durations of the period of positive ion generation and the period of negative ion generation based on the balance voltage.
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公开(公告)号：US20210322605A1
公开(公告)日：2021-10-21
申请号：US17182967
申请日：2021-02-23
Applicant: Illinois Tool Works Inc.
Inventor： Mark Edward Hogsett , Steven Bernard Heymann , Carl Newberg
Abstract: Systems and methods for sterilization using nonthermal plasma (NTP) ionization are disclosed. An example method for inactivation of viable microorganisms includes: inactivating viable microorganisms in a predetermined volume by: installing a plurality of ceiling mounted direct current (DC) or alternating current (AC), bipolar or steady-state, ion emitter modules based on a geometry of the predetermined volume; and producing, using the plurality of ceiling mounted ion emitter modules, a DC or AC, bipolar or steady-state, nonthermal plasma (NTP), each of the ceiling mounted ion emitter modules comprising a high voltage power supply (HVPS).
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公开(公告)号：US20240307926A1
公开(公告)日：2024-09-19
申请号：US18602640
申请日：2024-03-12
Applicant: ILLINOIS TOOL WORKS INC.
Inventor： Steven Bernard Heymann , Aleksey Klochkov , Juan Guerrero , Edward Anthony Oldynski
CPC classification number: B08B1/12 , A46B13/02 , A61L2/14 , A61L2/26 , B08B1/143 , B08B1/20 , B08B1/30 , A46B2200/3073 , A61L2202/11 , A61L2202/14 , A61L2202/17
Abstract: Example automatic emitter point cleaning systems include: an emitter point configured to produce at least one of positive ions or negative ions within or proximate to an ionization delivery path; an emitter frame configured to hold the emitter point in or proximate to the ionization delivery path; a brush; a motor coupled to the brush to actuate the brush to move past the emitter point; a detection surface coupled to the brush; a sensor configured to detect when the brush is in a predetermined position with respect to a reference position by detecting the detection surface; and a detection surface cleaner configured to clean the detection surface while the brush moves with respect to the emitter frame.
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