公开(公告)号：US09415464B2

公开(公告)日：2016-08-16

申请号：US14143829

申请日：2013-12-30

Applicant: Industrial Technology Research Institute

Inventor： Kuang-Yao Huang ,  Yung-Hsing Wang ,  Ying-Hui Yang ,  Pin-Hao Hu ,  Sung-Ho Liu

IPC: B23K26/04 ,  B23K26/03 ,  B23K26/08

CPC classification number: B23K26/034 ,  B23K26/04 ,  B23K26/08

Abstract: A laser machining system and a method thereof are disclosed. The disclosed laser machining system comprises a laser generator, an array photo detector, a processer, and a position controller. The laser generator is configured to emit laser via a first light path onto a work piece. The array photo detector is configured to receive the thermal radiation from the work piece via a second light path, different from the first light path, to generate a thermal radiation image. The processor, electrically coupled to the laser generator and the array photo detector, is configured to calculate a temperature centroid of the thermal radiation image and generate a distance control signal according to the temperature centroid. The position controller, electrically coupled to the processor, is controlled by the distance control signal to make a present distance between the laser machining system equal to a working distance.

Abstract translation: 公开了一种激光加工系统及其方法。 所公开的激光加工系统包括激光发生器，阵列光电检测器，处理器和位置控制器。 激光发生器被配置为经由第一光路将激光发射到工件上。 阵列光电检测器被配置为经由与第一光路不同的第二光路接收来自工件的热辐射，以产生热辐射图像。 电耦合到激光发生器和阵列光电检测器的处理器被配置为计算热辐射图像的温度重心并根据温度重心产生距离控制信号。 电耦合到处理器的位置控制器由距离控制信号控制，以使激光加工系统之间的当前距离等于工作距离。

公开(公告)号：US20210245294A1

公开(公告)日：2021-08-12

申请号：US16881010

申请日：2020-05-22

Applicant: Industrial Technology Research Institute

Inventor： Kuang-Yao Huang ,  Chien-Jung Huang ,  Kun-Tso Chen ,  Hsuan-Chang Lee

IPC: B23K26/03 ,  B23K26/06

Abstract: A scanning light source module for providing a pattern beam to a target object on a work plane is provided. The scanning light source module includes a light emitting device for providing a beam, a beam reducing/expanding device for adjusting an outer diameter of the beam, a shaping lens set for converting the beam into a pattern beam, a scanning reflective mirror set for reflecting the pattern beam to move along at least one direction, and a telecentric flat-field focusing element having an incident surface. The pattern beam has multiple parts. There is a spacing between the parts. The pattern beam is reflected to different positions on the incident surface by the rotation of the scanning reflective mirror set. There is a distance between the work plane and a focal plane of the telecentric flat-field focusing element.

公开(公告)号：US10081077B2

公开(公告)日：2018-09-25

申请号：US14981359

申请日：2015-12-28

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Kuang-Yao Huang ,  Chien-Jung Huang ,  Kuo-Tso Chen ,  Chun-Jen Gu

IPC: B23K26/06 ,  B23K26/342 ,  B23K26/073 ,  B23K26/34

CPC classification number: B23K26/0626 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/073 ,  B23K26/0734 ,  B23K26/34 ,  B23K26/342

Abstract: This disclosure provides a device for heating to generate a uniform molten pool, including: a source unit for generating an energy beam; a beam expanding/reducing unit positioned in an energy path of the energy beam for adjusting the diameter of the energy beam; a flat-top conical lens set positioned in the energy path and including at least two flat-top axicons, with the beam expanding/reducing unit positioned between the source unit and the flat-top conical lens set; and a focusing lens positioned in the energy path, with the flat-top conical lens set between the beam expanding/reducing unit and the focusing lens, and the energy beam being focused by the focusing lens. This disclosure generates a uniform molten pool to prevent vaporization splash due to overheating of the material during melting.