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公开(公告)号：US10308461B2
公开(公告)日：2019-06-04
申请号：US15361087
申请日：2016-11-25
Applicant: Industrial Technology Research Institute
Inventor： Kuo-Hsin Huang , Chao-Feng Sung , Yu-Lin Hsu , Hsin-Yun Hsu
Abstract: A roller assembly for transporting a substrate includes a step roller and a plurality of first auxiliary rollers. The step roller includes a main roller, and a pair of edge rollers sleeved on the main roller and located on two opposite ends of the main roller, respectively. The plurality of first auxiliary rollers are disposed on two opposite sides of the step roller, respectively. A first film forms a closed loop through the first film being rolled on the plurality of first auxiliary rollers and the step roller cyclically. A method using the same is also provided.
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公开(公告)号：US20190144227A1
公开(公告)日：2019-05-16
申请号：US15851701
申请日：2017-12-21
Applicant: Industrial Technology Research Institute
Inventor： Kuo-Hsin Huang
Abstract: A substrate conveying device and a deposition apparatus are provided. The substrate conveying device includes a transmission shaft, a plurality of conveying rollers, and a plurality of bearings. The conveying rollers are configured to convey a substrate respectively. Each conveying roller is assembled to the transmission shaft via the corresponding bearing. Each bearing includes a stator and a rotator. Each conveying roller is fixed to the corresponding rotator. The stators are fixed to the transmission shaft. A magnetic repulsion force parallel to an axial direction of the transmission shaft exists between the stator and the rotator. The stator drives the rotator to rotate via a friction force generated by the magnetic repulsion force between the stator and the rotator.
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3.发明授权公开(公告)号：US09902564B1
公开(公告)日：2018-02-27
申请号：US15390542
申请日：2016-12-26
Inventor： Kuo-Hsin Huang , Chao-Feng Sung , Yu-Lin Hsu , Hsin-Yun Hsu , I-Chung Kao , Kuo-Jung Sun , Shou-Cheng Shen , Kai Chang
CPC classification number: B65H20/14 , B65H2515/842
Abstract: A roller assembly for transporting a substrate includes a step roller, a first transport roller, and a second transport roller. The step roller includes a main roller, an air cylinder, and a pair of edge rollers. The air cylinder is sleeved on the main roller, and includes a plurality of air jetting holes and a plurality of air suction holes. The edge rollers are disposed on the main roller and are located on opposite ends of the air cylinder. The first transport roller and the second transport roller are disposed on opposite sides of the step roller, wherein the substrate is transported from the first transport roller to the second transport roller through the step roller. A method using the same is also provided.
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公开(公告)号：US20160288249A1
公开(公告)日：2016-10-06
申请号：US15086062
申请日：2016-03-31
Inventor： Jyun-Kai Ciou , Yung-Min Hsieh , Kuo-Hsin Huang , NAOTOSHI INAYAMA , TAKEHIKO ISOMOTO , TAKAHIDE FUJII , Chang-Ying Chen
CPC classification number: B23K26/38 , B23K2103/54 , C03B33/0222 , C03B33/04 , C03B33/07 , C03B33/074 , Y02P40/57
Abstract: A cutting method of a multilayer structure containing a brittle layer is provided. The cutting method includes: cutting the multilayer structure to form a cut edge; removing a material of the multilayer structure other than the brittle layer along the cut edge, wherein the material of the multilayer structure other than the brittle layer has a width ranging from 1 micron to 2 millimeter; and modifying an edge of the brittle layer remaining after removing the material of the multilayer structure other than the brittle layer by a laser beam.
Abstract translation: 提供了包含脆性层的多层结构的切割方法。 切割方法包括：切割多层结构以形成切割边缘; 沿着切割边缘除去脆性层以外的多层结构的材料，其中除了脆性层之外的多层结构的材料具有1微米至2毫米的宽度; 以及通过激光束除去除了脆性层之外的多层结构的材料而残留的脆性层的边缘。
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公开(公告)号：US10895007B2
公开(公告)日：2021-01-19
申请号：US15841300
申请日：2017-12-14
Applicant: Industrial Technology Research Institute
Inventor： Yu-Lin Hsu , Chien-Hung Lin , Kuo-Hsin Huang , Chao-Feng Sung , Chih-Ming Lai , Hung-Yi Chang
Abstract: An evaporation apparatus including a material source, a chamber, a passageway, and a heating component is provided. The material source is configured to provide a deposition material. The chamber includes a manifold. The passageway is configured to be connected to the material source and the manifold. The heating component is disposed in at least a portion of the passageway and configured to heat the deposition material. A calibration method of the evaporation apparatus is also provided.
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Patent Agency Ranking
公开(公告)号：US20190127843A1
公开(公告)日：2019-05-02
申请号：US15841300
申请日：2017-12-14
Applicant: Industrial Technology Research Institute
Inventor： Yu-Lin Hsu , Chien-Hung Lin , Kuo-Hsin Huang , Chao-Feng Sung , Chih-Ming Lai , Hung-Yi Chang
Abstract: An evaporation apparatus including a material source, a chamber, a passageway, and a heating component is provided. The material source is configured to provide a deposition material. The chamber includes a manifold. The passageway is configured to be connected to the material source and the manifold. The heating component is disposed in at least a portion of the passageway and configured to heat the deposition material. A calibration method of the evaporation apparatus is also provided.
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公开(公告)号：US20180148262A1
公开(公告)日：2018-05-31
申请号：US15361087
申请日：2016-11-25
Applicant: Industrial Technology Research Institute
Inventor： Kuo-Hsin Huang , Chao-Feng Sung , Yu-Lin Hsu , Hsin-Yun Hsu
CPC classification number: B65G15/12 , B65G35/04 , B65G39/02 , B65H20/02 , B65H27/00 , B65H2301/4422 , B65H2404/1321
Abstract: A roller assembly for transporting a substrate includes a step roller and a plurality of first auxiliary rollers. The step roller includes a main roller, and a pair of edge rollers sleeved on the main roller and located on two opposite ends of the main roller, respectively. The plurality of first auxiliary rollers are disposed on two opposite sides of the step roller, respectively. A first film forms a closed loop through the first film being rolled on the plurality of first auxiliary rollers and the step roller cyclically. A method using the same is also provided.
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公开(公告)号：US20180037996A1
公开(公告)日：2018-02-08
申请号：US15229136
申请日：2016-08-05
Applicant: Industrial Technology Research Institute
Inventor： Yu-Lin Hsu , Kuo-Hsin Huang , Chien-Hung Lin , Pang-Min Shih , Chao-Feng Sung
CPC classification number: C23C16/52 , C23C14/54 , C23C14/546 , G01N29/12 , G01N2291/0237 , G01N2291/0256 , G01N2291/02854 , G01N2291/2697
Abstract: A film thickness monitoring system is provided. The film thickness monitoring system includes a source, a valve, and a chamber. The source is configured to provide a deposition material. The valve is connected to the source. The chamber includes a manifold, a quartz crystal microbalance, and a pressure sensor. The manifold is connected to the valve and has at least one first nozzle and at least one second nozzle. The quartz crystal microbalance is disposed opposite to the at least one second nozzle. The deposition material is adapted to be deposited on the quartz crystal microbalance through the at least one second nozzle, and the quartz crystal microbalance includes a shutter facing the at least one second nozzle. The pressure sensor is disposed in the manifold. A method for monitoring a film thickness deposition process is also provided.
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公开(公告)号：US10118255B2
公开(公告)日：2018-11-06
申请号：US15086062
申请日：2016-03-31
Inventor： Jyun-Kai Ciou , Yung-Min Hsieh , Kuo-Hsin Huang , Naotoshi Inayama , Takehiko Isomoto , Takahide Fujii , Chang-Ying Chen
Abstract: A cutting method of a multilayer structure containing a brittle layer is provided. The cutting method includes: cutting the multilayer structure to form a cut edge; removing a material of the multilayer structure other than the brittle layer along the cut edge, wherein the material of the multilayer structure other than the brittle layer has a width ranging from 1 micron to 2 millimeter; and modifying an edge of the brittle layer remaining after removing the material of the multilayer structure other than the brittle layer by a laser beam.
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公开(公告)号：US10100410B2
公开(公告)日：2018-10-16
申请号：US15229136
申请日：2016-08-05
Applicant: Industrial Technology Research Institute
Inventor： Yu-Lin Hsu , Kuo-Hsin Huang , Chien-Hung Lin , Pang-Min Shih , Chao-Feng Sung
Abstract: A film thickness monitoring system is provided. The film thickness monitoring system includes a source, a valve, and a chamber. The source is configured to provide a deposition material. The valve is connected to the source. The chamber includes a manifold, a quartz crystal microbalance, and a pressure sensor. The manifold is connected to the valve and has at least one first nozzle and at least one second nozzle. The quartz crystal microbalance is disposed opposite to the at least one second nozzle. The deposition material is adapted to be deposited on the quartz crystal microbalance through the at least one second nozzle, and the quartz crystal microbalance includes a shutter facing the at least one second nozzle. The pressure sensor is disposed in the manifold. A method for monitoring a film thickness deposition process is also provided.
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