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1.
公开(公告)号:US20200006643A1
公开(公告)日:2020-01-02
申请号:US16024712
申请日:2018-06-29
Applicant: Intel Corporation
Inventor: Tanay GOSAVI , Sasikanth MANIPATRUNI , Chia-Ching LIN , Gary ALLEN , Scott B. CLENDENING , Ian YOUNG
Abstract: Embodiments herein relate to manufacturing a magnetic random access memory (MRAM). In particular, a process may include coupling a side of a magnetic free layer of a magnetic tunnel junction (MTJ) to a first side of a hybrid spin orbit torque (SOT) electrode-insert layer, coupling a first side of an atomic layer etching (ALE) etch layer to a second side of the hybrid SOT electrode-insert layer opposite the first side, applying an interlayer dielectric (ILD) layer to edges of the MTJ, the SOT electrode and the etch layers, the ILD layer in a plane substantially perpendicular to a plane of the MTJ, SOT electrode and ALE etch layers, and etching the ALE etch layer using ALE until the SOT layer is exposed.
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2.
公开(公告)号:US20200006636A1
公开(公告)日:2020-01-02
申请号:US16024709
申请日:2018-06-29
Applicant: Intel Corporation
Inventor: Tanay GOSAVI , Sasikanth MANIPATRUNI , Chia-Ching LIN , Gary ALLEN , Kaan OGUZ , Kevin O?BRIEN , Noriyuki SATO , Ian YOUNG , Dmitri NIKONOV
Abstract: Embodiments herein relate to magnetically doping a spin orbit torque electrode (SOT) in a magnetic random access memory apparatus. In particular, the apparatus may include a free layer of a magnetic tunnel junction (MTJ) coupled to a SOT electrode that is magnetically doped to apply an effective magnetic field on the free layer, where the free layer has a magnetic polarization in a first direction and where current flowing through the magnetically doped SOT electrode is to cause the magnetic polarization of the free layer to change to a second direction that is substantially opposite to the first direction.
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